• 한국결정성장학회지
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• 제19권2호
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• pp.75-78
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• 2009

PBN 도가니를 이용하여 Si이 도핑된 GaAs 단결정을 수직경사 응고법으로 성장시켰다. PBN 도가니에 산화막인 $B_{2}O_{3}$의 양을 $0{\sim}0.2wt%$ 범위에서 변화시키면서, 성장 후 캐리어 농도를 측정하였다. $B_{2}O_{3}$ 첨가량이 증가함에 따라, 초기 0.1 정도의 Si 도판트의 편석계수는 0.01 부근까지 급격히 감소하고, 동시에 캐리어 농도도 감소하는 것을 알 수 있었다. 이는 성장도중 도판트인 Si이 $B_{2}O_{3}$과 반응하며 도너인 Si 양을 감소시키며, 동시에 억셉터인 B 양을 증가시키기 때문으로 보인다. 한편 PBN 도가니 내면에 얇은 유리질의 $B_{2}O_{3}$층 형성이 용이한 고온 산화막 처리가 결함감소에 효과적임을 확인하였다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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• pp.861-862
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• 2009

Precipitated iron-based catalysts are highly promising for the Fischer-Tropsch synthesis (FTS), in particular for the low temperature FTS below $280^{\circ}C$, because of their high activity and low cost. $SiO_2$ is an essential promoter for the precipitated iron-based catalysts to improve the attrition strength and physical stability. In this study, we carried out FTS over precipitated iron-based catalysts with and without $SiO_2$ in a fixed-bed reactor. The catalysts were prepared by a conventional co-precipitation method. In case of the catalysts with $SiO_2$, we used two comparative preparation methods, i.e., incorporation of $SiO_2$ before precipitation (denoted as precipitated $SiO_2$) and after precipitation (denoted as binder $SiO_2$), respectively. The addition of $SiO_2$ crucially affects both physico-chemical properties and catalytic peformance of precipitated iron-based catalysts.

• Journal of Welding and Joining
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• 제22권5호
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• pp.46-52
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• 2004

AlSi-Al$_2$O$_3$ composite layer was prepared by plasma spray on steel substrate. The composite powder for plasma spray was prepared by simple mechanical blending. The wear resistance of the composite layers and matrix aluminum alloy were performed in terms of size distribution of ceramic particles. Friction coefficients of AlSi were decreased with incorporation of $Al_2$O$_3$. The tribological properties of coated layers were affected by the size of incorporated $Al_2$O$_3$ particle. The reinforcement of $Al_2$O$_3$ particle into aluminum alloy matrix decreased the friction coefficient as well as wear loss.

• 한국세라믹학회지
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• 제28권7호
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• pp.517-524
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• 1991

The CVD process of BPSG (BoroPhosphoSilicate Glass) and its thin film properties were studied. B2H6, PH3, SiH4 and O2 gases were reacted in a AP (Atmospheric Pressure) CVD system in the temperature range of 300℃ and 460℃. The interaction of B2H6 and PH3 was studied from the deposition rate and dopant incorporation change point of view. The dependency of BPSG step coverage on the temperature was changed with different O2/(B2H6+PH3+SiH4) ratio. Finally, the boundary which distinguishes the stable BPSG's from the ones that react with Di (Deionized) water or cleaning chemicals such as H2SO4, HCl, H2O2, NH4OH etc could be defined.

• 한국세라믹학회지
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• 제36권8호
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• pp.799-804
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• 1999

Composites of SiC-Si3N4 consisted of uniformly distributed elongated $\beta$-Si3N4 grains and equiaxed $\beta$-SiC grains were fabricated with $\beta$-SiC,. $\alpha$-Si3N4 Al2O3 and Y2O3 powders. By hot-pressing and subsequent annelaing elongated $\beta$-Si3N4 grains were grown via$\alpha$longrightarrow$\beta$ phase transformation and equiaxed $\beta$-Si3N4 composites increased with increasing the Si3N4 content owing to the reduced defect size and enhanced crack deflection by elongated $\beta$-Si3N4 grains and the grain boundary strengthening by nitrogen incorporation. Typical flexural strength and fracture toughness of SiC-40 wt% Si3N4 composites were 783 MPa and 4.2 MPa.m1/2 respectively.

• Bulletin of the Korean Chemical Society
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• 제31권2호
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• pp.298-302
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• 2010

We report the effect of surface morphology on the conductivity of the poly-N-vinylcarbazole (PVK)/silica gel ($SiO_2$) nanocomposites as a function of $SiO_2$ weight percentage (%).The polymerization of PVK was initiated by a free-radical polymerization. The surface morphology of the prepared composite shows the incorporation of $SiO_2$ in the prepared PVK-$SiO_2$ (PS) nanocomposites. The conductivity increased from $9.2{\times}10^{-5}S\;cm^{-1}$ to $9.6{\times}10^{-4}S\;cm^{-1}$ with the increase in the percentage of silica gel from 5 to 30%. The nanocomposites show a percolation behavior having a threshold value between 15 and 20%.

