• 한국표면공학회지
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• 제34권2호
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• pp.89-96
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• 2001

N- or O-doped STS304 stainless films were synthesized by an unbalanced magnetron sputtering process with various argon and reactive gas ($N_2$, $O_2$) mixtures. These films were examined by scanning electron microscopy (SEM), X-ray diffraction (XRD), Auger electron spectroscopy (AES) and Knoop microhardness tester. The Results from X-ray diffraction (XRD) analysis showed that a STS304 stainless steel film synthesized without reactive gas using a bulk STS304 stainless steel target had a ferrite bcc structure ($\alpha$ phase), while the N-doped STS304 stainless film was consisted of a nitrogen supersaturated fcc structure, which hsa a strong ${\gamma}$(200) phase. In the O-doped films, oxide Phases ($Fe_2$$O_3$ and $Cr_2$$O_3$) were observed from the films synthesized under an excess $O_2$ flow rate of 9sccm. AES analysis showed that nitrogen content in N-doped films increased as the nitrogen flow rate increased. Approximately 43 at.%N in the N-doped film was measured using a nitrogen flow rate of 8sccm. In O-doped film, approximately 15 at.%O was detected using a $O_2$ flow rate of 12sccm. the Knoop microhardness value of N-doped film using a nitrogen flow rate of 8 sccm was measured to be approximately $H_{ k}$ 1200 and this high value could be attributed to the fine grain size and increased residual stress in the N-doped film.

• 한국전기전자재료학회논문지
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• 제21권4호
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• pp.354-361
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• 2008

The dielectric characteristics of low-k interlayer dielectric materials was fabricated by plasma enhanced chemical vapor deposition (PECVD). BTMSM precursor was evaporated and introduced with the flow rates from 16 sccm to 25 sccm by 1sccm step in the constant flow rate of 60 sccm $O_2$ in process chamber. Manufactured samples are analyzed components by measuring FT/IR absorption lines. Decomposition each Microscopic structures through two-dimensional correlation analysis about mechanisms for the formation of SiOCH in $SiOCH_3$, Si-O-Si and Si-$CH_3$ bonding group and analyzed correlation between the micro-structure of each group. It is a tendency that seems to be growing of Si-O-Ci(C) bonding group and narrowing of Si-O-$CH_3$ bonding group relative to the increasing flow-rate BTMSM. The order of changing sensitivity about changes of flow-rate in Si-O-Si(C) bonding group is cross link mode$(1050cm^{-1})$ $\rightarrow$ open link mode$(1100cm^{-1})\rightarrow$ cage link mode $(1140cm^{-1})$.

• 한국결정성장학회지
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• 제9권1호
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• pp.34-38
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• 1999

유기금속 화학 증착법(MOCVD)을 이용하여 Si(100) 기판 위에 $TiO_2$와 PbO의 동시 증착으로 $Pb(TMHD)_2$(PT) 박막을 증착하였다. 원료물질로는 Titanium tetra-isopropoxide(TTIP)와 $Pb(TMHD)_2$를 사용하였다. 증착온도를 $520^{\circ}C$, Pbdbfid을 30 sccm으로 고정하고, 전체유량을 750 sccm으로 하여 TTIP의 증발온도와 유량에 따른 PT 박막의 XRD 변화를 관찰하였다. PT 박막 생성은 TTIP의 증발온도 및 유량이 각각 48~$50^{\circ}C$와 18~22sccm 영역에서 생성되었으며, 생성된 박막과 기판의 계면에서는 Pb, Si, O의 상호확산을 관찰할 수 있었다.

• 방사성폐기물학회지
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• 제18권3호
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• pp.383-393
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• 2020

The corrosion behavior of Hastelloy C-276 was investigated to identify its applicability for carbon-anode-based oxide reduction (OR), in which Cl₂ and O₂ are simultaneously evolved at the anode. Under a 30 mL·min^-1 Cl₂ + 170 mL·min^-1 Ar flow, the corrosion rate was less than 1 g·m^-2·h^-1 up to 500℃, whereas the rate increased exponentially from 500 to 700℃. The effects of the Cl₂-O₂ composition on the corrosion rate at flow rates of 30 mL·min^-1 Cl₂, 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂, and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂ with a constant 170 mL·min^-1 Ar flow rate at 600℃ was analyzed. Based on the data from an 8 h reaction, the fastest corrosion rate was observed for the 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂ case, followed by 30 mL·min^-1 Cl₂ and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂. The effects of the chlorine flow rate on the corrosion rate were negligible within the 5-30 mL·min^-1 range. A surface morphology analysis revealed the formation of vertical scratches in specimens that reacted under the Cl₂-O₂ mixed gas condition.

