• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.09a
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• pp.91-95
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• 1998

Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/H2 gas system during the deposition. the schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

• Journal of the Korean institute of surface engineering
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• v.37 no.6
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• pp.319-325
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• 2004

Fe thin films containing Si particles were prepared on metallic substrates by electrodeposition method in sulfate solutions and the content of codeposited Si particles in the films was investigated as a function of applied current density, the content of Si particels in the solution, solution pH, solution temperature and concentration of $FeSO_4$$7H_2$O in the solution. The amount of Si codeposited in the film was not dependent on the applied current density, solution pH and solution temperature, while it was dependent on the content of Si particles in the solution and the concentration of $FeSO_4$$7H_2$O in the solution. The amount of Si codeposited in the film increased with increasing content of Si particles in the solution but reached a maximum value of about 6 wt% when the content of Si particles in the solution exceeds 100 g/l. On the other hand, the content of Si codeposited in the film increased up to about 17 wt% with decreasing concentration of $FeSO_4$$7H_2$O in the solution. These results would be applied to the fabrication of very thin Fe-6.5 wt% Si sheets for electrical applications.

• The Korean Journal of Ecology
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• v.21 no.5_1
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• pp.449-456
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• 1998

This study was carried out to investigate the characteristics of acid deposition by stemflow, throughfall, rainfall and $SO_{2}$ in the industrial, urban and rural areas where were affected by the acid rain areas air pollution in Pinus thunbergii than Quercus spp. forest. As the stemflow pH in industrial and urban area were lowed that of rural area, the result industrial and urban, and correlation of negative ($r=-0.9415^{**}$) between pH and EC. The concentration of acid ion by stemflow, throughfall, rainfall were high $SO_{4}^{2-}$ ion at industrial areas, especially of $NO_{3}^{-}$ ion at urban areas. The concentration of basic ion all rain fall were high $Ca^{2+},\;Na^{+}$ ion at industrial areas, but there were high $Ca^{2+}$, $Na^{+}$ ion at urban areas. The concentration of $SO_{2}$ at survey areas were high $SO_{2}$ concentration at industrial and urban areas, but there was low at rural areas. There was correlation of negative ($r=-0.8007^{**}$ between pH and $SO_{2}$ concentration at survey areas. Soil acidity was also affected by stemflow and showed sigificantly low pH in industerial and urban areas.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05b
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• pp.82-85
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• 2003

This dissertation describes an optimization method for fabricating thick films with superconducting YBCO powders by electrophoresis technique. The lateral alternating applied voltage caused to shake the superconducting powder vertically to the deposition field during the process of the oriented deposition so that it was deposited along the c-axis on the silver tape with shaky-aligned EPD. As the result, the optimized thin film fabrication method was obtained to get more dense and uniform surface morphology as well as the improved critical current density. For commercial utilization and efficiency, in this dissertation, alternating voltage of 25-120 V/cm in frequency of 60Hz was proposed to apply it as a subsidiary source for shaky-flow deposition so that the fabricated thin film showed uniform surface morphology with less voids and cracks and $T_{c.zero}$ of 90 K and the critical current density of $3419A/cm^2$.

• Journal of Environmental Science International
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• v.11 no.6
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• pp.489-496
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• 2002

The purpose of this study was to investigate spatial distributions of total deposition. A total number 79 samples were collected at 17 sampling sites from September 1999 to January 2000. Total (=wet+dry) atmospheric depositions were collected by filtered deposition sampler at sampling site (the Western Part of Kyongsangnam Province). In addition, the deposition of soluble and insoluble fraction was also investigated to find a suitable simplified collection method for a long-term monitoring of total deposition. The total depositions were measured soluble amount(mm/month), insoluble amount(kg/km$^2$/month), pH, conductivity(E.C.) and eight ionic components. The spatial distribution of deposition flux was to estimated by using a kringing analysis. The 17 sites mean fluxes of water soluble ionic components; SO$_4$$\^$2-/, Cl$\^$-/, NO$_3$$\^$-/, Na$\^$+/, NH$_4$$\^$+/, K$\^$+/, Mg$\^$2+/, Ca$\^$2+/ were 100.7∼315.6kg/km$^2$/month, 30.1∼234.3kg/km$^2$/month, 64.4∼ 139.4kg/km$^2$/month, 7.5∼68.3kg/km$^2$/month, 10.7∼48.7kg/km$^2$/month, 5.6∼27.9kg/km$^2$/month, 4.5∼17.5kg/km$^2$/month, 27.6∼81.7kg/km$^2$/month, respectively.

