• Title/Summary/Keyword: $UV/O_3$

Search Result 1,583, Processing Time 0.031 seconds

Effect of Nitrite and Nitrate as the Source of OH Radical in the O3/UV Process with or without Benzene

  • Son, Hyun-Seok;Ahammad, A.J. Saleh;Rahman, Md. Mahbubur;Noh, Kwang-Mo;Lee, Jae-Joon
    • Bulletin of the Korean Chemical Society
    • /
    • v.32 no.spc8
    • /
    • pp.3039-3044
    • /
    • 2011
  • This study suggests the prediction model for the concentration variation of $NO_2{^-}$ and $NO_3{^-}$ along with the rate constants of all reactions during ozonation under UV radiation ($O_3$/UV process). While $NO_2{^-}$ was completely converted into $NO_3{^-}$ during the $O_3$-only process, the production of $NO_2$ radical or $N_2O_4$ was expected in the $O_3$/UV process. In addition, the quenching of OH radicals, by $NO_2$ radical in the $O_3$/UV process, resulted in regeneration of $NO_2{^-}$. However, the regeneration of $NO_2{^-}$ was not observed in the $O_3$/UV process in the presence of $C_6H_6$ where the concentrations of $NO_2{^-}$ and $NO_3{^-}$ were significantly reduced compared to in the process without $C_6H_6$. The pseudo-first order rate constants of all species were calculated with and without the presence of $C_6H_6$ to predict the variation of concentrations of all species during the $O_3$/UV process. It was suggested that $NO_2{^-}$ and $NO_3{^-}$ in the $O_3$/UV process can be more effectively removed from an aqueous system with an OH radical scavenger such as $C_6H_6$.

UV/O3 Process Time Effect on Electrical Characteristics of Sol-gel Processed CuO Thin Film Transistor (UV/O3 조사 시간에 따른 Sol-gel 공정 기반 CuO 박막 트랜지스터의 전기적 특성 변화)

  • Lee, Sojeong;Jang, Bongho;Kim, Taegyun;Lee, Won-Yong;Jang, Jaewon
    • Journal of IKEEE
    • /
    • v.22 no.1
    • /
    • pp.1-5
    • /
    • 2018
  • In this research, sol-gel processed CuO p-type thin film transistors were fabricated with copper (II) acetate monohydrate precursors. After $500^{\circ}C$ annealing process, the deposited thin films were fully converted into CuO. We investigated $UV/O_3$ process time effect on electrical characteristics of sol-gel processed CuO thin film transistors. After 600 sec $UV/O_3$ process, the fabricated CuO thin film transistor delivered field effect mobility in saturation regime of $5{\times}10^{-3}\;cm^2/V{\cdot}s$ and on/off current ratio of ${\sim}10^2$.

UV-enhanced Atomic Layer Deposition of Al2O3 Thin Film

  • Yun, Gwan-Hyeok;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.256-256
    • /
    • 2011
  • We have deposited Al2O3 thin films on Si substrates at room temperature by UV-enhanced atomic layer deposition using trimethylaluminum (TMA) and H2O as precursors with UV light. The atomic layer deposition relies on alternate pulsing of the precursor gases onto the substrate surface and subsequent chemisorption of the precursors. In many cases, the surface reactions of the atomic layer deposition are not completed at low temperature. In this experiment, the surface reactions were found to be self-limiting and complementary enough to yield uniform Al2O3 thin films by using UV irradiation at room temperature. The UV light was very effective to obtain the high quality Al2O3 thin films with defectless.

  • PDF

A Study on the Swine Wastewater Treatment Using UV/TiO2/H2O2 (UV/TiO2/H2O2를 이용한 축산폐수처리에 대한 연구)

  • Kim, Chang-Kyun;Chung, Ho-Jin
    • KSCE Journal of Civil and Environmental Engineering Research
    • /
    • v.26 no.3B
    • /
    • pp.321-327
    • /
    • 2006
  • This study was performed to provide basic information for evaluating the efficiency and applicable extent of photocatalysis for the treatment of swine wastewater. Acid area was more efficient than neutral and alkalic areas in wastewater treatment, and level of pH3 was the most effective and the treatment efficiency continually increased as the amount of photocatalyst was increased. When the photocatalyst was increased, $TCOD_{Mn}$ was removed faster than chromaticity. Pollutants were more effectively eliminated with both UV light illumination and $TiO_2$ than with either UV or $TiO_2$ alone. The removal efficiency was increased with the addition of $H_2O_2$ as an oxidant, but the removal efficiency was decreased with over an dosage of $H_2O_2$. The optimal dosage of $H_2O_2$ was 200 mg/L. Continuous injection of $H_2O_2$ was required for effective oxidation.

