• 제목/요약/키워드: $O_3$ precursor

검색결과 783건 처리시간 0.023초

m-지르코니아와 Yag 졸로부터 지르코니아계 전해질 제조 및 물성 (Preparation and Properties of Zirconia-based Electrolytes from m-Zirconia and Yag Sol)

  • 강건택;임경란;남석우;김창삼;이영수;유한일
    • 한국세라믹학회지
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    • 제38권9호
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    • pp.834-838
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    • 2001
  • 고체 전해질로 많이 사용되는 이트리아로 안정화된 입방정형(cubic) 지르코니아의 기계적 강도를 향상시키기 위하여, 단사형(monoclinic) 지르코니아(m-$ZrO_2$)를 원료로 지르코니아  안정화시키는 이트리아와 지르코니아의 낮은 기계적 강도를 향상시켜 주기 위한 알루미나를 Yag($Y_3Al_5O_{13}$)졸의 형태로 첨가하여, 졸 형태로 첨가된 이트리아와 알루미나가 입방정 지르코니아 소결체의 기계적, 전기적 특성에 미치는 영향을 조사하였다. 17.8 wt% Yag(6.3mol% $Y_2O_3$)가 첨가된 경우 파괴인성은 3.62MPa${\cdot}m^{1/2}$, 파괴강도는 447MPa로 8mol%의 이트리아로 안정화된 지르코니아(TZ8Y)의 1.44MPa${\cdot}m^{1/2}$, 270MPa에 비하여 기계적 특성이 현저히 향상되었으나, 950$^{\circ}$C, 공기분위기에서의 전기전도도는 0.057${\Omega}^{-1}cm^{-1}$로 TZ8Y에 비해 반 정도로 낮아졌으며, 21.6wt% Yag(8.0mol% $Y_2O_3$)가 첨가된 경우에는 파괴인성은 2.93MPa${\cdot}m^{1/2}$, 파괴강도는 388MPa로 TZ8Y에 비하여 향상되었고, 전기전도도는 0.076${\Omega}^{-1}cm^{-1}$을 나타내었다.

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PECVD에 의한 YSZ(Yttria Stabilized Zirconia)박막 제조 (Synthesis of YSZ Thin Films by PECVD)

  • 김기동;신동근;조영아;전진석;최동수;박종진
    • 한국재료학회지
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    • 제9권3호
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    • pp.234-239
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    • 1999
  • PECVD(Plasma enhanced chemical vapor deposition)을 이용하여 yttria-stabilized zirconia(YSZ) 박막을 제조하였다. 반응물질로 금속유기화합물을 $Zr[TMHD]_4$$Y[TMHD]_3$그리고 산소를 사용하였으며, 증착온도는 $425^{\circ}C$, rf power는 0~100W까지 적용하였다. YSZ 박막은 (200)면이 기판에 평행한 입벙정상 구조를 가졌으며, 1시간 내에 $1\mu\textrm{m}$ 두께를 형성하였다. EDX에 의한 막의 성분분석 결과로부터 환산된 박막내의 $Y_2O_3$의 함량은 0-36%의 범위였다. 버블러의 온도 및 운반기체의 유량이 증가함에 따라 박막의 두께 역시 비례하여 증가하였는데, 이는 precursor의 flux 증가로 인한 박막내의 $Y_2O_3$의 함량증가에 의한 것이었다. Zr 및 Y, O는 박막의 두께에 따라 일정한 조성비를 나타내었다. 운반기체를 Ar로 하였을 때 $1000\AA$이하의 크기를 갖는 YSZ 입자들이 column 모양으로 기판에 수직하게 성장하였으며, 운반기체가 He인 경우에도 column 모양으로 성장하였으며 입도가 $1000~2000\AA$으로 Ar의 경우보다 조대해졌다. XRD 분석결과 $Y_2O_3$의 함량이 증가함에 따라 YSZ의 격자상수 값이 약간씩 증가하였다. 이는 박막 전반에 걸쳐 형성된 균열에 의해 격자변형으로 인해 발생한 응력을 완화시켰지 때문이다.

