• 제목/요약/키워드: (Bi0.5K0.5)TiO3

검색결과 158건 처리시간 0.03초

Fabrication of Nd-Substituted Bi4Ti3O12 Thin Films by Metal Organic Chemical Vapor Deposition and Their Ferroelectrical Characterization

  • Kim, Hyoeng-Ki;Kang, Dong-Kyun;Kim, Byong-Ho
    • 한국세라믹학회지
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    • 제42권4호
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    • pp.219-223
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    • 2005
  • A promising capacitor, which has conformable step coverage and good uniformity of thickness and composition, is needed to manufacture high-density non-volatile FeRAM capacitors with a stacked cell structure. In this study, ferroelectric $Bi_{3.61}Nd_{0.39}Ti_3O_{12}$ (BNdT) thin films were prepared on $Pt(111)/TiO_2/SiO_2/Si$ substrates by the liquid delivery system MOCVD method. In these experiments, $Bi(ph)_{3}$, $Nd(TMHD)\_{3}$ and $Ti(O^iPr)_{2}(TMHD)_{2}$ were used as the precursors and were dissolved in n-butyl acetate. The BNdT thin films were deposited at a substrate temperature and reactor pressure of approximately $600^{\circ}C$ and 4.8 Torr, respectively. The microstructure of the layered perovskite phase was observed by XRD and SEM. The remanent polarization value (2Pr) of the BNdT thin film was $31.67\;{\mu}C/cm^{2}$ at an applied voltage of 5 V.

PEMOCVD에 의한 강 유전체 $\textrm{SrBi}_{2}\textrm{Ta}_{2}\textrm{O}_{9}$박막의 제조 및 증착온도 특성 (Preparation and Characteristics of Ferroelectric $\textrm{SrBi}_{2}\textrm{Ta}_{2}\textrm{O}_{9}$ Thin Films Deposited by Plasma-Enhanced Metalorganic Chemical Vapor Deposition Technique with Various Deposition Temperatures)

  • 성낙진;윤순길
    • 한국재료학회지
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    • 제7권5호
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    • pp.381-385
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    • 1997
  • PEMOCVD에 의해서 SrBi$_{2}$Ta$_{2}$O$_{9}$밥막이 낮은 온도에서 성공적으로 Pt/Ti/SiO$_{2}$Si위에 증착되었다. 5$50^{\circ}C$에서 증착된 200nm박막은 치밀하고 작은 결정립을 보였으며 3V의 인가전압하에서 이력곡선은 포화되기 시작하였다. 3V에서 박막은 잔류분극 (P$_{r}$)과 항전계(E$_{c}$)는 각각 15$\mu$/$\textrm{cm}^2$과 50kV/cm이었다. 6V bipolar square pulse의 피로측정에서 박막은 1.0x$10^{11}$cycles까지 피로 현상을 보이지 않았다. PEMOCVD에 의해서 5$50^{\circ}C$에서 증착된 SBT박막은 비휘발성 기억소자에 충분히 활용할 수 있다.다.

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Bi$_{4}$Ti$_{3}$O$_{12}$ 박막의 제작과 그 특성에 관한 연구 (Preparation of a Bi$_{4}$Ti$_{3}$O$_{12}$ Thin Film and Its Electrical Properties)

  • 강성준;장동훈;민경진;김성진;정양희;윤영섭
    • 대한전자공학회논문지SD
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    • 제37권4호
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    • pp.7-14
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    • 2000
  • Bi/sub 4/Ti/sub 3/O/sub 12/ (BIT) 박막을 acetate 계 precursor 를 이용한 sol-gel 법으로 제작한 후, 구조적 및 전기적 특성을 조사하여 NVFRAM (Won-Volatile Ferroelectric RAM)으로의 응용가능성을 조사하였다. DT-TG (Differential Thermal-Thermal Gravimetric) 분석으로 drying 온도와 annealing 온도가 각각 400℃ 와 650℃ 인 BIT 박막의 열처리조건을 확립하였다. Pt/Ta/Sio/sub 2//Si 기판 위에 제작된 BIT 박막은 완전한 orthorhombic perovskite상을 가지며, 입자크기가 약 100nm 이고 표면 거칠기는 약 70.2Å 으로 비교적 치밀한 형상을 나타내었다. 10㎑ 의 주파수에서 비유전률과 유전손실은 각각 176 과 0.038 이었으며, 100 ㎸/cm 의 전기장에서 누설전류밀도는 4.71㎂/㎠ 이었다. ±250㎸/㎝ 에서 이력곡선을 측정한 결과, 잔류분극 (Pr)과 항전계 (Ec)는 각각 5.92μC/㎠ 과 86.3㎸/㎝ 이었다. BIT 박막에 ±5V 의 사각펄스를 인가하여 피로특성을 측정한 결과, 잔류분극은 초기값 5.92μC/㎠ 에서 10/sup 9/회에서는 3.95μC/㎠ 로 약 33% 감소하였다.

