• Journal of Sensor Science and Technology
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• v.9 no.3
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• pp.171-176
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• 2000

The physical and electrical characteristics of MgO and Pt thin-films on it, deposited by reactive sputtering and rf magnetron sputtering, respectively, were analyzed with annealing temperature and time by four-point probe, SEM and XRD. Under annealing conditions of $1000^{\circ}C$ and 2 hr, MgO thin-film had the properties of improving Pt adhesion to $SiO_2$ and insulation without chemical reaction to Pt thin-film, and the sheet resistivity and the resistivity of Pt thin-film deposited on it were $0.1288\;{\Omega}/{\square}$ and $12.88\;{\mu}{\Omega}{\cdot}cm$, respectively. We made Pt resistance pattern on $SiO_2$/Si substrate by lift-off method and fabricated thin-film type Pt-RTD(resistance thermometer device) for micro thermal sensors by Pt-wire, Pt-paste and SOG(spin-on-glass). In the temperature range of $25{\sim}400^{\circ}C$, the TCR value of fabricated Pt-RTD with thickness of $1.0{\mu}m$ was $3927\;ppm/^{\circ}C$ close to the Pt bulk value. Resistance values were varied linearly within the range of measurement temperature.

• Journal of the Korean Vacuum Society
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• v.6 no.1
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• pp.36-43
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• 1997

FECAPS(ferroelectric capacitors) have been fabricated by RF magnetron sputtering deposition of 3000$\AA$ PZT thin films on the Pt/Ti/$SiO_2$/Si substrates and post-annealing with the temperature of $550^{\circ}C$~$650^{\circ}C$ for 10 sec~50 sec in a RTA system. The electrical characteristics of the fabricated capacitors showed the highest dielectric constant and remanent polarization[${\varepsilon_r(1kHz)$=690, $2P_r$(-5V~5V sweep)=22$\mu$C/$ \textrm{cm}^2$] in the samples annealed at $650^{\circ}C$ for 30 sec, while the lowest tangent loss and leakage current [$tan\delta(\ge10kHz)\le0.02, \; J_i(5V)=3\mu\textrm{A}/\textrm{cm}^2$]in the samples annealed at $600^{\circ}C$ for 30 sec.

• Journal of Sensor Science and Technology
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• v.7 no.2
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• pp.83-89
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• 1998

$TiO_{2-x}$ thin film humidity sensors have been fabricated by sputtering method and their physical and hygroscopic characteristics have been investigated. The sputtering conditions and sintering conditions affect the sensor's sensitivity toward humidity. AES and SEM micrographs were taken for the analysis of crystal structures, surface morphology caused by adsorbed water vapour. $TiO_{2-x}$ humidity sensors showed negative impedance-humidity characteristics and the sensor which was fabricated by experimental condition 2(rf power of 200W) showed higher sensitivity and linearity than others. Then the slope of the sensor was about $0.794\;K{\Omega}/%RH$ and the response time of $TiO_{2-x}$ humidity sensors was about 2 min. for adsorption and about 3 min. for desorption at the operating temperature of $30^{\circ}C$.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.21 no.3
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• pp.578-584
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• 2017

$SiO_2$ buffer layer (100 nm) has been deposited on PET substrate by electron beam evaporation. And then, IZTO (In-Zn-Sn-O) thin film has been deposited on $SiO_2$/PET substrate with different RF power of 30 to 60 W, working pressure, 1 to 7 mTorr, by RF magnetron sputtering. Structural, electrical and optical properties of IZTO thin film have been analyzed with various RF powers and working pressures. IZTO thin film deposited on the process condition of 50 W and 3 mTorr exhibited the best characteristics, where figure of merit was $4.53{\times}10^{-3}{\Omega}^{-1}$, resistivity, $4.42{\times}10^{-4}{\Omega}-cm$, sheet resistance, $27.63{\Omega}/sq.$, average transmittance (400-800 nm), 81.24%. As a result of AFM, all the IZTO thin film has no defects such as pinhole and crack, and RMS surface roughness was 1.147 nm. Due to these characteristics, IZTO thin film deposited on $SiO_2$/PET structure was found to be a very compatible material that can be applied to the next generation flexible display device.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.17 no.5
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• pp.1213-1218
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• 2013

In this study, Ga-doped ZnO (GZO) thin films were fabricated on transparent sapphire substrate by RF magnetron sputtering method and then investigated the effect of various substrate temperature on the electrical, optical properties and characteristic of crystallization of the GZO thin films. The electrical property indicated that the lowest resistivity ($4.18{\times}10^{-4}{\Omega}cm$), the highest carrier concentration ($6.77{\times}10^{20}cm^{-3}$) and Hall mobility ($22cm^2/Vs$) were obtained in the GZO thin film fabricated at $300^{\circ}C$. And for this condition, the highest c-axis orientation and (002) diffraction peak which exhibits a FWHM of $0.34^{\circ}$ were obtained. From the results of AFM measurements, it is known that the highest crystallinity is observed at $300^{\circ}C$. The transmittance spectrum in the visible range was approximately 80 % regardless of substrate temperature. The optical band-gap showed the blue-shift as increasing the substrate temperature to $300^{\circ}C$, and they are all larger than the band gap of bulk ZnO (3.3 eV). It can be explained by the Burstein-Moss effect.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.15 no.7
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• pp.1559-1563
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• 2011

