• 제목/요약/키워드: $MoO_3$ thin films

검색결과 110건 처리시간 0.032초

Atomic Layer Deposition of $Sb_2S_3$ Thin Films on Mesoporous $TiO_2$

  • 한규석;정진원;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.282-282
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    • 2013
  • The antimony sulfide ($Sb_2S_3$) thin films were deposited using the gas phase method which known as atomic layer deposition (ALD) on mesoporous micro-films. Tris (dimethylamido) antimony (III[$(Me_2N)_3Sb$] and hydrogensulfide ($H_2S$) were used as precursors to deposit $Sb_2S_3$. Self-terminating nature of $(Me_2N)_3Sb$ and $H_2S$ reaction were demonstrated by growth rate saturation versus precursors dosing time. Absorption spectra and extinction coefficient were investigated by UV-VIS spectroscopy. Scanning electron microscopic analysis and X-ray photoelectron spectroscopy (XPS) depth profile were employed to determine the conformal deposition.

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Synthesis and Characterization of Novel Rare-earth Oxides Precursors

  • Lee, Euy Jin;Park, Bo Keun;Chung, Taek-Mo;Kim, Chang Gyoun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.366.1-366.1
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    • 2014
  • The rare-earth oxides M2O3 (M=La, Pr, Gd) are good insulators due to their large band gap (3.9eV for Pr2O3, 5.6eV for Gd2O3), they have high dielectric constants (Gd2O3 K=16, La2O3 K=27, Pr2O3 K=26-30) and, compared to ZrO2 and HfO2, they have higher thermodynamic stability on silicon making them very attractive materials for high-K dielectric applications. Another attractive feature of some rare-earth oxides is their relatively close lattice match to that of silicon, offering the possibility of epitaxial growth and eliminating problems related to grain boundaries in polycrystalline films. Metal-organic chemical vapor deposition (MOCVD) has been preferred to PVD methods because of the possibility of large area deposition, good composition control and excellent conformal step coverage. Herein we report on the synthesis of rare-earth oxide complexes with designed alkoxide and aminoalkoxide ligand. These novel complexes have been characterized by means of FT-IR, elemental analysis, and thermogravimetric analysis (TGA).

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BIPV 시스템을 위한 전이금속 산화물 다중층 컬러 유리 구현 기술 연구 (Transition Metal Oxide Multi-Layer Color Glass for Building Integrated Photovoltaic System)

  • 안현식;;장은정;김민회;이재현;최윤석
    • 전기전자학회논문지
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    • 제23권4호
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    • pp.1128-1133
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    • 2019
  • 이 논문에서는 전이 금속 산화물(TMO)층으로 구성된 다층 박막을 사용하는 BIPV(Building Integrated Photovoltaic) 시스템용 전면 컬러 유리를 제안하였다. 몰리브덴 산화물(MoO3) 및 텅스텐 산화물(WO3)은 굴절률 차이가 큰 계면을 형성하여 적절한 간섭효과를 얻을 수 있다. 단일 Thermal Evaporator 증착 방법을 통해 다층 박막을 제작함으로써 간단하고 빠르며 저렴한 제조 방법을 제안하였다. MoO3(60nm)/WO3(100nm) 다층 박막으로 90% 이상의 광 투과율을 갖는 자홍색 유리를 시연하였으며, 이 기술은 상용화된 BIPV 시스템에 유용할 것으로 기대된다.

Effects of Drying Temperature on the Optical Properties of Solution Derived (Pb, La)$TiO_3$ Thin Films

  • Yoon, Dae-Sung;Kim, Sung-Wuk;Koo, Jun-Mo;Jiang, Zhong-Tao
    • The Korean Journal of Ceramics
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    • 제1권4호
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    • pp.191-196
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    • 1995
  • Using sol-gel processing method, thin films of lathanum modified lead titanate(PLT) on Corning 7059 glass were prepared. A differential thermal analysis (DTA/TG) curve of gel powder and infrared spectra (FT-IR) of the films were measured to estimate residual organices in them. The heat-treated films were characterized by X-ray diffraction(XRD). Microstructures of the films were observed by a scanning electron microscope (SEM). Optical properties of the films were determined by a UV-VIS spectrophotometer. The waveguiding properties and optical attenuation were measured with the end coupling method and the cut back method. Effects of the drying conditions on the transmittance and the propagation loss of the films were investigated. Experimemtal results showed that the content of residual organics in the film decreased as the drying temperature of the film increased. As the La content of the film increased, the grain size decreased and the transmittance increased. The transmittances of the films increased with the increasing of the drying temperature. The propagation losses in the film decreased as the drying temperature increased.