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RF-마그네트론 스퍼터링법으로 제작한 이층형 PZT의 특성평가 (Evaluating Properties for Bi-layer PZT thin film Fabricated by RF-Magnetron Sputtering System)

  • 임실묵
    • 한국산학기술학회논문지
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    • 제21권8호
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    • pp.222-227
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    • 2020
  • 페로부스카이트(Perovskite) 구조의 Pb(Zr,Ti)O3(PZT)는 우수한 강유전 특성으로 인해 유전체, 압전체, 초전체 재료로 널리 사용된다. Pb1.3(Zr0.52Ti0.48)O3조성의 스퍼터링 타겟을 제조하여 RF 마그네트론 스퍼터링 공정으로 PZT박막을 형성하였다. PZT박막은 동일 스퍼터링 출력으로 연속 제조한 단층형 PZT와 2단계화한 스퍼터링 출력으로 제조한 2층형 PZT박막으로 구분하여 제조하였다. 2층형의 PZT는 저출력의 스퍼터링 조건으로 제작한 하부층과, 단층형 PZT와 동일한 조건으로 제작한 상부층으로 이루어진다. 제조한 박막에 대한 엑스선 회절분석결과, 단층형 PZT에서는 페로부스카이트상(Perovskite Phase)과 미소한 파이로클로르상(Pyrochlore Phase)이 혼합된 상태로 존재하나, 2층형 PZT에서는 페로부스카이트상만이 검출되었다. 전자현미경과 원자힘 현미경으로 표면상태를 관찰한 결과, 2층형 PZT박막의 상부는 단층형에 비해 치밀하고 평활한 표면상태를 나타냈으며, 단층형에 비해 낮은 표면거칠기값(RMS)을 보였다. 또한 이층형 PZT는 단층형에 비해 우수한 대칭성의 분극곡선형태를 보였고, 단층형에 비해 매우 저감된 1×10-5 A/㎠ 이하수준의 누설전류 특성을 나타냈다. 이층형 PZT에서 보이는 이러한 현상은 치밀하게 형성한 하부 PZT층이 순차적으로 형성되는 상부PZT내의 미소 파이로클로르상 형성을 억제하여, 순수한 페로부스카이트상으로의 성장을 유도한 것으로 판단된다.

Ferroelectric and Structural Properties of Nd-substituted $Bi_4Ti_3O_{12}$ Thin Films Fabricated by MOCVD

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2006년도 추계학술대회 발표 논문집
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    • pp.166-169
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    • 2006
  • A promising capacitor, which has conformable step coverage and good uniformity of thickness and composition, is needed to manufacture high-density non-volatile FeRAM capacitors with a stacked cell structure. In this study, ferroelectric $Bi_{3.61}Nd_{0.39}Ti_3O_{12}$ (BNT) thin films were prepared on $Pt(111)/Ti/SiO_2/Si$ substrates by the liquid delivery system MOCVD method. In these experiments, $Bi(ph)_3$, $Nd(TMHD)_3$ and $Ti(O^iPr)_2(TMHD)_2$ were used as the precursors and were dissolved in n-butyl acetate. The BNT thin films were deposited at a substrate temperature and reactor pressure of approximately $600^{\circ}C$ and 4.8 Torr, respectively. The microstructure of the layered perovskite phase was observed by XRD and SEM. The remanent polarization value (2Pr) of the BNT thin film was $31.67\;{\mu}C/cm^2$ at an applied voltage of 5 V.

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Damascene 공정으로 제조한 $Bi_{3.25}La_{0.75}Ti_3O_{12}$ 박막 캐패시터 소자 특성 (Properties of $Bi_{3.25}La_{0.75}Ti_3O_{12}$ Thin Film Capacitors Fabricated by Damascene Process)

  • 신상헌;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.368-369
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    • 2006
  • Ferroelectric thin films have attracted much attention for applications in nonvolatile ferroelectric random access memories(NVFeRAM) from the view points of high speed operation, low power consumption, and large scale Integration[1,2]. Among the FRAM, BLT is of particular interest. as it is not only crystallized at relatively low processing temperature, but also shows highly fatigue resistance and large remanent polarization Meanwhile, these submicron ferroelectric capacitors were fabricated by a damascene process using Chemical mechanical polishing (CMP). BLT capacitors were practicable by a damascene process using CMP. The P-E hysteresis were measured under an applied bias of ${\pm}5V$ by using an RT66A measurement system. The electric properties such as I-V were determined by using HP4155A analysers.