Applicability of UV and UV/$H_2O_2$ Processes in the Control of Pharmaceuticals and Personal Care Products and Microbiological Safety for Water Reuse (잔류 의약품류의 제거 및 미생물학적 안전성을 고려한 하수 재이용 기술로서의 UV 및 UV/$H_2O_2$ 공정의 적용성)

  • Kim, Il-Ho;Tanaka, Hiroaki
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.32 no.7
    • /
    • pp.722-729
    • /
    • 2010
  • Over the last decades, much consideration has been given to microbiological and chemical risks, especially when wastewater was reclaimed as water resources for urban water, irrigation water and recreational water etc. We investigated the performance of UV-based processes such as UV and UV/$H_2O_2$ for both the removal of pharmaceuticals and personal care products (PPCPs) as an emerging chemical and the inactivation of pathogen with bench-scale experimental study. 38 kinds of PPCPs including antibiotics and analgesics were detected from secondary effluent used as tested water. Bench-scale experimental study showed that UV process would require considerable UV dose for the effective PPCPs removal. Contrarily, PPCPs removal efficiency significantly improved by the combination of $H_2O_2$ with UV even at a lower UV dose and, moreover, their removal efficiency increased with the increased initial $H_2O_2$ concentration. Besides naproxen (>89%), concentrations of all the investigated PPCPs decreased by more than 90% of their initial concentrations under $923\;mJ/cm^3$ of UV dose and 6.2 mg/L of $H_2O_2$. Previous studies showed that this operational condition could get 4~5 log inactivation for Total coliform, indicating that UV/$H_2O_2$ process will be appropriate to comply with the criteria of California Title 22 for Total coliform.

Comparison of Biological Responses and Heat Shock Protein 70 Expression in Chironomidae by Exposure UV and O3 (UV와 O3 노출에 따른 깔따구류의 생물학적 반응 및 열충격 단백질 70 발현)

  • Ji-Hoon Kim;Won-Seok Kim;Jae-Won Park;Bong-Soon Ko;Kiyun Park;Ihn-Sil Kwak
    • Korean Journal of Ecology and Environment
    • /
    • v.56 no.4
    • /
    • pp.430-439
    • /
    • 2023
  • UV and O3 are materials used in the water treatment process, and many studies have been reported to remove organic matters, contaminants, and microorganisms. In this study, we were investigated effects of Chirnomidae (Chironomus flaviplumus, Chironomus riparius), which are contamination indicator species to exposure UV and O3 for the survival rate, body color change and gene expression response. The survival rate of C. flaviplumus exposed to UV decreased to about 70% after 24 hours, and C. riparius about 50%. There was no change in the survival rate of C. flaviplumus exposed to O3, and C. riparius decreased to 95% after 10 minutes of exposure, but there was no change during the subsequent exposure time. In addition, UV and O3 exposure to the two species in body color faded in a time-dependent. In the HSP70 gene expression, C. riparius showed an increase in expression after UV exposure compared to the control group, and a significant difference was shown 12 hours after exposure (P<0.05). C. flaviplumus exposed to O3 showed a relatively low expression compared to the control group, and showed a significant difference at 10 minutes and 1 hour after exposure (P<0.05). These results reported the ecotoxicological effects on Chironomidae according to UV and O3 exposure. Therefore, the results of this study can be used as basic data to understand the effects of UV and O3, which are disinfectants used in water treatment plants, on Chirnomidae entering plants.

Activation of persulfate by UV and Fe2+ for the defluorination of perfluorooctanoic acid

  • Song, Zhou;Tang, Heqing;Wang, Nan;Wang, Xiaobo;Zhu, Lihua
    • Advances in environmental research
    • /
    • v.3 no.3
    • /
    • pp.185-197
    • /
    • 2014
  • Efficient defluorination of perfluorooctanoic acid (PFOA) was achieved by integrating UV irradiation and $Fe^{2+}$ activation of persulfate ($S_2O{_8}^{2-}$). It was found that the UV-$Fe^{2+}$, $Fe^{2+}-S_2O{_8}^{2-}$, and UV-$S_2O{_8}^{2-}$ processes caused defluorination efficiency of 6.4%, 1.6% and 23.2% for PFOA at pH 5.0 within 5 h, respectively, but a combined system of UV-$Fe^{2+}-S_2O{_8}^{2-}$ dramatically promoted the defluorination efficiency up to 63.3%. The beneficial synergistic behavior between $Fe^{2+}-S_2O{_8}^{2-}$ and UV-$S_2O{_8}^{2-}$ was demonstrated to be dependent on $Fe^{2+}$ dosage, initial $S_2O{_8}^{2-}$ concentration, and solution pH. The decomposition of PFOA resulted in generation of shorter-chain perfluorinated carboxylic acids (PFCAs), formic acid and fluoride ions. The generated PFCAs intermediates could be further defluorinated by adding supplementary $Fe^{2+}$ and, $S_2O{_8}^{2-}$ and re-adjusting solution pH in later reaction stage. The much enhanced PFOA defluorination in the UV-$Fe^{2+}-S_2O{_8}^{2-}$ system was attributed to the fact that the simultaneous employment of UV light and $Fe^{2+}$ not only greatly enhanced the activation of $S_2O{_8}^{2-}$ to form strong oxidizing sulfate radicals ($SO{_4}^{\cdot-}$), but also provided an additional decarboxylation pathway caused by electron transfer from PFOA to in situ generated $Fe^{3+}$.