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Epitaxial growth of Pt Thin Film on Basal-Plane Sapphire Using RF Magnetron Sputtering

  • 이종철;김신철;송종환;이충만
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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    • pp.41-41
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    • 1998
  • Rare earth metal films have been used as a buffer layer for growing ferroelectric t thin film or a seed layer for magnetic multilayer. But when it was deposited on s semiconductor substrates for the application of magneto-optic (MO) storage media, it i is difficult to exactly measure magnetic cons떠nts due to shunting current, and so it n needs to grow metal films on insulator substrate to reduce such effect. Recently, it w was reported that ultra-thin Pt layer were epitaxially grown on A12O:J by ion beam s sputtering in 비떠 high vacuum and it can be used as a seed layer for the growth of C Co-contained magnetic multilayer. In this stu$\phi$, Pt thin film were epi떠xially grown on AI2D3 ($\alpha$)OJ) by RF magnetron s sputtering. The crystalline structure was analyzed by transmission electron microscope ( (TEM) and Rutherford Back Scattering (RBS)/Ion Channeling. In TEM study, Pt was b believed to be twinned on AI잉3($\alpha$)01) su$\pi$ace about Pt(ll1) plane.Moreover, RBS c channeling spectra showed that minimum scattering yield of Pt(111)/AI2O:J(1$\alpha$)OJ) was 4 4% and Pt(11J)/AI2D3($\alpha$)OJ) had 3-fold symmetry.

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4H-SiC기판 위에 Aerosol Deposition으로 증착된 Al2O3박막의 후열처리 효과 (Post Annealing Effect on the Characteristics of Al2O3 Thin Films Deposited by Aerosol Deposition on 4H-SiC)

  • 유수산나;강민석;김홍기;이영희;구상모
    • 한국전기전자재료학회논문지
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    • 제27권8호
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    • pp.486-490
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    • 2014
  • $Al_2O_3$ films on silicon carbide were fabricated by Aerosol deposition with annealing temperature at $800^{\circ}C$ and $1,000^{\circ}C$. The effect of thermal treatment on physical properties of $Al_2O_3$ thin films has been investigated by XRD (X-ray diffraction), AFM (atomic force microscope), SEM (scanning electron microscope), and AES (auger electron spectroscopy). Also electrical properties have been investigated by Keithley 4,200 semiconductor parameter analyzer to explain the interface trapped charge density ($D_{it}$), flatband voltage ($V_{FB}$) and leakage current ($I_o$). $Al_2O_3$ films become crystallized with increasing temperature by calculating full width at half maximum (FWHM) of diffraction peaks, also surface morphology is observed by topography measurement in non-contact mode AFM. $D_{it}$ was $2.26{\times}10^{-12}eV^{-1}.cm^{-2}$ at $800^{\circ}C$ annealed sample, which is the lowest value in all samples. Also the sample annealed at $800^{\circ}C$ has the lowest leakage current of $4.89{\times}10^{-13}A$.

$CeO_2$의 상전이에 따른 YBCO 박막의 결정성 및 특성의 변화 (Change of crystallization and properties of YBCO thin film by phase transition of $CeO_2$)

  • 김성민;이상렬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1590-1592
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    • 1999
  • We have fabricated good quality superconducting $YBa_2Cu_3O_{7-{\delta}}$ thin films on Hastelloy(Ni-Cr-Mo alloys) with $CeO_2$ buffer layers by in-situ pulsed laser deposition in a multi-target processing chamber. Using one of electrical properties of YBCO superconducting which the resistance approaches to zero dramatically on transition temperature, we have researched to make power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to make films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting layer and non-crystallization of YBCO on amorphous substrate. From early research, two ways-using textured metallic substrate and buffer layer-were proposed to overcome theses difficulties. We have chosen $CeO_2$ as a buffer layer which has cubic structure of $5.41{\AA}$ lattice parameter and only 0.2% of lattice mismatch with $3.82{\AA}$ of a-axis lattice parameter of YBCO on (110) direction of $CeO_2$. In order to enhance the crystallization of YBCO films on metallic substrates we deposited $CeO_2$ buffer layers at varying temperature $700^{\circ}C$ to $800^{\circ}C$ and $O_2$ pressure. By X-ray diffraction, we found that each domination of (200) and (111) orientations were strongly relied upon the deposition temperature in $CeO_2$ layer and the change of the domination of orientation affects the crystallization of YBCO upper layer.

