• 대한화학회지
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• 제23권4호
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• pp.248-258
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• 1979

저자들은 Cibacron Blue F3G-A Separose 컬럼 어피니티크로마토그래피에 의하여 GIn-cose-6-phosphate dehydrogenase를 Leuconostoc mesenteroides로부터 순수 분리한 바 있다. 이 효소를 사용하여 효소특성을 조사한 결과 분자량은 Sephadex G-200 컬럼에 의해 112,000이었으며 최적온도는 50$^{\circ}$, 활성화에너 지는 8.36kcal/mole 불활성화에너지는 -58.2kcal/mole로 나타났다. $NADP^+$를 조효소로 사용하였을때 최적 pH7.8에서 K_{G6p}:76.9${\mu}$M, ${\alpha}K_{NADP}:\;7.46{\mu}M,\;{\alpha}KNNADP:\;7.l4{\mu}M$이었으며 같은 조건에서 $NAD^+$를 조효소로 사용하였을때 $K_{G6P}:\;53.65{\mu}M,\;K_{NAD}:\;115.2{\mu}M\;{\alpha}K_{NAD}:\;707.2{\mu}M$이었다. 따라서 $NADP^+$ 및 $NAD^+$를 조효소로 사용한 경우에 있어서 ${\alpha}$ 값은 각각 1과 6으로 나타났다. pH변화에 따른 반응속도상수의 변화에 의하면 $NAD^+$를 조효소로 하였을때 최적 pH는 7.8 이었고 pKa가 7.2인 활성기와 ${\mu}Kb$가 9.0∼9.6인 활성기가 효소와 기질의 상호작용에 관여함을 알았다. 이중 pKa 7.2인 활성기를 밝히기 위하여 효소를 광산화와 carboxymethylation을 시킨결과 histidine의 imidazole기임을 알수 있있다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.75-75
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• 2018

Commercially pure titanium (CP-Ti) and Ti-6Al-4V alloys have been widely used in implant materials such as dental and orthopedic implants due to their corrosion resistance, biocompatibility, and good mechanical properties. However, surface modification of titanium and titanium alloys is necessary to improve osseointegration between implant surface and bone. Especially, when titanium oxide nanotubes are formed on the surface of titanium alloy, cell adhesion is greatly improved. In addition, plasma electrolytic oxide (PEO) coatings have a good safety for osseointegration and can easily and quickly form coatings of uniform thickness with various pore sizes. Recently, the effects of bone element such as magnesium, zinc, strontium, silicon, and manganese for bone regeneration are researching in dental implant field. The purpose of this study was researched on the surface morphology of PEO-treated Ti-6Al-4V alloy after anodic titanium oxide treatmentusing various instruments. Ti-6Al-4V ELI disks were used as specimens for nanotube formation and PEO-treatment. The solution for the nanotube formation experiment was 1 M $H_3PO_4$ + 0.8 wt. % NaF electrolyte was used. The applied potential was 30V for 1 hours. The PEO treatment was performed after removing the nanotubes by ultrasonics for 10 minutes. The PEO treatment after removal of the nanotubes was carried out in the $Ca(CH_3)_2{\cdot}H_2O+(CH_3COO)_2Mg{\cdot}4H_2O+Mn(CH_3COO)_2{\cdot}4H_2O+Zn(CH_3CO_2)_2Zn{\cdot}2H_2O+Sr(CH_2COO)_2{\cdot}0.5H_2O+C_3H_7CaO_6P$ and $Na_2SiO_3{\cdot}9H_2O$ electrolytes. And the PEO-treatment time and potential were 3 minutes at 280V. The morphology changes of the coatings on Ti-6Al-4V alloy surface were observed using FE-SEM, EDS, XRD, AFM, and scratch tester. The morphology of PEO-treated surface in 5 ion coating solution after nanotube removal showed formation or nano-sized mesh and micro-sized pores.

• Restorative Dentistry and Endodontics
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• 제32권4호
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• pp.313-326
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• 2007

본 연구는 단일 접착과정 상아질 접착제와 복합레진 사이에는 부적합성이 존재하며, 이를 개선하기 위해 중간 레진층이 필요하다는 가설을 규명하기 위해 시행되었다. 발치된 치아의 협설측 상아질에 3종의 단일 접착과정 상아질 접착제를 도포 후 광중합, 2종의 중간 레진층 적용, 광중합 또는 자가중합형 복합레진의 사용여부에 따라 30개의 실험군으로 분류하였다. 미세전단 결합강도를 측정하고 투과전자현미경 (TEM)을 이용하여 접착계면에서의 미세 누출과 수분의 이동경로를 관찰하여 접착제의 투과성을 평가하여 다음과 같은 결론을 얻었다. 중간 레진층을 적용 시 접착층의 투과도가 감소되었고 복합레진에 대한 단일 접착과정 상아질 접착제의 결합강도가 증가되었다. 따라서 시간 절약 및 간단한 접착과정을 선호하여 단순화된 상아질 접착제를 선택하는 것은 재고되어야 한다.