• Korean Chemical Engineering Research
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• 제48권3호
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• pp.304-310
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• 2010

공침법을 이용하여 구조 조촉매인 $SiO_2$가 첨가된 Fe계 촉매와 $SiO_2$가 첨가되지 않은 Fe계 촉매를 제조하였고, 이러한 두 가지 촉매를 이용하여 $250^{\circ}C$의 온도 및 1.5 MPa의 압력에서 Fischer-Tropsch 합성반응을 수행하였다. $SiO_2$를 첨가한 Fe계 촉매가 $SiO_2$를 첨가하지 않은 Fe계 촉매보다 현저히 우수한 촉매활성을 나타내었고, 144시간의 반응시간동안 뛰어난 촉매안정성을 나타내었다. X-선 회절 및 $N_2$의 물리흡착을 통하여 촉매의 결정구조 및 세공구조를 분석한 결과, $SiO_2$를 첨가할 경우 Fe계 촉매의 분산도가 향상되는 것을 발견할 수 있었다. 또한 $H_2$-TPR(temperature-programmed reduction) 분석결과를 통해, $SiO_2$를 첨가할 경우 $260^{\circ}C$ 이하의 저온 영역에서 $Fe_2O_3$의 $Fe_3O_4$ 및 FeO로의 환원이 촉진되는 것을 확인하였다. 반면 $CO_2$-TPD(temperature-programmed desorption) 분석결과에 의하면, $SiO_2$를 첨가한 결과 촉매의 표면 염기도는 감소하였다. 따라서 $SiO_2$를 첨가한 촉매가 $SiO_2$를 첨가하지 않은 촉매보다 우수한 촉매성능을 나타내는 것은, $SiO_2$를 첨가함에 따라 촉매의 분산이 증진되고 환원이 촉진된 것이 주요 원인인 것으로 생각된다.

• 한국수소및신에너지학회논문집
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• 제30권2호
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• pp.128-135
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• 2019

In this study, the mesoporous $SiO_2$ (5, 10, or 15 wt%) was incorporated into the polybenzimidazole matrix in order to improve the proton conduction as well as physiochemical properties of composite membrane. The chemical structure of mesoporous $SiO_2$ and crystallinity of as-prepared membranes were analyzed by Fourier-transform infrared (FT-IR) spectroscopy and X-ray diffraction (XRD) analysis, respectively. The thermal stability of the pristine $X_1Y_9$ and composite membranes were evaluated by thermogravimetric analyzer (TGA). On other side, the physical and chemical properties of the pristine $X_1Y_9$ and composite membranes were also determined by acid uptake and oxidative stability tests, respectively. With the incorporation of 15 wt% $SiO_2$, the composite membrane exhibits the higher proton conductivity that may be applicable for non-humidified high temperature fuel cell applications.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.690-693
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• 2003

An Si substrate (100) was oxidized at $400^{\circ}C$ in inductively coupled oxygen plasma. Interstitial oxygen was found in the Si substrate at the initial stage of oxidation by IR measurements. An x-ray rocking curve of Si substrates showed a lower peak intensity due to lattice distortion by the interstitial oxygen. The refractive index of thin oxides, below which interstitial oxygen existed in the Si substrate, was smaller than the refractive index of thick oxides, below which no interstitial oxygen existed. The interstitial oxygen was found by plasma oxidation using $O_{2}$ gas and $N_{2}O$ gas. The inductively coupled plasma oxidation using $N_{2}O$ gas was performed by atomic oxygen, not by molecular oxygen, indicating that atomic oxygen in plasma is responsible for the incorporation of interstitial oxygen.

• Transactions on Electrical and Electronic Materials
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• 제13권2호
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• pp.69-72
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• 2012

In this study, deposition of low-dielectric constant SiOC(H) films by conventional plasma-enhanced chemical vapor deposition (PECVD) were investigated through various characterization techniques. The results show that, with an increase in the plasma power density, the relative dielectric constant (k) of the deposited films decreases whereas the refractive index increases. This is mainly due to the incorporation of organic molecules with $CH_3$ group into the Si-O-Si cage structure. It is as confirmed by FT-IR measurements in which the absorption peak at 1,129 $cm^{-1}$ corresponding to Si-O-Si cage structure increases with power plasma density. Electrical characterization reveals that even after fast thermal annealing process, the leakage current density of the deposited films is in the order of $10^{-11}$ A/cm at 1.5 MV/cm. The reliability of the SiOC(H) film is also further characterized by using BTS test.