We fabricated gallium doped ZnO (GZO, 5 wt% Ga) thin films on PES (polyethersulfon) substrate with RF magnetron sputtering and investigated optical and electrical properties for various substrate temperatures ($50{\sim}200^{\circ}C$). All GZO thin film has c-axis preferred orientation without reference to deposition conditions. As a result of AFM analysis, the GZO thin film deposited at $200^{\circ}C$ exhibited the lowest surface roughness of 0.196nm. The transmittance of GZO thin films were above 80% and Burstein-Moss effect was observed. In the analysis of Hall measurement, we confirmed that the GZO thin film deposited at $200^{\circ}C$ showed the lowest resistivity of $6.93{\times}10-4{\Omega}{\cdot}cm$ and the highest carrier concentration of $7.04{\times}1020/cm^3$.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.19 no.6
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• pp.1393-1398
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• 2015

In this study, the electrical and optical properties of GZO (Ga-doped ZnO) thin films prepared on PES substrates by RF magnetron sputtering method with various working pressures (5 to 20 mTorr) were investigated. All GZO thin films exhibited c-axis preferential growth regardless of working pressure, the GZO thin film deposited at 5 mTorr showed the most excellent crystallinity having 0.44˚ of FWHM. In AFM observations, surface roughness exhibited the lowest value of 0.20 nm in a thin film produced by the working pressure 5 mTorr. Figure of merits of GZO thin film deposited at 5 mTorr showed the highest value of 6652, in this case resistivity and average transmittance in the visible light region were 6.93×10^-4Ω-cm and 81.4%, respectively. We could observed the Burstein-Moss effect that carrier concentration decrease with the increase of working pressure and thus the energy band gap is narrowed.

• Journal of the Korean Magnetics Society
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• v.3 no.1
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• pp.23-28
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• 1993

Thin films of soft magnetic Fe-Hf-C alloys with nanoscale crystallites were investigated in this study. The films were fabricated by an RF diode magnetron sputtering apparatus and subsequently annealed in vacuum. The soft magnetic properties of the films were observed to differ depending on the different substrates such as Corning 7059, $CaTiO_3$ and $Al_2O_3-TiC$ with various underlayer(Cr, $SiO_2$) thickness. This results may be due to the interdiffusion between the substrate and the magnetic layer and/or between the underlayer and the magnetic layer, rather than the microstructural change such as grain size. The Fe-Hf-C films with high permeability up to 4000(at 1 MHz) and saturation magnetization up to 16 kG were obtained in the vicinity of phase boundary between the crystalline and amorphous state when the size of ${\alpha}-Fe$ grains is about 5 nm. And also the films were found to have thermal stability up to $600^{\circ}C$.

• Journal of the Korean Magnetics Society
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• v.11 no.2
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• pp.45-49
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• 2001

Effects of multilayer structure and annealing condition on the soft magnetic properties of sputtered Fe/CoNbZr multilayers were investigated. We observed a minimum coercivity (1.1 Oe) at 5 nm thick Fe layer and the maximum permeability (2300) at 15 nm Fe layer and high saturation magnetization in the as-deposited state. As a result of increase of Fe grain size, coercivity increases with increasing Fe layer thickness. Degradation of ${\mu}$ at the thin Fe layer region may be due to the intermixed phase of high magnetostriction, such as CoFe. Optimum annealing condition was obtained through annealing at 300 $^{\circ}C$ for 40 min (${\mu}$=2500, H$\sub$c/=0.35 Oe). Enhancement of permeability was observed in the temperature range of 250∼300$^{\circ}C$. These results may closely be related with lowering the anisotropy energy by lattice deformation (0.4%) and enhanced uniaxial anisotropy.

• Journal of Sensor Science and Technology
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• v.6 no.6
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• pp.491-499
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• 1997

We fabricated the ceramic PLT tablet which was composed of 5, 10 and 15 mol% lanthanum concentration and thin film PLT to develope pyroelectric materials, and investigated their characteristics. Using TG/DTA, we determined calcination and sintering temperature to sinter the PLT completely and to prevent volatilization of the Pb components. The calcination and sintering temperature were $850^{\circ}C$, $1150^{\circ}C$ respectively, and there was a lot of mass loss at higher sintering temperature. By measuring temperature-dielectric constant characteristics of ceramic tablet we investigated dielectric constant characteristics depends on La concentration. The Curie point of PLT with 5, 10 and 15 mol% lanthanum concentration were $330^{\circ}C$, $269^{\circ}C$ and $210^{\circ}C$ respectively. Using PLT ceramic tablet we observed IR detection characteristics, and then deposited PLT thin film by rf magnetron sputtering. We verified that PLT thin film fabricated with completely sintered PLT target had the same structure to target by investigating lattice constant and optical transparency.