• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.153-153
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• 2006

ZnO 박막은 II-VI족 화합물 반도체로서 상온에서 3.37eV 의 넓은 밴드갭을 가지고 있을 뿐만 아니라 GaN(28meV) 보다 상온에서 큰 엑시톤 결합 에너지(60meV)와 열 안정성을 가지고 있다. 특히 ZnO를 base로 한 2차원의 화합물 (MgZnO, CdZnO 그리고 MgO) 반도체 물질은 UV LED, 생 화학 센서와 투명전극 등으로 응용이 가능하다. ZnO/MgZnO 양자우울 구조의 양자제한 효과로 인한 엑시톤 결합에너지와 전기적 광학적 특성 향상으로 광전자 소 자 제작이 가능하다. 그렇지만, Zn-Mg 상평형도에서 ZnO 내에 Mg 고용도가 상온에서 열역학적으로 4at% 이하 이고, 또한 ZnO와 MgO는 각각 우르짜이트 구조와 면심입방 구조를 가지기 때문에 Mg 함량용 높이는데 어려움이 있다. 이러한 문제점을 해결하기 위해 열처리를 함으로써 MgZnO 박막 내에 Mg 함량의 증가와 결정성 향상으로 고품질의 광전자 소자 제작을 가능하게 했다. 본 실험에서는 RF 마그네트론 스퍼터링 장비로 MgZnO 박막 성장 후 Si 기판위에 성장된 박막의 결정성 향상과 MgZnO 내의 Mg 함량 변화를 관찰하기 위해 성장된 박막에 대한 열처리 효과를 연구 하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.65-65
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• 2006

ZnO 박막은 II-VI족 화합물 반도체로서 상온에서 3.37eV의 넓은 밴드갭을 가지고 있을 뿐만 아니라 GaN(28meV) 보다 상온에서 큰 엑시톤 결합 에너지(60meV)와 열 안정성을 가지고 있다. 특히 ZnO를 base로 한 2차원의 화합물 (MgZnO, CdZnO 그리고 MgO) 반도체 물질은 UV LED, 생 화학 센서와 투명전극 등으로 응용이 가능하다. ZnO/MgZnO 양자우물 구조의 양자제한 효과로 인한 엑시톤 결합에너지와 전기적 광학적 특성 향상으로 광전자 소 자 제작이 가능하다. 그렇지만, Zn-Mg 상평형도에서 ZnO 내에 Mg 고용도가 상온에서 열역학적으로 4at% 이하 이고, 또한 ZnO와 MgO는 각각 우르짜이트 구조와 면심입방 구조를 가지기 때문에 Mg 함량을 높이는데 어려움이 있다. 이러한 문제점을 해결하기 위해 열처리를 함으로써 MgZnO 박막 내에 Mg 함량의 증가와 결정성 향상으로 고품질의 광전자 소자 제작을 가능하게 했다. 본 실험에서는 RF 마그네트론 스퍼터링 장비로 MgZnO 박막 성장 후 Si 기판위에 성장된 박막의 결정성 향상과 MgZnO 내의 Mg 함량 변화를 관찰하기 위해 성장된 박막에 대한 열처리 효과를 연구 하였다.

• Journal of the Korean Vacuum Society
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• v.14 no.4
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• pp.215-221
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• 2005

Thermoelectric bismuth telluride thin films were prepared on $SiO_{2}$/Si substrate with co-sputtering of bismuth and tellurium targets. The effects of deposition temperature on surface morphology, crystallinity and electrical transport properties were investigated. Hexagonal crystallites were clearly visible at the surface of films deposited above $290 ^{\circ}C$. Change of dominant phase from rhombohedral $Bi_2Te_3$ to hexagonal BiTe was confirmed with X-ray diffraction analysis. The deviation from stoichiometric composition at high deposition temperature resulted in the change of structural and electrical characteristics. Seebeck coefficients of all samples have negative value, indicating the prepared $Bi_XTe_Y$ films are n-type thermoelectric. Optimum of Seebeck coefficient and power factor were obtained at the deposition temperature of $225 \^{circ}$C (about -55 $\mu$V/K and $3\times10^{-4}$ W/$k^{2}$m, respectively). Deterioration of thermoelectric properties at higher temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.176-176
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• 2011