• 유통과학연구
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• 제14권4호
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• pp.103-110
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• 2016

Purpose - This study investigates the improvement of rationalization of distribution structure in Korean diamond market. It also explores the international distribution of diamond and how the distribution of Korean diamond market system was improved. This study also for providing the evaluation method in case of purchasing diamond on the consumers. Research Design, Data, and Methodology - The research investigates how international diamond distribution market has been changed since 1933 by De Beers. The international Diamond rough stone has been deregulated in supply and demand by Debeers since July, 2000, therefore, the price maintenance policy of diamond market also has been changed. In the short term, the diamond price in market has been down, whereas, in the long term, the market share of Debeers has affected the high quality of diamond price in world market. Before 1985, both G color and VVS1 clarity were used as the level of percentages in the diamond certificate of authenticity in Korea. But, after 1985, the diamond certificate of authenticity uses Diamond Grading Report. Results - Between the 1970's and 1980's, Debeers had controlled about 80 percentages of international diamond supply market. But, Debeers share in diamond market fell by 60 percentages in 2000's. Debeers supplied 31%(4390 carets) of international diamond supply and 41%(39 billion dollars) in 2003. However, Debeers shares 50% of market shares in the diamond supply market by Alosa in Russia. In Korea, the diamond grading report system has been used since 1985. But, the diamond grading report system has price bubbles and much irrational parts in grading system methods. Conclusions - 4C, the grading system of diamond, is a method for comparing and evaluating diamond objectively. Diamond is graded according to its color, cut, clarity, and carat. The price of diamond is determined based on its each item. Consumers purchase diamond for the purpose of investment and wearing. In terms of investment, it is recommended to purchase diamond with color of D grade, cut with Excellent or Very Good Cut grade, Clarity of FL or IF, and more than 3 carat. As for wearing purpose, it is highly recommended for diamond to have color of F or G grade, cut of Excellent or Very Good Cut, clarity of VS2 or SI1, and more than 1 carat Before 2000, Central Selling Organization(CSO) distributed about 80 percentages rough diamond to world market exclusively by purchase, classification, assessment, and sales. After 2000, Dbeers diamond company looses slowly market shares, while Almosa diamond company etc. in Russia are taking over world market shares more and more. Debeers market shares have been falling over the years, and the international diamond markets are gradually growing by other international diamond companies. But, there is no change in Korean diamond market after 1980's. Korean diamond distribution needs to follow international level of Diamond Grading System. By using different grading systems with different panel members, Korean diamond grading system needs to follow international perfect grading systems to grow diamond markets and maintain within top 10 diamond markets countries.

• 한국수자원학회:학술대회논문집
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• 한국수자원학회 2020년도 학술발표회
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• pp.30-30
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• 2020

