• Journal of Surface Science and Engineering
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• v.43 no.5
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• pp.238-242
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• 2010

In the present work, the influence of oxide on the Cr-Si-N coatings was investigated for the Cr-Si-O-N coatings on AISI 304 and Si wafer deposited by hybrid system, which combines the DC magnetron sputtering technique and arc ion plating (AIP) using Cr and Si target in an $Ar/N_2/O_2$ gaseous mixture. As the O content in the Cr-Si-N coatings increased, the diffraction patterns of the Cr-Si-O-N coatings showed CrN and $Cr_2O_3$ phases. However, as the O content increased to 28.8 at.%, diffraction peak of $Cr_2O_3$ was disappeared in the Cr-Si-O-N coating. The $d_{200}$ value was decreased with increasing of O content. The average grain size increased from about 40 nm to 65 nm as the O content increased. The maximum micro-hardness of the Cr-Si-O-N coating was obtained 4507 Hk at the O content of 24.8 at.%. The average friction coefficient of the Cr-Si-O-N coatings was gradually decreased by increasing the O content and the average friction coefficient decreased from 0.37 to 0.25 by increasing the O content. These results indicated that amorphous phase was increased in the Cr-Si-O-N coatings by increasing of O content.

• Proceedings of the KSME Conference
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• 2004.04a
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• Korean Journal of Microbiology
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• v.33 no.2
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• pp.125-130
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• 1997

Microbial reduction of hexava1ent(VI) to trivalent(lII) chromium is regarded as one of the mechanisms that confers resistance to bacteria. In order to verify this hypothesis, we compared Cr(VI) resistance with Cr(VI) reduction among 20 phenotypically distinct environmental isolates from Cr-contaminated and uncontaminated soils. With glucose as an electron donor, Cr(VI) reduction by washed cell suspensions ranged from 0.014 to 0.305 mM Cr(VI) reduced $h^1$. Cr(VI) resistance of the isolates were measured by growth inhibitions on a liquid medium containing 2 mM Cr(VI) based on their decrease of $A_{630}1$ as compared to the controls without Cr(VI). The isolates had a broad range of resistance from no inhibition to 93.4% inhibition of their growth. Upon correlation analysis, there was no significant relationship between those two phenomena. At a population level, a comparison of % resistant viable counts among the Cr-contaminated and uncontaminated soils showed 19.1 % and 0.4% of their total viable counts, respectively. The difference of % resistance between two site,. strongly suggested that the Cr(VI) present in the soils influences natural selection for resistant phenotypes. However, it is unlikely that the Cr(VI) resistance is dependent solely on the reduction as judged by the correlation analysis.

• Journal of Sensor Science and Technology
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• v.5 no.5
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• pp.69-77
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• 1996

In this paper, we fabricated the micro hotplate which consisted of a thin film heater(Pt/Cr bilayers) sandwiched with the thermal oxide and E-beam evaporated oxide. And we studied the electrical and the structural properties of Pt/Cr bilayers due to annealing temperature. When we compared the temperature measured from type k thermocouples with the temperature acquired from I.R. thermo-vision system according to the variations of emissivity, the emissivity of I-beam evaporated oxide was 0.5. The sheet resistance of Pt/Cr bilayers didn't depend on the Cr layer thickness, and it was considered as the existence of CrO between the Pt and the Cr layer. When the annealing temperature was increased from $500^{\circ}C$ to $700^{\circ}C$, the out-diffusions of Cr were increased(which was confirmed by AES depth profile) and the grain size of Pt(220) phase was enlarged also(analyzed by XRD and SEM photographs). From the results of XRD analysis and AES depth profile, the Pt/Cr bilayers annealed at $500^{\circ}C$ were more stable than any other cases in structural properties.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.167-168
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• 2012

Films of CrN, $Cr_{40}Zr_9N$, and $Cr_{31}Zr_{16}N$ were deposited on a steel substrate by closed field unbalanced magnetron sputtering, and their oxidation behaviors at $700^{\circ}C$ and $800^{\circ}C$ for up to 60h in air were investigated. All the deposited films were composed of the CrN phase. Zirconium atoms in $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films partially dissolved in the CrN phase. They advantageously refined the columnar structure, reduced the surface roughness, and increased the microhardness. The CrN film displayed relatively good oxidation resistance, owing to the formation of the highly protective $Cr_2O_3$ on its surface. The $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films oxidized to $Cr_2O_3$ as the major phase and ${\alpha}-ZrO_2$ as the minor one. They oxidized primarily by the inward transport of oxygen. The addition of Zr could not increase the oxidation resistance of the CrN film, because the formed $ZrO_2$ that was intermixed in the $Cr_2O_3$-rich oxide layer was oxygen permeable, and developed the compressive stress in the oxide scale owing to the volume expansion during its formation.