실리콘 질화막($Si_3N_4$)과 산화막($SiO_2$)은 반도체 소자를 구성하는 물질 중 가장 널리 사용되는 유전 또는 절연물질이다. 이러한 실리콘 산화막과 질화막은 적용할 소자에 따라 다양한 CVD나 ALD 공정을 기반으로 제조한다. 증착공정 개발에 있어 실리콘 증착소재가 성공여부를 결정하는 근간이 되며, 이는 실리콘 증착소재의 특성에 따라 증착된 산화막과 질화막의 물성이 크게 변하기 때문이다. 실리콘 증착소재 개발을 위해서 국내외 증착소재 합성업체가 노력을 기울이고 있지만 개발된 증착소재의 특성을 정확히 진단하기 위한 기술이 뒷받침되지 않아 개발 효율이 높지 않은 것이 현실이다. 한국표준과학연구원 내 진공기술센터에서는 이러한 실리콘 증착소재의 특성, 특히 반응성을 평가하기 위한 기술 및 시스템을 개발하고 이를 활용하고 있다. 본 연구에서는 적외선 분광법을 이용하여 개발된 증착소재의 기상 열적안전성 및 반응기체에 따른 반응성을 실시간으로 진단하였다. 반응기체로는 산화막을 증착하기 위해 가장 많이 사용되는 $H_2O$와 질화막을 증착하기 위해 가장 많이 사용되는 $NH_3$를 사용하였다. 각 반응기체의 유량별, 가스셀 온도, 압력 등의 반응조건의 변화에 따른 실리콘 증착소재의 반응성 및 안정성을 평가하고 기존에 양산용으로 소자제조에 사용되고 있는 증착소재와 비교평가를 수행하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.341-341
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• 2012

Recently, oxide semi-conductor materials have been investigated as promising candidates replacing a-Si:H and poly-Si semiconductor because they have some advantages of a room-temperature process, low-cost, high performance and various applications in flexible and transparent electronics. Particularly, amorphous indium-gallium-zinc-oxide (a-IGZO) is an interesting semiconductor material for use in flexible thin film transistor (TFT) fabrication due to the high carrier mobility and low deposition temperatures. In this work, we demonstrated improvement of flexibility in IGZO TFTs, which were fabricated on polyimide (PI) substrate. At first, a thin poly-4vinyl phenol (PVP) layer was spin coated on PI substrate for making a smooth surface up to 0.3 nm, which was required to form high quality active layer. Then, Ni gate electrode of 100 nm was deposited on the bare PVP layer by e-beam evaporator using a shadow mask. The PVP and $Al_2O_3$ layers with different thicknesses were used for organic/inorganic multi gate dielectric, which were formed by spin coater and atomic layer deposition (ALD), respectively, at $200^{\circ}C$. 70 nm IGZO semiconductor layer and 70 nm Al source/drain electrodes were respectively deposited by RF magnetron sputter and thermal evaporator using shadow masks. Then, IGZO layer was annealed on a hotplate at $200^{\circ}C$ for 1 hour. Standard electrical characteristics of transistors were measured by a semiconductor parameter analyzer at room temperature in the dark and performance of devices then was also evaluated under static and dynamic mechanical deformation. The IGZO TFTs incorporating hybrid gate dielectrics showed a high flexibility compared to the device with single structural gate dielectrics. The effects of mechanical deformation on the TFT characteristics will be discussed in detail.

