• Journal of the Korean Ceramic Society
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• v.21 no.3
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• pp.266-270
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• 1984

The photoelectrochemical properties of the reduced $TiO_2$ceramic electrodes are investigated varying the thickness of the electrodes and the amounts of $Sb_2O_3$ as dopant. As the thickness of the undoped. $TiO_2$ceramic electrode increases the photocurrent tends to decrease. However for the R-F sputtered $TiO_2$ thin film electrodes the photocurrent tends to increase to about 1$\mu\textrm{m}$ thick and then decreases with increasing thickness. For the $TiO_2$ ceramic electrodes doped with $Sb_2O_3$ the photocurrent decreases with inreasing the amounts of dopant and in the case of rapid cooling in air without reduction treatment the photocurrent shows lower value. Also visible light excitation is observed at 500~550(nm) wavelength for the $TiO_2$ ceramic electrodes doped with $Sb_2O_3$comparing wtih the $TiO_2$ ceramic electrodes (~420nm)

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.7
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• pp.537-542
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• 2012

DSSCs efficiency by thickness of $TiO_2$ photoelectrode and thickness differences between two substrates studied. DSSCs is made of the doctor blade method and photoelectrode annealing temperature elevated in a different ways. In addition, cells efficiencies of according to the different thickness between $TiO_2$ photoelectrode substrate and Pt counter electrode was measured. Efficiency of DSSCs made with $TiO_2$ photoelectrode of 18 ${\mu}m$ thickness and the gap difference between the substrate 28 ${\mu}m$ shows a highest 4.805% efficiency.

• Journal of the Korean Ceramic Society
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• v.49 no.6
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• pp.642-647
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• 2012

$TiO_2$ thin films for a pulse power capacitor were deposited by RF magnetron sputtering. The effects of the deposition gas ratio and thickness on the crystallization and electrical properties of the $TiO_2$ films were investigated. The crystal structure of $TiO_2$ films deposited on Si substrates at room temperature changed to the anatase from the rutile phase with an increase in the oxygen partial pressure. Also, the crystallinity of the $TiO_2$ films was enhanced with an increase in the thickness of the films. However, $TiO_2$ films deposited on a PET substrate showed an amorphous structure, unlike those deposited on a Si substrate. An X-ray photoelectron spectroscopy(XPS) analysis revealed the formation of chemically stable $TiO_2$ films. The dielectric constant of the $TiO_2$ films as a function of the frequency was significantly changed with the thickness of the films. The films showed a dielectric constant of 100~110 at 1 kHz. However, the dissipation factors of the films were relatively high. Films with a thickness of about 1000nm showed a breakdown strength that exceeded 1000 kV/cm.

• Journal of the Korean institute of surface engineering
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• v.51 no.3
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• pp.157-163
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• 2018

The anodic $TiO_2$ layers which are prepared in various anodization conditions exhibit their specific color depending on the thickness of $TiO_2$. In this study, the relationship between the color of $TiO_2$ layer, which is grown by PEO (Plasma electrolytic oxidation), and the thickness of the $TiO_2$ layer is investigated. To evaluate the color change of the $TiO_2$ layer, the value of color ($dE^*ab$) is measured and calculated by spectrophotometer and chromameter. As a result, it is found that $dE^*ab$ values and thickness of $TiO_2$ layers form a linear relationship with meaningful formular. This formula can be helpful to quantify the thickness of the $TiO_2$ layer by the numerical $dE^*ab$ values. In this process, the spectrophotometer shows more precise results than the chromameter dose. If fluoride ions ($F^-$) are included in the electrolyte, it will affect the $dE^*ab$ values of the $TiO_2$. layer. This is against the propensity, which is analyzed by XRD (X-ray diffraction) and XPS (X-ray photoelectron spectroscopy). It is important that the formular suggested in this study provides other metals which can be also anodized with the possibility of quantifying the thickness of the $TiO_2$ layer by the $dE^*ab$ values.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.147-148
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• 2007

Dye-sensitized solar cell using conversion of solar energy to electrical energy appeared that which solves a environmental matter. The dye-sensitized solar cell uses nano-crystalline oxide semiconductor for absorbing dye. The $TiO_2$ is used most plentifully. The efficiency of the dye-sensitized solar cell changes consequently in the particle size, morphology, crystallization and surface state of the $TiO_2$. In this paper, we report The effect of titania$(TiO_2)$ thickness on the performance of dye-sensitized solar cells. Using doctor blade method, It produced the thickness of the $TiO_2$ with $7\;{\mu}m,\;10\;{\mu}m,\;13\;{\mu}m$. The efficiency was the best from $10{\mu}m$. It had relatively low efficiency on the thickness from $7\;{\mu}m\;to\;13\;{\mu}m$. The reason why it presents low efficiency on $7\;{\mu}m$ thickness is that excited electrons can not be delivered enough due to thin thickness of $7\;{\mu}m\;TiO_2$. And The reason why it presents low efficiency on $13\;{\mu}m$ thickness is that thick $13\;{\mu}m\;TiO_2$ can not penetrate the sunlight enough.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.268-268
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• 2012