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Fabrication and characterization of perovskite CH3NH3Pb1-xSbxI3-3xBr3x photovoltaic devices

  • Yamanouchi, Jun;Oku, Takeo;Ohishi, Yuya;Fukaya, Misaki;Ueoka, Naoki;Tanaka, Hiroki;Suzuki, Atsushi
    • Advances in materials Research
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    • 제7권1호
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    • pp.73-81
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    • 2018
  • $TiO_2/CH_3NH_3Pb_{1-x}Sb_xI_{3-3x}Br_{3x}-based$ photovoltaic devices were fabricated by a spin-coating method using mixture solutions with $SbBr_3$. Effects of $SbBr3$, CsI or RbBr addition to $CH_3NH_3PbI_3$ precursor solutions on the photovoltaic properties where investigated. The short-circuit current densities and photoconversion efficiencies were improved by adding a small amount of $SbBr_3$, CsI or RbBr to the perovskite phase, which would be due to the doping effect of Sb, Br and Cs/Rb atom at the Pb, I and $CH_3NH3$ sites, respectively.

전해증착 Cu(In,Ga)Se2 태양전지 박막의 열처리 특성 (Annealing Characteristics of Electrodeposited Cu(In,Ga)Se2 Photovoltaic Thin Films)

  • 채수병;신수정;최재하;김명한
    • 한국재료학회지
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    • 제20권12호
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    • pp.661-668
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    • 2010
  • Cu(In,Ga)$Se_2$(CIGS) photovoltaic thin films were electrodeposited on Mo/glass substrates with an aqueous solution containing 2 mM $CuCl_2$, 8 mM $InCl_3$, 20 mM $GaCl_3$ and 8mM $H_2SeO_3$ at the electrodeposition potential of -0.6 to -1.0 V(SCE) and pH of 1.8. The best chemical composition of $Cu_{1.05}In_{0.8}Ga_{0.13}Se_2$ was found to be achieved at -0.7 V(SCE). The precursor Cu-In-Ga-Se films were annealed for crystallization to chalcopyrite structure at temperatures of 100-$500^{\circ}C$ under Ar gas atmosphere. The chemical compositions, microstructures, surface morphologies, and crystallographic structures of the annealed films were analyzed by EPMA, FE-SEM, AFM, and XRD, respectively. The precursor Cu-In-Ga-Se grains were grown sparsely on the Mo-back contact and also had very rough surfaces. However, after annealing treatment beginning at $200^{\circ}C$, the empty spaces between grains were removed and the grains showed well developed columnar shapes with smooth surfaces. The precursor Cu-In-Ga-Se films were also annealed at the temperature of $500^{\circ}C$ for 60 min under Se gas atmosphere to suppress the Se volatilization. The Se amount on the CIGS film after selenization annealing increased above the Se amount of the electrodeposited state and the $MoSe_2$ phase occurred, resulting from the diffusion of Se through the CIGS film and interaction with Mo back electrode. However, the selenization-annealed films showed higher crystallinity values than did the films annealed under Ar atmosphere with a chemical composition closer to that of the electrodeposited state.

열처리 분위기에 따른 동/Bi2212 고온초전도 테입의 미세구조 (Microstructure Analysis of Cu/Bi2212 High Temperature Superconducting Tapes with Meat-Treatment Atmosphere)