• Journal of Korean Society on Water Environment
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• v.34 no.6
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• pp.678-687
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• 2018

The purpose of this study was to understand the unique and complicated feature of urban stream receiving various inflows. The Yangjae stream, the second tier of the Han River, runs through the southern parts of Seoul, Korea and its middle part flows on the boundary of Seoul where land use is actively changing. Stream flow was greatly influenced by rainfall. Other than rainfall events, effluent discharge from wastewater treatment plant (WWTP) comprised 51 % of stream flux. As a result, majority ions water chemistry was changed at the receiving zone of the discharged effluent (Zone A). Its contribution increased to 69.9 % at the second sampling period with low stream flow. In the middle zone, inflows from the northern area, recently developed to a residential district showed low $NO_3-N$ and high $HCO_3$, Ca, $SO_4$, and $SiO_2$ indicating the effects of groundwater and concrete. One inflow (T-8), with extremely high Na and Cl, median $SiO_2$, was assessed to have anthropogenic influence, however its contribution to main stream was under 1 %. Road construction near Y-13 also affected water chemistry leading to the highest Na and Cl concentration. These hydro chemical changes can be critically used to evaluate the changes in water budget and fate of chemicals in a peri-urban watershed occasioned by human activities on the Yangjae.

• Transactions on Electrical and Electronic Materials
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• v.12 no.3
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• pp.119-122
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• 2011

A series of mesoporous silicalites was synthesized using different compositions of tetraethylorthosilicate and methyltriethoxysilane (MTES) as the silica source. Cetyltrimethylammonium bromide was used as the organic template. Their detailed pore structures were investigated by transmission electron microscopy, X-ray diffraction, and N2 adsorption method. The thermal properties of these silicalites were studied by thermogravimetric analysis. The increased amount of MTES destroyed mesoporous channels and reduced pore sizes from 3.4 nm to 2.8 nm in calcined silicalites. The calcined silicalite transformed completely into an amorphous state at 30% MTES loading. Methyl pending groups of MTES hindered the structural ordering of ≡Si-O- frameworks, resulting in an amorphous structure. This was caused by the insufficient formation of supramolecular assembly with the organic template. No capillary condensation step was found in MS 7/3 silicalite. The other capillary condensation steps shifted toward the lower relative pressure with increasing MTES content, indicating the reduction of pore sizes.

• The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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• v.24 no.4
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• pp.519-534
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• 2019

When the fresh water from the artificial lakes (Ganwolho and Bunamho) were discharged to Cheonsu Bay in summer to prevent the flood over the reclaimed farmland near the lakes, the impact on water qualities (nutrients, organic matters, trace metals) within the bay was investigated through four surveys (June, July, August and October, 2011). Dissolved inorganic nitrogen (DIN) increased about as much as 3-4 times over the whole water column when the freshwater was discharged. And the main species composition of DIN changed from ammonia to nitrate. Dissolved inorganic phosphorus (DIP) decreased as much as 2 times in surface waters, but increased as much as 1.5 times in deep waters, and also silicate concentrations increased as much as 3-4 times in deep waters of the inner bay. The N/P ratios in Chunsu bay seawaters were much higher (2 to 7 times) than the Redfield ratio when the freshwaters were discharged, which indicated the phosphorus limiting in the phytoplankton growth. Dissolved organic carbon (DOC) and nitrogen (DON) increased as much as about 2 times. In addition, particulate organic matters (POC, PON, POP, Bio-Si) increased as much as above 2 times in the surface waters of the inner bay. Trace metals (Fe, Mn, Co, Ni, Cu) increased in the surface waters of the inner bay, but dissolved Cd concentrations decreased as much as 2 times. Therefore, when the contaminated fresh waters from the artificial lakes were discharged into the bay, nutrients, organic matters and trace metals generally increased compared to normal period. Since the phytoplankton bloom occurred in the surface waters of the inner bay, dissolved oxygens at the surface waters were oversaturated and hence hypoxic in the deep waters. Highly enriched nutrients concentrations were found in deep waters of the inner bay, which was accompanied with the hypoxic condition. Finally, the water quality in the inner bay of the Chunsu bay was deteriorated from less than grade 3 in normal periods to grade 5 when the freshwaters from the artificial lakes were discharged in summer.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.377-377
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• 2012

