• Title/Summary/Keyword: $UV/O_2$

Search Result 2,201, Processing Time 0.034 seconds

The Treatment Properties of Heavy Metals in Acid Mine Drainage with Micro-bubble and UV/H2O2 Oxidation Process (마이크로버블과 자외선/과산화수소 산화공정을 이용한 광산배수의 중금속 처리 특성)

  • Jung, Yong-Jun;Jung, Jae-Ouk
    • Journal of Environmental Science International
    • /
    • v.26 no.3
    • /
    • pp.303-309
    • /
    • 2017
  • Aeration with low energy micro-bubble generation and $UV/H_2O_2$ processes was introduced to verify the possibility of oxidation treatment for acid mine drainage. During 10 hours of aeration with micro-bubbles, Fe and As concentrations were decreased to 18.1 and 61.8%, respectively, while Cu, Cd, Al were kept at influent concentrations. Other heavy metals such as Mn, Cr, Pb, Zn, and Ni concentrations fluctuated due to the repetition of oxidation and release. Twenty days of aeration indicated the oxidation possibility for Cu, Cd, and Al. With the employment of $UV/H_2O_2$ processes, more than 77% of Cu and Fe removed, whereas slightly more than 30% of Cd and Al removed.

Property Variations of ZnO-based MOS Capacitor with Preparation Conditions (ZnO를 사용한 MOS 커패시터의 제작 조건에 따른 특성 변화)

  • Nam, H.G.;Tang, W.M.
    • Journal of the Semiconductor & Display Technology
    • /
    • v.9 no.3
    • /
    • pp.75-78
    • /
    • 2010
  • In this study we investigated the electrical properties of ZnO-based MOS capacitor with $HfO_2$ as the gate dielectric. MIM capacitor, which uses either $HfO_2$ or $Al_2O_3$ as the dielectric layer, is also studied to understand the dependency of the dielectrics on the preparation conditions. It was found that thinner $HfO_2$ films yield better electrical properties, namely lower leakage current and higher breakdown electric field. These properties were observed to deteriorate when subsequently annealed. Capacitance in the depletion region of MOS capacitor was found to increase with UV ozone treatment time up to 60min. However, when the treatment time was extended to 120min, the trend is reversed. The 'threshold voltage' was also observed to positively shift with UV ozone treatment time up to 60min. The shift apparently saturated for longer treatment.

Raman spectroscopy study on the reactions of UV-generated oxygen atoms with single-layer graphene on SiO2/Si substrates

  • Ahn, Gwang-Hyun;Kim, Hye-Ri;Hong, Byung-Hee;Ryu, Sun-Min
    • Carbon letters
    • /
    • v.13 no.1
    • /
    • pp.34-38
    • /
    • 2012
  • Successful application of graphene requires development of various tools for its chemical modification. In this paper, we present a Raman spectroscopic investigation of the effects of UV light on single layer graphene with and without the presence of $O_2$ molecules. The UV emission from a low pressure Hg lamp photolyzes $O_2$ molecules into O atoms, which are known to form epoxy on the basal plane of graphene. The resulting surface epoxy groups were identified by the disorder-related Raman D band. It was also found that adhesive residues present in the graphene samples prepared by micro-mechanical exfoliation using adhesive tape severely interfere with the O atom reaction with graphene. The UV-induced reaction was also successfully applied to chemical vapor deposition-grown graphene. Since the current method can be readily carried out in ambient air only with UV light, it will be useful in modifying the surfaces of graphene and related materials.

Promoting Effect of MgO in the Photodegradation of Methylene Blue Over MgO/MWCNT/TiO2 Photocatalyst

  • Chen, Ming-Liang;Zhang, Feng-Jun;Oh, Won-Chun
    • Korean Journal of Materials Research
    • /
    • v.20 no.7
    • /
    • pp.345-350
    • /
    • 2010
  • For the present paper, we prepared MgO/MWCNT/$TiO_2$ photocatalyst by using multi-walled carbon nanotubes (MWCNTs) pre-oxidized by m-chlorperbenzoic acid (MCPBA) with magnesium acetate tetrahydrate $(Mg(CH_2COO)_2\cdot4H_2O)$ and titanium n-butoxide $(Ti\{OC(CH_3)_3\}_4)$ as magnesium and titanium precursors. The prepared photocatalyst was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray (EDX) analysis. The decomposition of methylene blue (MB) solution was determined under irradiation of ultraviolet (UV) light. The XRD results show that the MgO/MWCNT/$TiO_2$ photocatalyst have cubic MgO structure and anatase $TiO_2$ structure. The porous structure and the $TiO_2$ agglomerate coated on the MgO/MWCNT composite can be observed in SEM images. The Mg, O, Ti and C elements can be also observed in MgO/MWCNT/$TiO_2$ photocatalyst from EDX results. The results of photodegradation of MB solution under UV light show that the concentration of MB solution decreased with an increase of UV irradiation time for all of the samples. Also, the MgO/MWCNT/$TiO_2$ photocatalyst has the best photocatalytic activity among these samples. It can be considered that the MgO/MWCNT/$TiO_2$ photocatalyst had a combined effect, the effect of MWCNT, which could absorb UV light to create photoinduced electrons $(e^-)$, and the electron trapping effect of MgO, which resulted in an increase of the photocatalytic activity of $TiO_2$.