  • 한상철;성태현;한영희;이준성;이원택;김상준
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.388-391
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    • 1999
  • Well oriented Bi2212 superconductor thick films were formed successfully on a copper substrate by liquid reaction between a Cu-free precursor and Cu tape method in which Cu-free BSCO powder mixture was' printed on copper plate and heat-treated. And we examined the effect of heat-treatment atmosphere for the superconducting properties and microstructure of Bi2212. The composition of Cu-free BSCO powder mixture was Bi$_2O_3$ : SrCO$_3$ : CaCO$_3$ = 1.2~2 : 1 : 1 and the heat-treatment for the superconducting formation reaction was performed in air, oxygen, nitrogen and low oxygen pressure. At heat-treatment temperature, the printing layer partially melt by reacting with CuO of the oxidizing copper plate, and the nonsuperconducting phases present in the melt are typically Bi-free phases and Cu-free phases. Among the nonsuperconducting phases, it is known that the (Sr,Ca)CuO$_3$ phase restrain the formation of the Bi2212 superconducting phase. Because a kind of the nonsuperconducting phases is controled by the oxygen partial pressure, the optimum condition in which the remnants of the second phases don't leave in the fully processed conductor was determined by XRD and the critical tempera to re (Tc) analysis.

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아민첨가제를 사용하여 합성된 ZnO의 입자형상 및 광학적 특성 (Particle Shapes and Optical Property of Synthesized ZnO with Amine Additives)

  • 현혜현;현미호;이동규
    • 한국응용과학기술학회지
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    • 제33권1호
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    • pp.23-29
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    • 2016
  • 육방정계 우르자이츠형의 산화아연은 n형 반도체로써 3.37 eV의 넓은 밴드갭 에너지와 60 meV의 큰 엑시톤 바인딩 에너지를 가진 물질이다. 가스센서, 발광 다이오드, 염료 감응 태양 전지, 염료오염의 분해 등의 넓은 범위에서 활용이 가능하다. 합성 시 마이크로파 수열합성법을 사용하게 되면 높은 수율, 빠른 반응속도, 에너지 절약의 장점이 있다. 아민첨가제는 수산이온 생성 및 킬레이트 효과로 인해 산화아연 입자 형상을 조정하는 역할을 한다. 본 논문에서는 전구체로는 질산아연육수화물을 사용하였고, 형상조정제로는 에탄올아민, 에틸렌디아민, 디에틸렌트리아민, 헥사메틸렌테트라민을 사용하였다. 수산화소듐을 사용하여 용액을 pH 11로 조정하였다. 합성된 산화아연은 별모양, 막대형, 꽃모양, 원추형의 다양한 형상을 확인할 수 있었다. 아민첨가제에 의한 물리 화학적 특성과 광학적 특성을 분석하기 위해 XRD, SEM, EDS, FT-IR, UV-vis 스펙트럼, PL 스펙트럼을 사용하였다.

One-pot Syntheses of Metallic Hollow Nanoparticles of Tin and Lead

  • Lee, Gae-Hang;Choi, Sang-Il;Lee, Young-Hwan;Park, Joo-T.
    • Bulletin of the Korean Chemical Society
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    • 제30권5호
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    • pp.1135-1138
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    • 2009
  • Hollow Sn and Pb nanoparticles have been prepared by a rapid injection of an aqueous solution of $SnCl_2$- poly(vinylpyrrolidone) (PVP, surfactant) and $Pb(OAc)_2${\cdot}$3H_2O-PVP$ into an aqueous solution of sodium borohydride (reducing agent) in simple, one-pot reaction at room temperature under an argon atmosphere, respectively. The two hollow nanoparticles have been fully characterized by TEM, HRTEM, SAED, XRD, and EDX analyses. Upon exposure to air, the black Pb hollow nanoparticles are gradually transformed into a mixture of Pb, litharge (tetragonal PbO), massicot (orthorhombic PbO), and $Pb_5O_8$. The order and speed of mixing of the reactants between the metal precursor-PVP and the reductant solutions and stoichiometry of all the reactants are crucial factors for the formation of the two hollow nanocrystals. The Sn and Pb hollow nanoparticles were produced only when 1:(1.5-2) and 1:3 ratios of the Sn and Pb precursors to $NaBH_4$ were employed with a rapid injection, respectively.

