• 제목/요약/키워드: $ZnO@SiO_2$

검색결과 888건 처리시간 0.027초

A Study or the Crystallographic Properties or ZnO/SiO2/Si Thin Film for FBAR (FBAR용 ZnO/SiO2Si 박막의 결정학적 특성에 관한 연구)

  • 금민종;손인환;최명규;추순남;최형욱;신영화;김경환
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제16권8호
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    • pp.711-715
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    • 2003
  • In this study, we prepared ZnO/glass and ZnO/SiO$_2$/Si thin film by Facing Targets Sputtering (FTS) system for Film Bulk Acoustic Resonator (FBAR). When the ZnO thin film applied to piezoelectric thin film, it requires good c-axis preferred orientation. And c-axis orientation has a remarkable difference with preparation conditions. Therefore, c-axis orientation must be significantly evaluated as a function of deposition conditions. Moreover, in order to prepare ZnO thin film with good crystallographic properties and progressive of efficiency of product process, the ZnO thin film should be prepared as low temperature as possible. In this work, we prepared ZnO thin films on slide glass and SiO$_2$/Si substrate. And the crystallographic characteristics of ZnO thin films on sputtering conditions were investigated by alpha-step and X-ray diffraction.

Dependence of the Diode Characteristics of ZnO/b-ZnO/p-Si(111) on the Buffer Layer Thickness and Annealing Temperature (버퍼막 두께 및 버퍼막 열처리 온도에 따른 ZnO/b-ZnO/p-Si(111)의 전기적 특성 변화 및 이종접합 다이오드 특성 평가)

  • Heo, Joo-Hoe;Ryu, Hyuk-Hyun
    • Journal of the Korean Vacuum Society
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    • 제20권1호
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    • pp.50-56
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    • 2011
  • In this study, the effects of ZnO buffer layer thickness and annealing temperature on the heterojunction diode, ZnO/b-ZnO/p-Si(111), were reported. The effects of those on the structural and electrical properties of zinc oxide (ZnO) films on ZnO buffered p-Si (111) substrate were also studied. Structural properties of ZnO thin films were studied by X-ray diffraction and I-V characteristics were measured by a semiconductor parameter analyzer. ZnO thin films with 70 nm thick buffer layer and annealing temperature of $700^{\circ}C$ showed the best c-axis preferred orientation. The best electrical property was found at the condition of buffer layer annealing temperature of $700^{\circ}C$ and 50nm thick ZnO buffer layer (resistivity: $2.58{\times}10^{-4}[{\Omega}-cm]$, carrier concentration: $1.16{\times}1020[cm^{-3}]$). The I-V characteristics for ZnO/b-ZnO/p-Si(111) heterojunction diode were improved with increasing buffer layer thickness at buffer layer annealing temperature of $700^{\circ}C$.

Low-temperature sintering and microwave dielectric properties of $ZnAl_2O_4$ with ZnO-$B_2O_3-SiO_2$ glass (ZnO-$B_2O_3-SiO_2$ 유리가 첨가된 $ZnAl_2O_4$의 저온 소결 및 마이크로파 유전 특성)

  • Kim, Kwan-Soo;Yoon, Sang-Ok;Kim, Shin;Kim, Yun-Han;Lee, Joo-Sik;Kim, Kyung-Mi
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.265-265
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    • 2007
  • In the present work, we have studied low temperature sintering and microwave dielectric properties of $ZnAl_2O_4$-zinc borosilicate (ZBS, 65ZnO-$25B_2O_3-10SiO_2$) glass composites. The focus of this paper was on the improvement of sinterability, low dielectric constant, and on the theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-ZBS glass composites, respectively. The $ZnAl_2O_4$ with 60 vo1% ZBS glass ensured successful sintering below $900^{\circ}C$. It is considered that the non-reactive liquid phase sintering (NPLS) occurred. In addition, $ZnAl_2O_4$ was observed in the $ZnAl_2O_4$-(x)ZBS composites, indicating that there were no reactions between $ZnAl_2O_4$ and ZBS glass. $ZnB_2O_4\;and\;Zn_2SiO_4$ with the willemite structure as the secondary phase was observed in the all $ZnAl_2O_4$-(x)ZBScomposites. In terms of dielectric properties, the application of the $ZnAl_2O_4$-(x)ZBS composites sintered at $900^{\circ}C$ to LTCC substrate were shown to be appropriate; $ZnAl_2O_4$-60ZBS (${\varepsilon}_r$= 6.7, $Q{\times}f$ value= 13,000 GHz, ${\tau}_f$= -30 ppm/$^{\circ}C$). Also, in this work was possible theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-(x)ZBS composites.

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Preparation and Luminescent Properties of Zn2SiO4:Mn, Ga Phosphors (Zn2SiO\4:Mn, Ga 형광체의 제조와 발광특성)

  • Lee, Ji-Young;Yu, Yun-Sik;Yu, Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제22권2호
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    • pp.158-162
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    • 2009
  • $Zn_2SiO_4$:Mn green phosphors doped with Ga for PDP were synthesized by solid state reaction method. Photoluminescence measurements showed a new emission peak at around 600 nm for $Zn_2SiO_4$:Mn phosphors doped with Ga. Also, the luminescent color with doping $Ga^{3+}$ in the $Zn_2SiO_4$:Mn phosphors changed to green from yellowish green. Consequently, the new peak and charge of the luminescent color in the $Zn_2SiO_4$:Mn, Ga phosphors were attributed to $^2E{\rightarrow}^6A_2$ transition of $Mn^{4+}$.