본 연구에서는 여름철에 농업용수(벼농사용)로서 집중적으로 지하수를 사용하는 지역에서 시기별 지하수 사용에 따른 지하수 수질변화를 평가하기 위해 수행되었다. 연구지역은 충남 홍성군 양곡리와 신곡리 일부를 포함하는 면적 2.83 ㎢(283.3 ha)에 해당하는 지역이다. 연구지역 지하수 수질의 공간적 분포 및 시간적 변화 특성 평가를 위하여 2019년 2회(7월, 10월)에 걸쳐 지하수 관정(21개소)에 대하여 조사 및 분석을 수행하였다. 지하수 샘플은 현장에서 온도(T), pH, 용존산소(DO) 및 전기전도도(EC), 산화환원전위(Eh) 등을 측정하였고, 실험실에서 주요 양이온 및 미량원소(Ca, Mg, Na, K, Si, Sr), 음이온(F, Cl, Br, NO₂, NO₃, PO₄, SO₄), 알칼리도, 용존 유기탄소(DOC)와 용존 유기물(DOM) 등을 분석하였다. 지하수 수질조사 결과, 전체의 14~15개소(67~71%)가 Ca-HCO₃ 유형으로 분류되었으며, 다음으로는 Ca-Cl 유형이 4~5개소(19~24%)가 관찰되었다. 얕은 심도의 관정에서 상대적으로 심도가 깊은 관정보다 대부분 성분(TDS, Ca, Mg, Na, K, Cl, SO₄, HCO₃, DOC)에서 높은 농도를 나타내었다. 지하수의 수질자료를 이용하여 다변량통계분석법인 주성분분석(PCA: Principal Components Analysis)과 계층적 군집분석(HCA: Hierachical Cluster Anlaysis)를 수행한 결과, 초기 3개 주요 고유성분(eigenvalue)는 PC1 54.0%, PC2 14.2%, PC3 12.3%로 전체 분산의 88.3%를 설명할 수 있었다. PC1은 Ca, Mg, Na, K, Cl, SO₄, DOC가 주요한 영향 인자였으며 PC2는 HCO₃, NO₃, DO에 영향 받음을 확인하였다. 계층적 군집분석 결과, 연구지역 지하수는 Na-Cl 유형의 C-3 관정을 제외하고는 크게 두 그룹으로 구분되어 졌다. 다변량통계분석의 결과에서도 수리지화학, 동위원소, 용존유기물 등의 특성에서 나타나는 것과 유사한 연구지역의 수질특성을 확인할 수 있었다. 연구지역은 차시기 동안 수질변화는 일부 관정을 제외하고는 유의할 만한 수준으로 관찰되지는 않았고, 지하수 사용에 따른 지하수위 회복도 빠르게 진행되고 있는 것으로 나타났다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.80-81
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• 2012

Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

• 헤리티지:역사와 과학
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• 제44권3호
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• pp.132-149
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• 2011

고대에는 단청이나 고분벽화, 사찰벽화, 불화 등 문화재에 다양한 색상을 구현하고자 무기안료 또는 유기안료를 많이 사용하였다. 이 연구는 통도사 영산전내 벽체에 그려진 사찰벽화의 안료를 휴대용X선형광분석기로 정성분석하여 사용안료의 종류를 밝히고자 하였다. 성분분석 결과와 기존 고대 벽화 안료의 분석 결과들을 종합해 볼 때, 영산전 벽화에 사용된 적색은 주사와 석간주로 추정되며, 백색은 연백이 사용되었고, 일부 호분이나 백악, 백토 등의 사용 가능성도 있다. 녹색은 2가지가 사용되었는데 주로 바탕칠에 사용된 밝은 녹색은 녹토이고, 광배부분 등의 진한녹색은 석록이나 동록, 녹염동광으로 판단된다. 황색과 흑색은 각각 황토와 먹이 사용된 것으로 보이며, 육색과 분홍 등 원색이 아닌 안료들은 적색에 백색안료를 혼합하거나, 진적색에 황색안료를 혼합하는 것과 같이 2가지 이상의 안료를 적절하게 섞어서 사용하였을 것으로 추정된다. 결론적으로 성분분석으로만 판단하였을 때 통도사 영산전에 사용된 안료는 모두 고대에 주로 이용되었던 무기 안료임을 알 수 있었다. 다만, 문화재임으로 안료의 일부를 채취하여 결정구조분석 등의 방법으로 광물을 동정한 것이 아니므로 특정 원료 광물을 명확하게 판단하기는 어려웠다.

• 핵의학기술
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• 제16권2호
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• pp.3-6
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• 2012