• Korean Journal of Materials Research
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• v.14 no.2
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• pp.141-145
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• 2004

Silicon nitride thin films were deposited by atomic layer deposition (ALD) technique in a batch-type reactor by alternating exposures of precursors. XJAKO200414714156408$_4$ or$ SiH_2$$Cl_2$ was used as the Si precursor, $NH_3$ was used as the N precursor, and the deposited films were characterized comparatively. The thickness of the film linearly increased with the number of deposition cycles, so that the thickness of the film can be precisely controlled by adjusting the number of cycles. As compared with the deposition using$ SiCl_4$, the deposition using $SiH_2$$Cl_2$ exhibited larger deposition rate at lower precursor exposures, and the deposited films using $SiH_2$$Cl_2$ had lower wet etch rate in a diluted HF solution. Silicon nitride films with the Si:N ratio of approximately 1:1 were obtained using either Si precursors at $500^{\circ}C$, however, the films deposited using $SiH_2$$Cl_2$ exhibited higher concentration of H as compared with those of the $SiC_4$ case. Silicon nitride thin films deposited by ALD showed similar physical properties, such as composition or integrity, with the silicon nitride films deposited by low-pressure chemical vapor deposition, lowering deposition temperature by more than $200^{\circ}C$.

• Journal of Korean Society for Atmospheric Environment
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• v.15 no.1
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• pp.53-61
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• 1999

Acid aerosol and gas concentrations ($SO_4^{2-}$, $NO_3^-$, $HNO_3$, $SO_2$, and $NH_3$) were measured at Chunchon and Seoul, Korea using filter pack method during one year from October 1996 to september 1997. The samples were collected during 24 hours every Wednesday in a week from 10 A.M. with 10$\ell$/min of sample flow. Concentration of $HNO_3$, $SO_2$ and $NH_3$ gases showed typical seasonal variation. The $HNO_3$ showed the highest in summer and annual mean concentrations were 0.42 ppb and 0.57 ppb at Chunchon and Seoul, respectively. The $SO_2$ showed the highest in winter and annual mean concentration was 5.59 ppb at Chunchon. The $NH_3$ showed the highest in early summer and annual mean concentration were 5.15 ppb and 6.28 ppb at Chunchon and Seoul, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.264.2-264.2
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• 2013

Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.

• Journal of Environmental Health Sciences
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• v.31 no.4 s.85
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• pp.260-265
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• 2005

Indoor air quality might be affected by source strength of indoor pollutants, ventilation rate, decay rate, outdoor level, and so on. Although technologies measuring these factors exist directly, direct measurements of all factors are not always practical in most field studies. The purpose of this study was to develop an alternative method to estimate the source strength and deposition constant by application of multiple measurements. For the total duration of 60 days, indoor and outdoor $NO_2$ concentrations every 3 days were measured in 30 houses in Seoul, Asan and Daegu. Using a compartment model by mass balance and linear regression analysis, penetration factor (ventilation divided by sum of air exchange rate and deposition constant) and source strength factor (emission rate divided by sum of air exchange rate and deposition constant) were calculated. Subsequently, the source strength and deposition constant were estimated. Natural ventilation was $1.80{\pm}0.42\;ACH,\;1.11{\pm}0.50\;ACH,\;0.92{\pm}0.26\;ACH$ in Seoul, Asan and Daegu, respectively. Calculated deposition constant(K) and source strength of $NO_2,$ in this study were $0.98{\pm}0.28\;hr^{1}\;and\;16.28{\pm}7.47\;ppb/h,$ respectively.

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.163.2-163.2
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• 2010

In this work, nano-flake shaped nickel oxide (NiO) films were synthesized by chemical bath deposition technique for electrochemical capacitors. The deposition was carried out for 1 and 2 h at room temperature using nickel foam as the substrate and the current collector. The structure and morphology of prepared NiO film were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). And, electrochemical properties were characterized by cyclic voltammetry, galvanostatic charge-discharge, and AC impedence measurement. It was found that the NiO film was constructed by many interconnected NiO nano-flakes which arranged vertically to the substrate, forming a net-like structure with large pores. The open macropores may facilitate the electrolyte penetration and ion migration, resulted in the utilization of nickel oxide due to the increased surface area for electrochemical reactions. Furthermore, it was found that the deposition onto nickel foam as substrate and curent collector led to decrease of the ion transfer resistance so that its specific capacitance of a NiO film had high value than NiO nano flake powder.