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저온 소성용 $SiO_2-TiO_2-Bi_2O_3-RO$계 (RO;BaO-CaO-SrO) Glass/Ceramic 유전체의 $AI_2O_3$ 함량에 따른 소결 및 유전 특성의 변화 (A study on the sintering and Dielectric Characteristics of Low Temperature Sinterable $SiO_2-TiO_2-Bi_2O_3-RO$ System (RO:BaO-CaO-SrO) Glass/Ceramic Dielectrics as a Function of $AI_2O_3$ Content)

  • 윤장석;이인규;임욱;조현민;박종철
    • 한국세라믹학회지
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    • 제36권12호
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    • pp.1350-1355
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    • 1999
  • Sintering characteristics and dielectric properties of low temperature sinterable Glass/Ceramic dielectric materials were investigated. The dielectric materials which were developed for microwave frequency applications consist of SiO2-TiO2-Bi2O3-RO system(RO:BaO-CaO-SrO) crystallizable glass and Al2O3 as a ceramic filler. Sintering experiments showed that no more densification occurred above 80$0^{\circ}C$ and bulk density and shrinkage depended on Al2O3 content only. Results of dielectric measurements showed that $\varepsilon$r Q$\times$f and $\tau$f of the material containing 30wt% Al2O3 were 17.3, 600 and +23 ppm respectively. Those values for 45 and 60wt% Al2O3 samples were 11.6, 1400, +0.7 ppm and 7.2, 2000, -8.5 ppm, repectively. The results clearly showed that the Glas/Ceramic materials of present experiment decreased in $\varepsilon$r and increased in $\times$f value and changed from positive to negative value in $\tau$f value with the increasement of Al2O3 content.

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Sol-Gel법으로 증착된 $Bi_4Ti_3O_{12}$ 박막의 형태적, 구조적 특성과 강유전성에 Gadolinium 치환이 미치는 효과 (Influence of Gd Substitution on the Morphological, Structural and Ferroelectric Properties of $Bi_4Ti_3O_{12}$ Thin Films Obtained by Sol-Gel Method)

  • 강동균;김병호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.341-342
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    • 2006
  • Gadolinium-substituted bismuth titanate, $Bi_{3.3}Gd_{0.7}Ti_3O_{12}$ (BGT), thin films were successfully fabricated on Pt(111)/Ti/$SiO_2$/Si substrates by a sol-gel method and their structural and ferroelectric properties have been characterized. Fabricated BGT thin films were found to be random orientations, which were confirmed by X-ray diffraction experiment and scanning electron microscope analysis. The remanent polarization ($2P_r$)) of BGT thin film annealed at $720^{\circ}C$ was $25.85\;{\mu}C/cm^2$ at an applied voltage of 5 V. The BGT thin films exhibited a 11 % reduction in their switching charge after no less than $10^{11}$ switching cycles at a frequency of 1 MHz.

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NKN-(1-x)BNT-xBT 세라믹스의 압전 및 유전특성 (Piezoelectric and Dielectric Properties of NKN-(1-x)BNT-xBT Ceramics)

  • 이승환;남성필;이성갑;이영희
    • 한국전기전자재료학회논문지
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    • 제23권10호
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    • pp.771-775
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    • 2010
  • In this study, piezoelectric and dielectric properties of the $(Na_{0.5}K_{0.5})NbO_3-(1-x)(Bi_{0.5}Na_{0.5})TiO_3-xBaTiO_3$ [NKN-(1-x)BNT-xBT] ceramics were investigated. The lead-free NKN-(1-x)BNT-xBT ceramics were fabricated by a conventional mixed oxide method. The results indicate that the addition of $BaTiO_3$ significantly influences the sintering, microstructure, phase transition and electrical properties of NKN-BNT ceramics. A gradual change in the piezoelectric and dielectric properties was observed with the increase of BT contents. The dielectric constant, piezoelectric constant ($d_{33}$) and electromechanical coupling factor ($k_p$) increased at the morphotropic phase boundary (MPB). The $d_{33}$=184 pC/N, $k_p$=0.38, dielectric constant=1455 with dielectric loss value of less than 1% were obtained for the NKN-0.95BNT-0.05BT ceramics sintered at $1150^{\circ}C$ for 2h. These results demonstrate that the NKN-(1-x)BNT-xBT ceramics is an attractive candidate for lead-free piezoelectric materials.

The Microstructure and Ferroelectric Properties of Ce-Doped Bi4Ti3O12 Thin Films Fabricated by Liquid Delivery MOCVD

  • Park, Won-Tae;Kang, Dong-Kyun;Kim, Byong-Ho
    • 한국세라믹학회지
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    • 제44권8호
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    • pp.403-406
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    • 2007
  • Ferroelectric Ce-doped $Bi_4Ti_3O_{12}$ (BCT) thin films were deposited by liquid delivery metal organic chemical vapor deposition (MOCVD) onto a $Pt(111)/Ti/SiO_2/Si(100)$ substrate. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to identify the crystal structure, the surface, and the cross-section morphology of the deposited ferroelectric flims. After annealing above $640^{\circ}C$, the BCT films exhibited a polycrystalline structure with preferred (001) and (117) orientations. The BCT lam capacitor with a top Pt electrode showed a large remnant polarization ($2P_r$) of $44.56{\mu}C/cm^2$ at an applied voltage of 5 V and exhibited fatigue-free behavior up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz. This study clearly reveals that BCT thin film has potential for application in non-volatile ferroelectric random access memories and dynamic random access memories.