• Korean Journal of Materials Research
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• v.18 no.3
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• pp.159-162
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• 2008

$Eu^{3+}$-activated $R_3GaO_6$ (R = Y, Gd) phosphors were prepared in a conventional solid-state reaction and their optical properties were investigated. These compounds exhibit strong red emission under light excitation at 254 nm. The emission spectra are dominated by peaks appearing around 610-630 nm that are induced by the electric dipole transition of $^5D_0\;{\rightarrow}\;^7F_2$ of $Eu^{3+}$. In addition, the appropriate CIE (Commission Internationale de l'clairage) chromaticity coordinates, (x = 0.656, y = 0.336) for $Y_3GaO_6$ and (x = 0.655, y = 0.334) for $Gd_3GaO_6$, become closer to the NTSC (National Television System Committee) standard values. With the optimized activator concentrations, the maximum emission brightness is approximately 80% of $Y_2O_3$:$Eu^{3+}$ typical red-emitting phosphor with improved color purity under an excitation condition of 254 nm.

• Transactions of the Korean hydrogen and new energy society
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• v.27 no.2
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• pp.176-181
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• 2016

Recent years, supercapacitors have been attracting a growing attention as an efficient energy storage, due to their long-lifetime, device reliability, simple device structure and operation mechanism and, most importantly, high power density. Along with the increasing interest in flexible/stretchable electronics, the supercapacitors with compatible mechanical properties have been also required. A eutectic gallium-indium (EGaIn) liquid metal could be a strong candidate as a soft electrode material of the supercapacitors because of its insulating surface oxide layer for electric double layer formation. Here, we report the electrochemical study on the charging/reaction process at the interface of EGaIn liquid metal and electrolyte. Numerical fitting of the charging current curves provides the capacitance of EGaIn/insulating layer/electrolyte (${\sim}38F/m^2$). This value is two orders of magnitude higher than a capacitance of a general metal electrode/electrolyte interface.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.29-32
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• 1999

$GaF_3$ films were directly grown on p' and p-type GaAs(100) substrates using a $SF_6$ plasma discharge system. GaAs MIS(Meta1-Insulator-Semiconductor) capacitor was successfully fabricated for about 1 hour at temperature $290^{\circ}C$ using the as-grown $GaF_3$ films. The as-grown films on p'-GaAs exhibited a current density of less than 6.68 $\times$ $1O^{-9}$ A/$cm^2$ at a breakdown field of 500kV/cm and a refractive index of 2.0 ~ 2.3 at a wavelength of 632.8 nm. The dielectric constant was about 5 derived from 1 MHz capacitance-voltage (C-V) measurements. Dielectric dispersion of the fluoridated films on p'-GaAs measured ranged from 100 Hz to 10 MHz was not observed.

• Journal of the Korean Ceramic Society
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• v.35 no.11
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• pp.1148-1154
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• 1998

Ga K-edge EXAFS spectra of PbO-Ga2O3 glasses were recorded at liquid nitrogen temperature and analyz-ed in order to quantitatively understand the medium-range-order arrangement around gallium in the glasses. The second peak was generated from a backscattering of the neighbor balliums and the Ga-Ga distance is ~3.13 A with Ga coordination number of ~2.7 Therefore GaO4 tetrahedra are connected through the cor-ner~sharing mode and form their own clusters made of the tetrahedra sharing more than 3 corners while some chains or rings are also present. These connection schemes of the GaO4 tetrahedra are believed to form the substantial part of the network structure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.12
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• pp.1070-1078
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• 1998

A density of phonon is increased by application of electric field. At this time the phonon which has higher energy than around is called hot phonon is disappeared after 7 picosecond by scattering with electron and loss energy. Since the lifetime of phonon is very short, the effects of hot phonon can be neglected in the low speed semiconductor device, but it must be considered in high speed devices. DC and AC electric fields are applied to bulk GaAs, and the density of phonon is obtained and analyzed for its effects on electron velocity and electron distribution using Monte Carlo simulation method. Under high electric filed the density of hot phonon increased and energy of hot phonon is decreased by scattering with electron on the other hand the energy of electron is increased. Therefore electron move from central valley of conduntion band to satellite vallies and the valocity of electron decrease since the mass of electron in satellite vally is heavier than central vally. In millimeter wave frequencies, the effects of hot phonon increased at higher frequencies.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.9
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• pp.693-696
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• 2011

