• Title/Summary/Keyword: 건식 흡착제

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건식 흡착제를 이용한 $CO_2$ 포집기술

  • Park, Su-Jin;Lee, Seul-Lee
    • Journal of the KSME
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    • v.53 no.6
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    • pp.26-30
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    • 2013
  • 지구온난화의 주범인 이산화탄소의 포집저장기술(CCS) 중 포집기술에 집중하여 기술하였다. 이산화탄소 포집기술은 연소 후 포집, 연소 전 포집, 순산소 연소 포집기술로 분류되는데, 그 중에서도 연소 후 포집기술은 기존발생원에 적용하기 가장 용이한 기술로 판단되고 있다. 따라서 이 글에서는 연소 후 포집기술에 적용되는 다양한 기술 중 건식 고체 흡착제의 종류 및 건식 고체 흡착제를 이용한 연소 후 이산화탄소 포집기술 개발의 현황에 대하여 기술하였다.

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Study on Carbon Dioxide Control by Using Dry Sorbent in Fludized Bed (유동층에서 dry sorbent를 이용한 CO2 제어에 관한 연구)

  • Lee, Sang-Sup;Kim, Min-Choul;Yoo, Jeong-Seok;Moon, Gil-Ho;Oh, Kwang-Joong
    • Clean Technology
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    • v.9 no.4
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    • pp.179-187
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    • 2003
  • The technology of fluidized bed to use dry sorbent can be new technology that reduce the operating cost and make efficient operation. Therefore, this study investigated $CO_2$ control by dry sorbents with operating variables in a fluidized bed, compared with fixed bed for $CO_2$ adsorption capacity and pressure drop, and presented the $CO_2$ adsorption capacity of activated carbon, molecular sieve 5A, molecular sieve 13X, and activated alumina. As the results of this study, the basic data could be achieved for operation of fluidized bed process, and fluidized bed process presented relatively high $CO_2$ adsorption capacity and low pressure drop with the increase of gas velocity. In addition, molecular sieve 5A showed 1.1~3.0-fold later breakthrough point and 1.1~2.7-fold higher adsorption capacity than the other dry sorbents.

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$CO_2$ removal system by dry sorbent for passenger train (건식 흡착제를 이용한 차량용 이산화탄소 저감장치 개발)

  • Cho, Yong-Dae;Lee, Ju-Yeol;Park, Duck-Shin
    • Proceedings of the KSR Conference
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    • 2008.06a
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    • pp.1735-1739
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    • 2008
  • Malfunction or inappropriate management of ventilation system in public transportation may cause unpleasant atmosphere or health problems to the old or feeble passengers. In this work, gaseous carbon dioxide removal system is developed and tested under the various serviced passenger cabins. Finally an optimum operating conditions for the $CO_2$ removal system will presented.

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Removal of HCl Using a Bag-Filter with Addition of Bicarbonate (중탄산나트륨이 첨가된 여과집진기를 이용한 염화수소의 제거)

  • Lee, Keon-Joo
    • Journal of the Korea Organic Resources Recycling Association
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    • v.15 no.3
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    • pp.121-128
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    • 2007
  • The purpose of this study was to investigate the removal efficiencies of HCl in dry reactor and Bag-Filter system. The bicarbonate was used as adsorbent to measure the HCl removal rate. The performance of bicarbonate was evaluated to investigate the removal efficiency. It was analysed that the best operation condition in using bicarbonate in process. The operating parameters was residence time, stoichiometric ratio, temperature and pressure. The Residence time was 1.5 sec, stoichiometric ratio was 1SR, 1.25SR, temperature was $160^{\circ}C$, $180^{\circ}C$, $200^{\circ}C$ and the bag filter pressure was 210mmAq, 230mmAq, 250mmAq. In this study it was found that the stoichiometric ratio and pressure can be effected in removal of HCl however the removal efficiency do not depends on temperature. The best operating condition was on 1SR, 230mmAq and $180^{\circ}C$ respectively and in this condition the best removal rate was 99.50%.