• Journal of the Korean Magnetics Society
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• v.4 no.1
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• pp.20-24
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• 1994

The read/write characteristics of CoCr/NiFe double layered media are strongly affected by the magnetic properties of NiFe magnetic soft layer as well as those of CoCr recording layer. Modification of the permalloy layer by NiFe/Ge multilayer scheme resulted in the higher recording sensitivity and the higher reproduced voltage of CoCr/NiFe medium and this is attributed to the higher permeability of the back layer and high perpendicular anisotropy of the CoCr recording layer. Although higher permeability of back layer results in higher recording sensitivity, the increment of the reproduced voltage was not remarkable, which can be confirmed in the FEM numerical analysis. On the contrary, peak shift characteristics of the CoCr/NiFe medium with the NiFe multi back layer was deteriorated compared to that of the CoCr/NiFe medium with NiFe single back layer. Insertion of ferromagnetic thin CoZrNb intermediate layer between CoCr and NiFe layer was effective to ensure large reproduced voltage and low peak shift. These recoridng characteristics were also discussed in connection with microstructural characteristics.

• Journal of Korean Society of Environmental Engineers
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• v.27 no.6
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• pp.590-598
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• 2005

An adequate method to identify chromium separation, Cr(III) and Cr(VI), in water samples were studied by using High Performance Liquid Chromatography(HPLC) coupled with Inductively Coupled Plasma Mass Spectometer(ICP-MS) equipped with Dynamic Reaction Cell(DRC). The characteristic distribution of Cr(III) and Cr(VI) in the raw water taken at the six water intake stations in Seoul, was analyzed by the method developed by the authors. The chromium species separated by HPLC was isocratically conducted by using tetrabutylammonium phosphate monobasic(1.0 mM TBAP), ethylenediaminetetraacetic acid(0.6 mM EDTA) and 2% v/v methanol as the mobile phase. 5% v/v methanol was used as flushing solvent. A reactive ammonia($NH_3$) gas was used to eliminate the potential interference of $ArC^+$. Several Parameters such as solvent ratio, pH, flow rate and sample injection volume were optimized for the successful separation and reproducibility. Although it has been reported thai the separation sensitivity of Cr(III) is superior to that of Cr(VI), the authors observed Cr(VI) was more sensitive than Cr(III) when ammonia($NH_3$) gas was used as the reaction gas. It took less than 3 minutes to analyze chromium species with this method and the estimated detection limits were $0.061\;{\mu}g/L$ for Cr(III) and $0.052\;{\mu}g/L$, for Cr(VI). According to the results from the analysis on chromium species in the raw water of the six intake stations, the concentrations of Cr(III) ranged from 0.048 to $0.064\;{\mu}g/L$(ave. $0.054\;{\mu}g/L$) while that of Cr(VI) ranged from 0.014 to $0.023\;{\mu}g/L$(ave. $0.019\;{\mu}g/L$). Recovery ratio was very high($90.1{\sim}94.1%$). There were two or three times more Cr(III) than Cr(VI) in the raw water.

• Journal of the Korean Chemical Society
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• v.41 no.10
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• pp.561-565
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• 1997

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.55-55
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• 2001

• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.4
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• pp.138-141
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• 2001

The fluorescence emission spectrum of Cr$^{3+}$ doped BeAl$_{6}$ O$_{10}$ crystals at 300 K contains a broad band, three R-like lines and another emission lines. It has been identified by a lifetime resolution spectroscopic technique that there are three kinds of single-Cr$^{3+}$ centers, Cr(I), Cr(II), Cr(III), in this crystal. Cr(I) and Cr(II) are high-crystal field centers responsible for the three main "R-lines", and Cr(III) is a low-crystal field center responsible for the main broad band emission. The structures of these luminescent centers are reported.ted.