Microprocessor technology now relies on copper for most of its electrical interconnections. Because of the high diffusivity of copper, Atomic layer deposition (ALD) $TaN_x$ is used as a diffusion barrier to prevent copper diffusion into the Si or $SiO_2$. Another problem with copper is that it has weak adhesion to most materials. Strong adhesion to copper is an essential characteristic for the new barrier layer because copper films prepared by electroplating peel off easily in the damascene process. Thus adhesion-enhancing layer of cobalt is placed between the $TaN_x$ and the copper. Because, cobalt has strong adhesion to the copper layer and possible seedless electro-plating of copper. Until now, metal film has generally been deposited by physical vapor deposition. However, one draw-back of this method is poor step coverage in applications of ultralarge-scale integration metallization technology. Metal organic chemical vapor deposition (MOCVD) is a good approach to address this problem. In addition, the MOCVD method has several advantages, such as conformal coverage, uniform deposition over large substrate areas and less substrate damage. For this reasons, cobalt films have been studied using MOCVD and various metal-organic precursors. In this study, we used $C_{12}H_{10}O_6(Co)_2$ (dicobalt hexacarbonyl tert-butylacetylene, CCTBA) as a cobalt precursor because of its high vapor pressure and volatility, a liquid state and its excellent thermal stability under normal conditions. Furthermore, the cobalt film was also deposited at various $H_2/NH_3$ gas ratio(1, 1:1,2,6,8) producing pure cobalt thin films with excellent conformality. Compared to MOCVD cobalt using $H_2$ gas as a reactant, the cobalt thin film deposited by MOCVD using $H_2$ with $NH_3$ showed a low roughness, a low resistivity, and a low carbon impurity. It was found that Co/$TaN_x$ film can achieve a low resistivity of $90{\mu}{\Omega}-cm$, a low root-mean-square roughness of 0.97 nm at a growth temperature of $150^{\circ}C$ and a low carbon impurity of 4~6% carbon concentration.

• Bulletin of the Korean Chemical Society
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• v.18 no.6
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• pp.618-622
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• 1997

The polysiloxane-bridged dinuclear metallocenes $[(SiMe_2O)_n-SiMe_2(C_5H_4)_2][(C_9H_7)ZrCl_2]_2$ (n=1 (7), 2 (8), 3 (9)) have been generated as a model complex for the immobilized metallocene at silica surface by treating the respective disodium salts of the ligands with 2 equivalents of $(C_9H_7)ZrCl_3$ in THF. All three complexes are characterized by $^1H$ NMR and measurement of metal content through ICP-MS. It turned out that the values of ${\Delta}{\delta}=[{\delta}_d-{\delta}_p]$, the chemical shift difference between the distal $({\delta}_d)$ and proximal $({\delta}_p)$ protons, for the produced dinuclear compounds (0.47 for 7, 0.49 for 8, and 0.5 for 9) were larger than the Δδ value of the known ansa-type complex holding the same ligand as a chelating one, that is just the opposite to the normal trend. In order to compare polymerization behavior of the dinuclear metallocene with the corresponding mononuclear metallocene, (Cp)$(C_9H_7)ZrCl_2$ was separately prepared. To investigate the catalytic properties of the dinuclear complexes and mononuclear metallocenes ethylene polymerization has been conducted in the presence of MMAO. The polymerization results display the typical activity dependence on polymerization temperature for all complexes. The most important feature is that the polymers from the dinuclear metallocenes represent enormously improved molecular weight compared with the polymer from the corresponding mononuclear metallocene. In addition, the influence of the nature of the bridging ligand upon the reactivities of the dinuclear metallocenes has also been observed.