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Synthesis and Adsorption Characteristics of Guanidine-based CO2 Adsorbent (Guanidine기반 이산화탄소 건식 흡착제 합성 및 흡착 특성)

  • Pacia, Rose Mardie;Pyo, Seong Won;Ko, Young Soo
    • Applied Chemistry for Engineering
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    • v.28 no.4
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    • pp.473-478
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    • 2017
  • In this study, the guanidine compound, 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD) was impregnated to three kinds of silica to prepare $CO_2$ adsorbents, and the $CO_2$ adsorption and physicochemical properties of the resulting adsorbents were investigated. The TBD amount of impregnation was changed and its effect on adsorption capacity and characteristics were studied. The physicochemical properties of TBD-impregnated silica were evaluated with $N_2$ adsorption/desorption, FT-IR, elemental analysis, and thermogravimetric analysis. The TBD-impregnated silica lowered the surface area and pore volume, and the increased impregnation amount of TBD made them further decrease. When TBD was 6 mmol/g, the $CO_2$ adsorption capacity was the highest at 7.3 wt%, and the adsorption capacity decreased due to the blocking phenomenon when the TBD amount increased.

Membrane-based Direct Air Capture Technologies (분리막을 이용한 공기 중 이산화탄소 제거 기술)

  • Yoo, Seung Yeon;Park, Ho Bum
    • Membrane Journal
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    • v.30 no.3
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    • pp.173-180
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    • 2020
  • As the demand for fossil fuels continues to increase worldwide, carbon dioxide (CO2) concentration in the air has increased over the centuries. The way to reduce CO2 emissions to the atmosphere, carbon capture and sequestration (CCS) technology have been developed that can be applied to power plants and factories, which are primary emission sources. According to the climate change mitigation policy, direct air capture (DAC) in air, referred to as "negative emission" technology, has a low CO2 concentration of 0.04%, so it is focused on adsorbent research, unlike conventional CCS technology. In the DAC field, chemical adsorbents using CO2 absorption, solid absorbents, amine-functionalized materials, and ion exchange resins have been studied. Since the absorbent-based technology requires a high-temperature heat treatment process according to the absorbent regeneration, the membrane-based CO2 capture system has a great potential Membrane-based system is also expected for indoor CO2 ventilation systems and immediate CO2 supply to smart farming systems. CO2 capture efficiency should be improved through efficient process design and material performance improvement.

A Study on Etching of Si3N4 Thin Film and the Exhausted Gas Using C3F6 Gas for LCD Process (LCD 공정용 C3F6 가스를 이용한 Si3N4 박막 식각공정 및 배출가스에 관한 연구)

  • Jeon, S.C.;Kong, D.Y.;Pyo, D.S.;Choi, H.Y.;Cho, C.S.;Kim, B.H.;Lee, J.H.
    • Journal of the Korean Vacuum Society
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    • v.21 no.4
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    • pp.199-204
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    • 2012
  • $SF_6$ gas is widely used for dry etching process of semiconductor and display fabrication process. But $SF_6$ gas is considered for typical greenhouse gas for global warming. So it is necessary to research relating to $SF_6$ alternatives reducing greenhouse effect in semiconductor and display. $C_3F_6$ gas is one of the promising candidates for it. We studied about etch characteristics by performing Reactive Ion Etching process of dry etching and reduced gas element exhausted on etching process using absorbent Zeolite 5A. $Si_3N_4$ thin film was deposited to 500 nm with Plasma Enhanced Chemical Vapor Deposition and we performed Reactive Ion Etching process after patterning through photolithography process. It was observed that the etch rate and the etched surface of $Si_3N_4$ thin film with Scanning Electron Microscope pictures. And we measured and compared the exhausted gas before and after the absorbent using Gas Chromatograph-Mass Spectrophotometry.