Effects of $UV/O_3$ and SC-1 Step in the HF Last Silicon Wafer Cleaning on the Properties of Gate Oxide (HF-last Cleaning에서 SC-1 step과 $UV/O_3$ step이 gate 산화막에 미치는 영향)

  • Choe, Hyeong-Bok;Ryu, Geun-Geol;Jeong, Sang-Don;Jeon, Hyeong-Tak
    • Korean Journal of Materials Research
    • /
    • v.6 no.4
    • /
    • pp.395-400
    • /
    • 1996
  • 반도체 소자가 점점 고집적회되고 고성능화되면서 Si 기판 세정 방법은 그 중요성이 더욱 더 커지고 있다. 특히 ULSI급 소자에서는 세정 방법이 소자 생산수율 및 신뢰성에 큰 영향을 끼치고 있다. 본 연구에서는 HF-last 세정에 UV/O3과 SC-1 세정을 삽입하여 그 영향을 관찰하였다. 세정 방법은 HF-last 세정을 기본으로 split 1(piranha+HF), split 2(piranha+UV/O3+HF), split 3(piraha+SC-1+HF), split 4(piranha+(UV/O3+HF) x3회 반복)의 4가지 세정 방법으로 나누어 실험하였다. 세정을 마친 Si 기판은 Total X-Ray Fluorescence Spectroscopy(AFM)을 사용하여 표면거칠기를 측정하였다. 또한 세정류량을 측정하고, Atomic Force Microscopy(AFM)을 사용하여 표면거칠기를 측정하였다. 또한 세정후 250$\AA$의 gate 산화막을 성장시켜 전기적 특성을 측정하였다. UV/O3을 삽입한 split 2와 split 4세정방법이 물리적, 전기적 특성에서 우수한 특성을 나타냈고, SC-1을 삽입한 split 3세정 방법이 표준세정인 split 1세정 방법보다 우수하지 못한 결과를 나타냈다.

  • PDF

Assessment of Advanced Oxidation Processes using Low and Medium-Pressure Lamps with H2O2 for Reclamation of Biologically Treated Wastewater Effluents (하수 2차 처리수 재이용을 위한 저압 및 중압 고도산화시스템의 성능평가)

  • Ahn, Kyu-Hong;An, Seok;Maeng, Seung-Kyu;Kim, Ki-Pal;Hong, Joon-Seok;Jung, Min-Woo;Kweon, Ji-Hyang;Ahmed, Zubair
    • Journal of Korean Society of Water and Wastewater
    • /
    • v.17 no.4
    • /
    • pp.542-549
    • /
    • 2003
  • In the present study, the feasibility of $UV/H_2O_2$ systems was investigated using low and medium-pressure lamps on biologically treated wastewater effluents for secondary effluent reclamation. Two types of UV lamps were used as the light sources (a 39-W low-pressure mercury lamp and a 350-W medium-pressure mercury lamp). The results from these UV systems showed that the removal of organic compounds could be achieved in the contact time of longer than 30min (i.e., low UV doses). Efficiencies of color removal and disinfection were far better than those of organic matters measured as TOC, DOC and $TCOD_{cr}$. In the low-pressure lamp UV system, it has been found that DOC and color removals were 60.9 and 86.2% with 50mg/L of $H_2O_2$ and contact times of 30 minute, respectively. Whereas, with the medium-pressure lamp UV system, TOC, DOC and color removal were 27.1, 5.6 and 95% with 14.3mg/L of $H_2O_2$ and 14 minute of contact times, respectively. Both systems could be applied for the reclamation of secondary effluent treated with biological treatment processes.

Photocatalytic Degradation of Phenol in $UV/TiO_2$ Packed-bed System ($UV/TiO_2$ 충진 반응기에서 페놀의 광산화 반응)

  • Park, Kil-Soon;Kim, Jong-Hwa;Lee, Sang-Wha
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.27 no.9
    • /
    • pp.939-945
    • /
    • 2005
  • The Photocatalytic activity was investigated with the increase of flow rate in a $UV/TiO_2$ packed-bed system. The rate of phenol degradation over $UV/TiO_2$ (dia. = 5 mm) was increased up to 300 mL/min and reached a plateau beyond 400 mL/min. The bead photocatalysts did not exhibit a distinct difference of the phenol degradation rate irrespective of corrosion rates of glass beads and $TiO_2$ coating amounts. Degussa P25 exhibited a higher photocatalytic activity in comparison to other $TiO_2$ sols(Ishihara & N). The performance(activity and durability) of $UV/TiO_2$ packed-bed system can be enhanced by the use of $TiO_2$-coated glass beads instead of granular types that is easily attrited by the shearing force of flowing fluids.