• 한국세라믹학회지
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• 제36권7호
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• pp.742-750
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• 1999

화학기상응축법을 이용한 TiO2 나노분말합성시 전구체 주입속도 및 산소 반응기체유량의 변화에 따른 나노입자의 형성과정을 분말특성의 관점에서 조사하였다. 기상합성반응의 주요 열역학, 동역학적 인자인 과포화도, 충돌율, 체류시간의 상기 두 공정변수에 대한 의존성을 이론적으로 평가하였고, 이를 0.376, 0.742 m//min의 두 전구체 주입속도 조건에서 산소유량을 1에서 2slm까지 변화시키며 합성한 TiO2 나노분말의 특성과 관련하여 분석하였다 모든 조건에서 합성된 TiO2 분말은 20~30 nm의 크기를 갖는 미세한 anatase 상과 극소량의 rutilc상이 혼합되어 서로 느슨한 결합을 하고 있었다 전구체 주입속도가 0.376m//min의 경우, 전반적인 입도와 응집도는 0.742 m//min에 비해 작았으며, 산소유량이 증가할수록 체류시간과 충돌율이 감소하여 형성된 TiO2 분말의 입도는 감소하였다. 또한 산소유량 증가에 따른 과포화도의 감소는 분말형성과정과 기구에 영향을 미치는 것으로 판단되나, 정확한 분석을 위해서는 각각의 독립적인 열역학 및 동역학적 변수 조건하에서의 면밀한 고찰이 요구되었다.

• 산업기술연구
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• 제17권
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• pp.241-247
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• 1997

A numerical model has been proposed for a diffusion flame reactor to manufacture ultrafine $TiO_2$ powders. The model equations such as mass balance equation, the 0th, 1st, and 2nd moment equations of aerosols were considered. The phenomena such as $TiCl_4$ reaction rate, $TiO_2$ nucleation rate and the coagulation of $TiO_2$ powders were included in the aerosol dynamic equation. It is found that the $TiO_2$ particle concentration becomes higher, as the inlet $TiCl_4$ concentration and the total gas flow rate increase, and also as the flame temperature decreases. The $TiO_2$ particle size increases, as the flame temperature and the inlet $TiCl_4$ concentration increase and the total gas flow rate decreases.

• 방사성폐기물학회지
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• 제18권3호
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• pp.355-362
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• 2020

The corrosion behavior of the Inconel X-750 alloy was investigated for its potential application under a Cl₂-O₂ mixed gas flow in an Ar atmosphere. The corrosion rate was found to be negligible at temperatures up to 400℃ under a flow rate of 30 mL·min^-1 Cl₂ + 170 mL·min^-1 Ar, whereas an exponential increase was observed in the corrosion rate at temperatures greater than 500℃. The suppression of the corrosion reaction due to the presence of O₂ was verified experimentally at flow rates of 30 mL·min^-1 Cl₂ (4.96 g·m^-2·h^-1), 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂ (2.02 g·m^-2 ·h^-1), and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂ (1.34 g·m^-2·h^-1) under a constant Ar flow rate of 170 mL·min^-1 at 600℃ for 8 h. The surface morphology analysis results revealed that porous surfaces with tunnel-type holes were produced under the Cl₂-O₂ mixed-gas condition. Furthermore, the effects of the Cl₂ flow rate on the corrosion rate were investigated, indicating that its impact was negligible within the range of 5-30 mL·min^-1 Cl₂ at 600℃.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2009년도 춘계학술대회 논문집
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• pp.37-40
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• 2009

본 연구에서는 케로신/과산화수소 점화용 분사기의 설계/제작하여 분무특성에 관한 연구를 수행하고자 하였으며, 이에 앞서 촉매점화방식으로 적용할 때 가장 적합한 분사기를 설계하고자 하였다. 설계/제작된 분사기를 수류시험을 통해 질량 유량 및 분산각을 측정하였다. 그 결과 케로신의 목표 질량유량(12.88 g/s)은 설계 차압과 같은 차압인 3 bar에서 측정되었으며, 이 때 분산각은 $40^{\circ}$을 확인하였다. 또한 과산화수소의 목표 질량 유량(94.39 g/s)은 설계 차압(3 bar) 보다 작은 1 bar에서 측정됨을 확인하였다.

• 한국세라믹학회지
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• 제40권12호
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• pp.1165-1169
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• 2003

이중 이온빔 스퍼터링(Dual ion-beam sputtering)을 사용하여 보조이온건의 Ar/O$_2$가스유량 변화에 따라 Si-(III) 기판과 glass에 Ta$_2$O$_{5}$ 박막을 증착시켰다. 보조 이온총의 산소 가스량의 비가 감소함에 따라서 증착되는 Ta$_2$O$_{5}$ 박막의 성장속도는 감소하였으며, 굴절률은 $O_2$ 가스의 양이 0∼12sccm인 범위에서 2.09(at 1550nm)로 일정한 값을 나타내었다. Ar:O$_2$가 3: 12인 조건에서 화학양론 조성인 Ta$_2$O$_{5}$를 형성하였으며, 표면 거칠기도 가장 작은 값을 나타내었다.나타내었다.

• Corrosion Science and Technology
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• 제2권5호
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• pp.238-242
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• 2003

The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.