Adsorption and desorption of toluene from bare and $TiO_2$-coated silica with a mean pore size of 15 nm was studied using breakthrough curves and temperature programmed desorption. Thicknesses of $TiO_2$ films prepared by atomic layer deposition on silica were < 2 nm, and ~ 5 nm, respectively. For toluene adsorption, both dry and humid conditions were used. $TiO_2$-thin film significantly improved toluene adsorption capacity of silica under dry condition, whereas desorption of toluene from the surface as a consequence of displacement by water vapor was more pronounced for $TiO_2$-coated samples with respect to the result of bare ones. In the TPD experiments, silica with a thinner $TiO_2$ film (thickness < 2 nm) showed the highest reactivity for toluene oxidation to $CO_2$ in the absence and presence of water. We show that the toluene adsorption and oxidation reactivity of silica can be controlled by varying thickness of $TiO_2$ thin films.

• Korean Journal of Materials Research
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• v.34 no.4
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• pp.202-207
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• 2024

In this study, we undertook detailed experiments to increase hydrogen production efficiency by optimizing the thickness of titanium dioxide (TiO₂) thin films. TiO₂ films were deposited on p-type silicon (Si) wafers using atomic layer deposition (ALD) technology. The main goal was to identify the optimal thickness of TiO₂ film that would maximize hydrogen production efficiency while maintaining stable operating conditions. The photoelectrochemical (PEC) properties of the TiO₂ films of different thicknesses were evaluated using open circuit potential (OCP) and linear sweep voltammetry (LSV) analysis. These techniques play a pivotal role in evaluating the electrochemical behavior and photoactivity of semiconductor materials in PEC systems. Our results showed photovoltage tended to improve with increasing thickness of TiO₂ deposition. However, this improvement was observed to plateau and eventually decline when the thickness exceeded 1.5 nm, showing a correlation between charge transfer efficiency and tunneling. On the other hand, LSV analysis showed bare Si had the greatest efficiency, and that the deposition of TiO₂ caused a positive change in the formation of photovoltage, but was not optimal. We show that oxide tunneling-capable TiO₂ film thicknesses of 1~2 nm have the potential to improve the efficiency of PEC hydrogen production systems. This study not only reveals the complex relationship between film thickness and PEC performance, but also enabled greater efficiency and set a benchmark for future research aimed at developing sustainable hydrogen production technologies.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.12
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• pp.2425-2430
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• 2009

Dye-sensitized solar cell(DSC) is composed of a dye-adsorbed nanoporous $TiO_2$ layer on fluorine-doped tin oxide(FTO) glass substrate, electrolyte, and platinium doped counter electrode. Among these, a dye-absorbed nanoporous $TiO_2$ layer plays an important role in the performance of the DSC because the injected electrons from excited dye molecules move through this layer. And the condition of $TiO_2$ layer such as the morphology and thickness affects on the electron movement. Therefore, the performances and the efficiency of DSC change as the thickness of $TiO_2$ layer is different. Electrochemical Impedance Spectroscopy(EIS) is the powerful analysis method to study the kinetics of electrochemical and photoelectrochemical processes occurring in the DSC especially the injected electron movements. So we analyzed the DSCs with different $TiO_2$ thicknesses by using EIS to understand the influence of the $TiO_2$ thickness to the performance of the DSC clearly. Finally, we got the EIS analysis on the DSC with different $TiO_2$ thickness from the internal resistance of the DSC, the electron life time and the amount of dye molecules.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 2002.11a
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• pp.329-334
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• 2002

This study evaporates TiO$_2$ layer thickness differently with RF sputtering method on Si Wafer(n-100). Thin film is made with the structure of Si+TiO$_2$ and Si+TiO$_2$+Al by evaporating TiN which is used as Antireflection of superintegrated semiconductor integrated circuit with Photo Catalyst. The research is performed to increase the characteristics of photon energy according to TiO$_2$ thickness and the reliability and reproducibility of TiO$_2$ thin film. Reversal of electric Permittivity values is induced by dipole polarization shown in the dielectric of thin film. Complex electric constant ($\varepsilon$$_1$, $\varepsilon$$_2$) has larger peak values as it's thickness is thinner and then it is larger according to the increase of frequency. Electric Permittivity by photon energy has large value in imaginary number and is reduced exponentially by the increase of carrier density according to that of photon energy.

• Rapid Communication in Photoscience
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• v.2 no.1
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• pp.1-8
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• 2013

Transparent $TiO_2$ films in various thicknesses were prepared by sol-gel and MOCVD method, respectively, and their photocatalytic activities in decomposing gaseous 2-propanol were evaluated. The surfaces and grain structures of the prepared films were characterized by FESEM, XRD, and AFM. It was found that the photocatalytic activities of $TiO_2$ films were greatly dependent on the film thickness and surface roughness: The photocatalytic activity increases with the increase of film thickness, while it decreases with the increase of surface roughness. We have proposed that these phenomena originate from the transfer of photogenerated electron and hole pairs from the bulk to the surface of $TiO_2$ film. Several experimental evidences supporting this mechanism have also been provided.