Synthesis of the Fe2O3-CoO-Cr2O3-MnO2 pigments by co-precipitation method (공침법에 의한 Fe2O3-CoO-Cr2O3-MnO2계 안료 연구)

  • Choi, Soo-Nyong;Lee, Byung-Ha
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.17 no.6
    • /
    • pp.264-271
    • /
    • 2007
  • The inorganic pigments of $Fe_2O_3-CoO-Cr_2O_3-MnO_2$ were synthesized by the co-precipitation method. $FeCl_3,\;CoCl_2,\;CrCl_3\;and\;MnCl_2$ are used for the starting raw materials, and 2 N-KOH for precipitator. $MnCl_2$ is secured with 10 mole%, and 6 composition ratios are used with three ingredients to synthesize the pigments. The samples were calcined at $1350^{\circ}C/1.5h$. The resulting pigments were characterized by using XRD, FT-IR, SEM, and UV spectrophotometer. 6wt% pigments were applied to lime glaze and lime-barium glaze respectively firing at $1260^{\circ}C$ for oxidation atmosphere and $1240^{\circ}C$ for reduction one. The results of color analysis by using UV spectrophotometer showed black, bluish black and dark grayish green.

Protective Effect of Nitric Oxide against Oxidative Stress under UV-B Radiation in Maize Leaves (UV-B 조사시 옥수수 잎의 산화적 스트레스에 대한 Nitric Oxide의 보호효과)

  • Kim, Tae-Yun;Jo, Myung-Hwan;Hong, Jung-Hee
    • Journal of Environmental Science International
    • /
    • v.19 no.12
    • /
    • pp.1323-1334
    • /
    • 2010
  • The effect of nitric oxide (NO) on antioxidant system and protective mechanism against oxidative stress under UV-B radiation was investigated in leaves of maize (Zea mays L.) seedlings during 3 days growth period. UV-B irradiation caused a decrease of leaf biomass including leaf length, width and weight during growth. Application of NO donor, sodium nitroprusside (SNP), significantly alleviated UV-B stress induced growth suppression. NO donor permitted the survival of more green leaf tissue preventing chlorophyll content reduction and of higher quantum yield for photosystem II than in non-treated controls under UV-B stress, suggesting that NO has protective effect on chloroplast membrane in maize leaves. Flavonoids and anthocyanin, UV-B absorbing compounds, were significantly accumulated in the maize leaves upon UV-B exposure. Moreover, the increase of these compounds was intensified in the NO treated seedlings. UV-B treatment resulted in lipid peroxidation and induced accumulation of hydrogen peroxide ($H_2O_2$) in maize leaves, while NO donor prevented UV-B induced increase in the contents of malondialdehyde (MDA) and $H_2O_2$. These results demonstrate that NO serves as antioxidant agent able to scavenge $H_2O_2$ to protect plant cells from oxidative damage. The activities of two antioxidant enzymes that scavenge reactive oxygen species, catalase (CAT) and ascorbate peroxidase (APX) in maize leaves in the presence of NO donor under UV-B stress were higher than those under UV-B stress alone. Application of 2-(4-carboxyphenyl)-4, 4, 5, 5-tetramethylimidazoline-1-oxyl-3- oxide (PTIO), a specific NO scavenger, to the maize leaves arrested NO donor mediated protective effect on leaf growth, photosynthetic pigment and free radical scavenging activity. However, PTIO had little effect on maize leaves under UV-B stress compared with that of UV-B stress alone. $N^{\omega}$-nitro-L-arginine (LNNA), an inhibitor of nitric oxide synthase (NOS), significantly increased $H_2O_2$ and MDA accumulation and decreased antioxidant enzyme activities in maize leaves under UV-B stress. This demonstrates that NOS inhibitor LNNA has opposite effects on oxidative resistance. From these results it is suggested that NO might act as a signal in activating active oxygen scavenging system that protects plants from oxidative stress induced by UV-B radiation and thus confer UV-B tolerance.

Photodegradation of Gaseous Toluene Using Short-Wavelength UV/TiO2 and Treatment of Decomposition Products by Wet Scrubber (단파장자외선/TiO2 공정에 의한 가스상 톨루엔의 분해 및 습식세정장치에 의한 분해생성물의 제거)

  • Jeong, Ju-Young;Jurng, Jong-Soo
    • Journal of Environmental Science International
    • /
    • v.16 no.4
    • /
    • pp.433-440
    • /
    • 2007
  • The photodegradation and by-products of the gaseous toluene with $TiO_2$ (P25) and short-wavelength UV ($UV_{254+185nm}$) radiation were studied. The toluene was decomposed and mineralized efficiently owed to the synergistic effect of photochemical oxidation in the gas phase and photocatalytic oxidation on the $TiO_2$ surface. The toluene by the $UV_{254+185nm}$ photoirradiated $TiO_2$ were mainly mineralized $CO_2$ and CO, but some water-soluble organic intermediates were also formed under severe reaction conditions. The ozone and secondary organic aerosol were produced as undesirable by-products. It was found that wet scrubber was useful as post-treatment to remove water-soluble organic intermediates. Excess ozone could be easily removed by means of a $MnO_2$ ozone-decomposition catalyst. It was also observed that the $MnO_2$ catalyst could decompose organic compounds by using oxygen reactive species formed in process of ozone decomposition.