Recently, amorphous oxide semiconductors (AOSs) based thin-film transistors (TFTs) have received considerable attention for application in the next generation displays industry. The research trends of AOSs based TFTs investigation have focused on the high device performance. The electrical properties of the TFTs are influenced by trap density. In particular, the threshold voltage ($V_{th}$) and subthreshold swing (SS) essentially depend on the semiconductor/gate-insulator interface trap. In this article, we investigated the effects of Ar plasma-treated $SiO_2$ insulator on the interfacial property and the device performances of amorphous indium gallium zinc oxide (a-IGZO) TFTs. We report on the improvement in interfacial characteristics between a-IGZO channel layer and gate insulator depending on Ar power in plasma process, since the change of treatment power could result in different plasma damage on the interface.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.1
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• pp.12-17
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• 1998

The heteroepitaxial growth of InP and GaInAs on GaAs substrates has been studied by using a new combination of source materials: ethyldimethylindium (EDMIn) and trimethylgallium (TMGa) as group III sources, and tertiarybutylarsine (TBAs) and tertiarybutylphosphine (TBP) as group V sources. Device quality InP heteroepitaxial layers were obtained by using a two-step growth process under atmospheric pressure, involving a growth of an initial nucleation layer at low temperature followed by high temperature annealing and the deposition of epitaxial layer at a growth temperature. The continuity and thickness of nucleation layer were important parameters. The InP layers deposited at 500$^{\circ}$- 55$0^{\circ}C$ are all n-type, and the electron concentration decreases with decreasing TBP/EDMIn molar ratio. The excellent optical quality was revealed by the 4.4 K photoluminescence (PL) measurement with the full width at half maximum (FWHM) of 4.94 meV. Epitaxial Ga\ulcorner\ulcorner\ulcornerIn\ulcorner\ulcorner\ulcornerAs layers have been deposited on GaAs substrates at 500$^{\circ}$ - 55$0^{\circ}C$ by using InP buffer layers. The composition of GaInAs was determined by optical absorption measurements.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.150-153
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• 2004

본 논문에서는 780 nm 고출력 레이저 다이오드의 신뢰성을 향상시키기 위하여 DLTS(deep level transient spectroscopy)을 이용하여 MOCVD(metalorganic chemical vapor deposition) 성장 조건 변화에 따른 $Al_{0.48}Ga_{0.52}As$와 $Al_{0.1}Ga_{0.9}As$ 물질에서의 깊은준위(deep level)의 거동을 조사하였다. DLTS 측정결과, MOCVD로 성장된 막에서만 나타나는 결함(defect)으로 추정되는 trap A(0.3 eV), DX center로 알려진 trap B, 갈륨(Ga) vacancy와 산소(O2) 원자의 복합체(complex)에 의한 결함인 trap D(0.6 eV) 및 EL2 라고 불리우는 trap E(0.9 eV)의 네 가지 깊은준위들이 관측되었고, 성장 조건의 변화에 따라 깊은 준위들의 농도가 감소하는 것을 관측함으로써 최적 성장 조건을 찾을 수 있었다.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.6 s.171
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• pp.144-151
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• 2005

Spin coater is regarded as a major module rotating at high speed to be used build up polymer resin thin film layer fur bonding process of GaAs wafer. This module is consisted of spin unit for spreading uniformly, align device, resin spreading nozzle and et. al. Specially, spin unit which is a component of module can cause to vibrate and finally affect to the uniformity of polymer resin film layer. For the stability prediction of rotation velocity and uniformity of polymer resin film layer, it is very important to understand the dynamic characteristics of assembled spin coater module and the dynamic response mode resulted from rotation behavior of spin chuck. In this paper, stress concentration mode and the deformed shape of spin chuck generated due to angular acceleration process are presented using analytical method for evaluation of structural safety according to the revolution speed variation of spin unit. And also, deformation form of GaAs wafer due to dynamic behavior of spin chuck is presented fur the comparison of former simulated results.

• Restorative Dentistry and Endodontics
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• v.23 no.1
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• pp.269-277
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• 1998

This in vitro study compared the microleakage of 4 lining conditions when used with Gallium alloy GF II and Valiant PhD. Class V cavity was prepared on both buccal and lingual surface of 80 extracted human premolar & molar teeth with one margin in enamel and another in dentin. Before restoration, prepared cavities were applied to no-liner, cavity varnish, Scotchbond multipurpose, and Superbond D-liner II plus according to manufacture's instructions. The restored teeth were stored in saline for 1 week, then thermocycled for 100 times, stained with 0.5% basic fuchsin dye for 1 day, sectioned, and observed using a light microscope. Following results were obtained. 1. The leakage value of Superbond-lined group showed significantly lower than that of nolined group on both margins of Valiant PhD(p<0.05). 2; There was no significant difference between the 4 lining conditions in Gallium alloy GF II (p>0.05). 3. When We make a comparison between Gallium alloy GF II and Valiant PhD under same lining conditions, the microleakage value of Gallium alloy GF II showed lower than that of Valiant PhD on occlusal & gingival margin(p<0.05) except for Superbond-lined group(p>0.05).