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비정질 금속 기판상에 증착된 YBCO 박막의 결정성에 대한 CEO$_2$ 완충막의 효과 (Effect of CeO$_2$ buffer layer on the crystallization of YBCO thin film on Hastelloy substrate)

  • 김성민;이상렬
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.392-396
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    • 1999
  • Superconducting YBa$_2Cu_3O_{7-{\delta}}$(YBCO) thin films were grown on Hastelloy(Ni-Cr-Mo alloys) with CeO$_2$ buffer layer in-situ by pulsed laser deposition in a multi-target processing chamber. To apply superconducting property on power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to grow the YBCO films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting overlayers and non-crystallization of YBCO on amorphous substrate. It is necessary to use a buffer layer to overcome the difficulties. We have chosen CeO$_2$ as a buffer layer which has cubic structure of 5.41 ${\AA}$ lattice parameter and only 0.2% of lattice mismatch with 3.82 ${\AA}$ of a-axis lattice parameter of YBCO on [110] direction of CeO$_2$ In order to enhance the crystallization of YBCO films on metallic substrates, we deposited CeO$_2$ buffer layers with varying temperature and 02 pressure. By XRD, it is observed that dominated film orientation is strongly depending on the deposition temperature of CeO$_2$ layer. The dominated orientation of CeO$_2$ buffer layer is changed from (200) to(111) by increasing the deposition temperature and this transition affects the crystallization of YBCO superconducting film on CeO$_2$ buffered Hastelloy.

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Comparison of retention characteristics of ferroelectric capacitors with $Pb(Zr, Ti)O_3$ films deposited by various methods for high-density non-volatile memory.

  • Sangmin Shin;Mirko Hofmann;Lee, Yong-Kyun;Koo, June-Mo;Cho, Choong-Rae;Lee, June-Key;Park, Youngsoo;Lee, Kyu-Mann;Song, Yoon-Jong
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제3권3호
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    • pp.132-138
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    • 2003
  • We investigated the polarization retention characteristics of ferroelectric capacitors with $Pb(Zr,Ti)O_3$ (PZT) thin films which were fabricated by different deposition methods. In thermally-accelerated retention tests, PZT films which were prepared by a chemical solution deposition (CSD) method showed rapid decay of retained polarization charges as the thickness of the films decreased down to 100 nm, while the films which were grown by metal organic chemical vapor deposition (MOCVD) retained relatively large non-volatile charges at the corresponding thickness. We concluded that in the CSD-grown films, the thicker interfacial passive layer compared with the MOCVD-grown films had an unfavorable effect on retention behavior. We observed the existence of such interfacial layers by extrapolation of the total capacitance with thickness of the films and the capacitance of these layers was larger in MOCVD-grown films than in CSD-grown films. Due to incomplete compensation of surface polarization charges by the free charges in the metal electrodes, the interfacial field activated the space charges inside the interfacial layers and deposited them at the boundary between the ferroelectric layer and the interfacial layer. Such space charges built up an internal field inside the films, which interfered with domain wall motion, so that retention property at last became degraded. We observed less imprint which was a result of less internal field in MOCVD-grown films while large imprint was observed in CSD-grown films.

Tripod Polishing을 이용한 불균질 재료의 TEM 시편준비 방법과 미세조직 관찰 (TEM Sample Preparation of Heterogeneous Materials by Tripod Polishing and Their Microstructures)

  • 김연욱;조명주
    • Applied Microscopy
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    • 제34권2호
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    • pp.95-102
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    • 2004
  • 본 실험에서는 tripod polishing 방법을 이용하여 Pd/GaN/Sapphire 박막, PZT/MgO/Si 박막, 304 stainless steel 분말, $Mo_5Si_3/Mo_2B$ diffusion couple의 매우 다양한 물성이 포함된 불균질 재료의 TEM 시편을 제작하고 분석하였다. Tripod polishing을 사용하여 시편을 준비하면 시편의 종류에 관계없이 시편의 선단부에 매우 광범위한 전자빔 투과 영역을 지닌 TEM 시편을 얻을 수 있었으며, Pd/GaN/Sapphire 박막, PZT/MgO/Si 박막과 같이 기판이 경한 반도체 재료의 경우에는 연마 정도가 균일하며 연마과정 동안 오염이 심하지 않기 때문에 ion milling으로 cleaning 없이 TEM 관찰이 가능하다. 한편 304 stainless steel 분말과 같은 금속재료의 경우 짧은 시간의 ion milling 은 시편의 오염 제거에 도움된다. $Mo_5Si_3/Mo_2B$ diffusion couple에 형성된 실리사이드는 큰 취성 때문에 polishing 동안 시편이 깨지는 현상으로 전자가 투과할 수 있을 정도의 연마가 불가능하여 1시간 정도 ion milling 연마가 필요하다. Tripod polishing으로 TEM 시편을 준비하면 분석하고자 하는 지역을 정확하고도 넓게 연마할 수 있다. 또한 비교적 짧은 시간 내에 ion milling 없이 TEM 시편을 제작할 수 있기 때문에 ion milling에서 유발되는 여러 가지 문제점들을 해결할 수 있는 장점이 있었다. 그러나 tripod polishing은 전부 수작업으로 시편을 준비하기 때문에 시편을 제작하는 과정 동안 매우 세심한 주의가 요구되며 제작자의 숙련도와 경험을 필요로 하는 단점이 있다.