The Removal of Humic Acid and Heavy Metals Using UV/TiO2/H2O2 (UV/TiO2/H2O2 공정을 이용한 휴믹산과 중금속 제거)

  • Kim, Jongoh;Jung, Jongtae;Choi, Wonyoul
    • Journal of the Korean GEO-environmental Society
    • /
    • v.7 no.4
    • /
    • pp.5-13
    • /
    • 2006
  • This study was conducted to evaluate the application of $UV/TiO_2/H_2O_2$ process for treating humic acid and heavy metals in surface water. Removal efficiency of $UV/TiO_2/H_2O_2$ process was much more efficient than that of $UV/TiO_2$ process for humic acid and heavy metals removal. The removal rate of humic acid and heavy metals increased with the increase of $TiO_2$ dosage and UV intensity, however decreased with more than 0.3 g/L of $TiO_2$ dosage. The addition of $H_2O_2$ as an oxidant was a positive effect for the removal rate of humic acid and heavy metals especially in the concentration of 50 mg/L $H_2O_2$.

  • PDF

Fabrication of UV Sensor Based on ZnO Hierarchical Nanostructure Using Two-step Hydrothermal Growth (2단계 수열합성을 이용한 ZnO 계층 나노구조 기반 UV 센서 제작)

  • Woo, Hyeonsu;Kim, Geon Hwee;Kim, Suhyeon;An, Taechang;Lim, Geunbae
    • Journal of Sensor Science and Technology
    • /
    • v.29 no.3
    • /
    • pp.187-193
    • /
    • 2020
  • Ultraviolet (UV) sensors are widely applied in industrial and military fields such as environmental monitoring, medicine and astronomy. Zinc oxide (ZnO) is considered as one of the promising materials for UV sensors because of its ease of fabrication, wide bandgap (3.37 eV) and high chemical stability. In this study, we used the hydrothermal growth of ZnO to form two types of ZnO nanostructures (Nanoflower and nanorod) and applied them to a UV sensor. To improve the performance of the UV sensor, the hydrothermal growth was used in a two-step process for fabricating ZnO hierarchical nanostructures. The fabricated ZnO hierarchical nanostructure improved the performance of the UV sensor by increasing the ratio of volume to surface area and the number of nanojunctions compared to one-step hydrothermal grown ZnO nanostructure. The UV sensor based on the ZnO hierarchical nanostructure had a maximum photocurrent of 44 ㎂, which is approximately 3 times higher than that of a single nanostructure. The UV sensor fabrication method presented in this study is simple and based on the hydrothermal solution process, which is advantageous for large-area production and mass production; this provides scope for extensive research in the field of UV sensors.

Effect of Disinfection Process Combination on E. coli Deactivation and Oxidants Generation (E. coli 불활성화와 산화제 생성에 미치는 소독 공정 결합의 영향)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
    • /
    • v.20 no.7
    • /
    • pp.891-898
    • /
    • 2011
  • The aim of this research was to evaluate the effect of combination of disinfection process (electrolysis, UV process) on Escherichia coli (E. coli) disinfection and oxidants (OH radical, $ClO_2$, HOCl, $H_2O_2$ and $O_3$) generation. The effect of electrolyte type (NaCl, KCl and $Na_2SO_4$) on the E. coli disinfection and oxidants generation were evaluated. The experimental results showed that performance of E. coli disinfection of electrolysis and UV single process was similar. Combination of electrolysis and UV process enhanced the E. coli disinfection and 4-carboxybenzaldehyde (4-CBA, indicator of the generation of OH radical) degradation. It is clearly showed synergy effect on disinfection and OH radical formation. However chlorine ($ClO_2$, HOCl) and oxygen type ($H_2O_2$, $O_3$) oxidants were decreased with the combination of two process. In electrolysis + UV complex process, electro-generated $H_2O_2$ and $O_3$ were reacted with UV light of UV-C lamp and increased 4-CBA degradation(increase OH radical). Disinfection of electrolyte of chlorine type was higher than that of the sulfate type electrolyte due to the higher generation of OH radical and oxidants.