Preparation of Monodispersed $SiO_2/ZnO$ Composite Fine Powders by Sol-Gel Method (졸-겔법엔 의한 단분산 $SiO_2/ZnO$ 복합미립자의 졔조)

  • Lee, Chang-Woo;Shim, Won;Hahm, Yeong-Min;Hur, Yun-Haeng
    • Journal of environmental and Sanitary engineering
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    • 제13권3호
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    • pp.58-65
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    • 1998
  • Monodispersed $SiO_2/ZnO$ composite fine powders were prepared by Sol-Gel processing and their surface electrical and UV absorbance properties were investigated. Pseudomorph ZnO fine powders were microcapsuled by $SiO_2/ZnO$ sol fabricated using TEOS[tetraethylorthosilicate, purity 98% and ethanol as a solvent with $NH_3$ catalyst. The effects of experimental parameters such as molar ratio of starting materials on the final particle size and shape of $SiO_2/ZnO$ composite fine powder were discussed. As a result, we could controlled the size of monodispersed $SiO_2/ZnO$ composite fine powders without agglomeration, as well as the good dispersibility in aquous solution. The prepared powders were observed to have the mean particle sizes of $0.26-0.78{\mu}m$ with standard deviations of $0.020-0.063{\mu}m$.

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Preparation and Luminescent Properties of Zn2SiO4:Mn,Al Green Phosphors (Zn2SiO4:Mn,Al 녹색 형광체의 제조와 발광특성)

  • Lee, Ji-Young;Yu, Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제20권4호
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    • pp.363-366
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    • 2007
  • [ $Zn_2SiO_4:Mn$ ] green phosphors doped with $NH_4Cl$ and Al for PDP were synthesized by solid state reaction method. The luminescence of 532 nm in $Zn_2SiO_4:Mn$ phosphors was associated with $^4T_1{\to}^6A_1$ transition. Photoluminescence intensity of $Zn_2SiO_4:Mn$ doped with $NH_4Cl$ 15 mol% increased about two times as compared with that of $NH_4Cl$ non-doped sample. The color of the emission of Al-doped $Zn_2SiO_4:Mn$ phosphors changed to yellowish green.

Synthesis of Mn-doped Zn2SiO4 phosphor particles by solid-state method at relatively low temperature and their photoluminescence characteristics (상대적으로 낮은 온도에서의 고상법에 의한 망간이 도핑된 Zn2SiO4 형광체 입자의 제조 및 형광특성)

  • Lee, Jin-Hwa;Choi, Seung-Ok;Lee, Dong-Kyu
    • Journal of the Korea Academia-Industrial cooperation Society
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    • 제11권1호
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    • pp.228-233
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    • 2010
  • Mn-doped $Zn_2SiO_4$ phosphor particles having submicrometer sizes were synthesized by a solid-state reaction method using methyl hydrogen polysiloxane-treated ZnO, fumed $SiO_2$ and various Mn sources. The crystallization and photoluminescent properties of the phosphor particles were investigated by X-ray diffraction(XRD), scanning electron microscope(SEM), and by their photoluminescence(PL) spectra. Due to the effect of the dispersion and coherence of the methyl hydrogen polysiloxane-treated ZnO, the Mn-doped $Zn_2SiO_4$ particles were successfully obtained by a solid state method at $1000^{\circ}C$, and the maximum PL intensity of the prepared particles under vacuum ultra violet(VUV) excitation occurred at a Mn concentration of 0.02mol and a sintering temperature of $1000^{\circ}C$.

Optical Properties of Transparent Electrode ZnO Thin Film Grown on Carbon Doped Silicon Oxide Film (탄소주입 실리콘 산화막 위에 성장한 투명전극 ZnO 박막의 광학적 특성)

  • Oh, Teresa
    • Journal of the Semiconductor & Display Technology
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    • 제11권2호
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    • pp.13-16
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    • 2012
  • Zinc oxide (ZnO) films were deposited by an RF magnetron sputtering system with the RF power of 200W and 300W and flow rate of oxygen gases of 20 and 30 sccm, in order to research the growth of ZnO on carbon doped silicon oxide (SiOC) thin film. The reflectance of SiOC film on Si film deposited by the sputtering decreased with increasing the oxygen flow rate in the range of long wavelength. In comparison between ZnO/Si and ZnO/SiOC/Si thin film, the reflectance of ZnO/SiOC/Si film was inversed that of ZnO/Si film in the rage of 200~1000 nm. The transmittance of ZnO film increased with increasing the oxygen gas flow rate because of the transition from conduction band to oxygen interstitial band due to the oxygen interstitial (Oi) sites. The low reflectance and the high transmittance of ZnO film was suitable properties to use for the front electrode in the display or solar cell.

A Study on the Transparent Glass-Ceramics On Al2O3-SiO2 System (투명 결정화 유리에 관한 연구 - $Al_2O_3-SiO_2$계에 관하여)

  • 박용완;김용욱
    • Journal of the Korean Ceramic Society
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    • 제29권3호
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    • pp.223-231
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    • 1992
  • CaO and ZnO were added to Al2O3-SiO2 binary system respectively as flux, then ZrO2 and TiO2 were applied as nucleating agent to these CaO-Al2O3-SiO2 and ZnO-Al2O3-SiO2 ternary system glass. The transparency could not be kept in CaO-Al2O3-SiO2 system glass, whereas the transparent glass-ceramics were prepared in ZnO-Al2O3-SiO2 system glass containing ZrO2 as the nucleating agent. At this time the optimum heating temperatures for the nucleation and the crystal growth were 78$0^{\circ}C$ and 97$0^{\circ}C$. The sizes of the precipitated crystals in the transparent glass-ceramics were below 0.1 ${\mu}{\textrm}{m}$, and their light transmissibilities were more than 80%.

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