원자층 증착법으로 증착된 MoOx를 적용한 전하 선택 접합의 이종 접합 태양전지 (Heterojunction Solar Cell with Carrier Selective Contact Using MoOx Deposited by Atomic Layer Deposition)

  • 정민지;조영준;이선화;이준신;임경진;서정호;장효식
    • 한국재료학회지
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    • 제29권5호
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    • pp.322-327
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    • 2019
  • Hole carrier selective MoOx film is obtained by atomic layer deposition(ALD) using molybdenum hexacarbonyl[$Mo(CO)_6$] as precursor and ozone($O_3$) oxidant. The growth rate is about 0.036 nm/cycle at 200 g/Nm of ozone concentration and the thickness of interfacial oxide is about 2 nm. The measured band gap and work function of the MoOx film grown by ALD are 3.25 eV and 8 eV, respectively. X-ray photoelectron spectroscopy(XPS) result shows that the $Mo^{6+}$ state is dominant in the MoOx thin film. In the case of ALD-MoOx grown on Si wafer, the ozone concentration does not affect the passivation performance in the as-deposited state. But, the implied open-circuit voltage increases from $576^{\circ}C$ to $620^{\circ}C$ at 250 g/Nm after post-deposition annealing at $350^{\circ}C$ in a forming gas ambient. Instead of using a p-type amorphous silicon layer, high work function MoOx films as hole selective contact are applied for heterojunction silicon solar cells and the best efficiency yet recorded (21 %) is obtained.

CVD로 in-situ 도핑된 다결정 3C-SiC 박막의 전기적 특성 (Electrical characteristics of in-situ doped polycrystalline 3C-SiC thin films grown by CVD)

  • 김강산;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.199-200
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    • 2009
  • This paper describes the electrical properties of polycrystalline (poly) 3C-SiC thin films with different nitrogen doping concentrations. The in-situ-doped poly 3C-SiC thin films were deposited by using atmospheric-pressure chemical vapor deposition (APCVD) at $1200^{\circ}C$ with hexamethyldisilane (HMDS: $Si_2$ $(CH_3)_6)$ as a single precursor and 0 ~ 100 sccm of $N_2$ as the dopant source gas. The peaks of the SiC (111) and the Si-C bonding were observed for the poly 3C-SiC thin films grown on $SiO_2/Si$ substrates by using X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR) analyses, respectively. The resistivity of the poly 3C-SiC thin films decreased from $8.35\;{\Omega}{\cdot}cm$ for $N_2$ of 0 sccm to $0.014\;{\Omega}{\cdot}cm$ with $N_2$ of 100 sccm. The carrier concentration of the poly 3C-SiC films increased with doping from $3.0819\;{\times}\;10^{17}$ to $2.2994\;{\times}\;10^{19}\;cm^{-3}$, and their electronic mobilities increased from 2.433 to $29.299\;cm^2/V{\cdot}S$.

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Na2CO3-CaCO3 보조상을 사용한 후막형 Co2 센서의 특성연구 (Characteristics of thick film Co2 sensors attached with Na2CO3-CaCO3 auxiliary phases)

  • 심한별;최정운;강주현;유광수
    • 센서학회지
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    • 제15권3호
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    • pp.168-172
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    • 2006
  • Potentiometric $CO_{2}$ sensors were fabricated using a NASICON ($Na_{1+x}Zr_{2}Si_{X}P_{3-X}O_{12}$, 1.8 < x < 2.4) thick film and auxiliary layers. The powder of a precursor of NASICON with high purity was synthesized by a sol-gel method. By using the NASICON paste, an electrolyte was prepared on the alumina substrate by screen printing and then sintered at $1000^{\circ}C$ for 4 h. A series of $Na_{2}CO_{3}-CaCO_{3}$ auxiliary phases were deposited on the Pt sensing electrode. The electromotive force (emf) values were linearly dependent on the logarithm of $CO_{2}$ concentration in the range between 1,000 and 10,000 ppm. The device attached with $Na_{2}CO_{3}-CaCO_{3}$ (1:2 in mol.%) showed good sensing properties in the low temperatures.