방사성의약품 제조 후 품질관리의 중요성이 점점 커지고 있다. 품질관리 항목에는 물리적 성상, PH, 핵종의 순도 측정, 화학적 순도 측정, 방사화학적 순도 측정, 내독소 검사, 크립토픽스 잔류량 측정 등이 있다. 내독소 검사는 발열 및 쇼크등을 일으킬 수 있는 그람음성간균의 리포다당질이 포함된 검체가 인체에 주입되는 것을 방지하기 위한 검사법이다. FASTlab module을 이용하여 합성된 $^{18}F$-FDG의 내독소 검사 시행 시 간섭요인이 발생하여 제대로 된 검사가 시행되지 못하여 희석하는 방법을 이용하였다. LAL free water를 이용하여 비색법은 25 ${\mu}l$, 겔화법은 200 ${\mu}l$를 최소단위로 하여 희석배수가 10배수를 초과하지 않는 범위내에서 희석배수를 10배수, 20배수, 30배수, 40배수로 하여 희석하였다. 희석된 시약을 겔화법은 STT와 PCT에 각각 200 ${\mu}l$를 주입하고 Incubator에 $37^{\circ}C$로 1시간동안 배양하여 겔형성 정도를 확인하고, 비색법은 25 ${\mu}l$를 최소단위로 하여 위와 같이 희석한다. 희석된 시약은 ENDOSAFE-PTS의 Dilution factor를 입력하고 배수 당 하나의 카트리지를 4곳의 주입구에 25 ${\mu}l$씩 주입하고 결과 데이터를 확인한다. 결과는 겔화법은 FASTlab의 경우 40배수에서만 겔이 형성되었고, TRACERlab Mx의 경우 거의 모든 배수에서 겔이 형성되었지만 간헐적으로 형성되지 않는 경우도 있었다. 비색법은 FASTlab의 경우 40배수에서만 Spike Rxn time CV, Sample Rxn time CV, Spike recovery 모두 정상범위 안에 포함되었다. TRACERlab Mx의 경우 10배수에서 Spike Rxn time CV, Sample Rxn time CV, Spike recovery 모두 정상범위 안에 포함되었다. FASTlab에서 생산된 방사성의약품은 중화제인 $H_3PO_4$가 PCT내에 겔 형성에 관여하는 $Mg^{2+}$이온과 결합하여 겔 형성을 하지 못하는 것으로 추측된다. 이에 희석을 할 경우 $H_3PO_4$ 양이 줄어 간섭효과를 제거할 수 있었다. 엔도톡신 검사에서 간섭인자들은 무수히 존재한다. 이 간섭인자들은 합성장치나 시약에 따라 달라질 수 있으므로 이와 같은 간섭인자들을 극복하기 위한 노력으로 품질검사의 정확성과 신뢰를 제공하도록 해야 할 것이다.

• 한국지하수토양환경학회:학술대회논문집
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• 한국지하수토양환경학회 2004년도 임시총회 및 추계학술발표회
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• pp.119-120
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• 2004

Urban groundwater has a unique hydrologic system because of the complex surface and subsurface infrastructures such as deep foundation of many high buildings, subway systems, and sewers and public water supply systems. It generally has been considered that increased surface impermeability reduces the amount of groundwater recharge. On the other hand, leaks from sewers and public water supply systems may generate the large amounts of recharges. All of these urban facilities also may change the groundwater quality by the recharge of a myriad of contaminants. This study was performed to determine the factors controlling the recharge of deep groundwater in an urban area, based on the hydrogeochemical characteristics. The term ‘contamination’ in this study means any kind of inflow of shallow groundwater regardless of clean or contaminated. For this study, urban groundwater samples were collected from a total of 310 preexisting wells with the depth over 100 m. Random sampling method was used to select the wells for this study. Major cations together with Si, Al, Fe, Pb, Hg and Mn were analyzed by ICP-AES, and Cl, N $O_3$, N $H_4$, F, Br, S $O_4$and P $O_4$ were analyzed by IC. There are two groups of groundwater, based on hydrochemical characteristics. The first group is distributed broadly from Ca-HC $O_3$ type to Ca-C1+N $O_3$ type; the other group is the Na+K-HC $O_3$ type. The latter group is considered to represent the baseline quality of deep groundwater in the study area. Using the major ions data for the Na+K-HC $O_3$ type water, we evaluated the extent of groundwater contamination, assuming that if subtract the baseline composition from acquired data for a specific water, the remaining concentrations may indicate the degree of contamination. The remainder of each solute for each sample was simply averaged. The results showed that both Ca and HC $O_3$ represent the typical solutes which are quite enriched in urban groundwater. In particular, the P$CO_2$ values calculated using PHREEQC (version 2.8) showed a correlation with the concentrations of maior inorganic components (Na, Mg, Ca, N $O_3$, S $O_4$, etc.). The p$CO_2$ values for the first group waters widely ranged between about 10$^{-3.0}$ atm to 10$^{-1.0}$ atm and differed from those of the background water samples belonging to the Na+K-HC $O_3$ type (<10$^{-3.5}$ atm). Considering that the p$CO_2$ of soil water (near 10$^{-1.5}$ atm), this indicates that inflow of shallow water is very significant in deep groundwaters in the study area. Furthermore, the P$CO_2$ values can be used as an effective parameter to estimate the relative recharge of shallow water and thus the contamination susceptibility. The results of our present study suggest that down to considerable depth, urban groundwater in crystalline aquifer may be considerably affected by the recharge of shallow water (and pollutants) from an adjacent area. We also suggest that for such evaluation, careful examination of systematically collected hydrochemical data is requisite as an effective tool, in addition to hydrologic and hydrogeologic interpretation.ion.ion.