• 한국전기전자재료학회논문지
• /
• 제16권8호
• /
• pp.731-735
• /
• 2003

Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

• 전자공학회논문지D
• /
• 제35D권7호
• /
• pp.109-116
• /
• 1998

In this work was produced and analyzed a z-cut Ti:LiNbO$_{3}$ optical waveguide which applies for various optical devices.A waveguide channel with a thickness 8 .mu.m and a length 66,000.mu.m and a mach-zehnder interferometer type waveguide were fabricated at a diffusion temperature 1050.deg. C for 6-8hours in a wet $O_{2}$ environment. The resulting Ti:LiNbO$_{3}$ optical waveguide was measured to have a Ti-strip thickness of 950.angs. and low loss. Surfaces and cross-sections of a fabricated waveguide were analysed. The mode pattern anaysis revealed that the waveguide showed a single mode at a 1550nm wavelength. The effective dimension of the waveguide was calculated by measuring a gaussian profile; Wx=10.95.mu. and Wy=9.14.mu.m. a propagation loss, of 0.50dB/cm for a TM mode and 0.45dB/cm for a TE mode, was low enough to be accepatable for optical devices.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2000년도 하계학술대회 논문집
• /
• pp.288-293
• /
• 2000

BPM simulation was used in order to fabricate the LiNbO$_3$optical waveguide with optical source of He-Ne laser(λ=0.6328[$\mu$m]). we observed electric field E$_{x}$, E$_{y}$ in the x,y-direction are simulated at the LiNbO$_3$substrate (X1 55[$\mu$m]$\times$Z1 5000[$\mu$m]), where the depth, width and buffer layer of waveguide are 0.2[$\mu$m],4[$\mu$m] and 0.02[$\mu$m] respectively. By applying these parameters of single waveguide to simulate a X-switch, we have chosen index change of 0.002, width of 3[$\mu$m] and angle of 0.4$^{\circ}$~0.6$^{\circ}$of optical waveguide and under these conditions, optical beam propagates cross-side at 0.4$^{\circ}$. When applied switching voltage of 25[V], optical beam of X-switch turns cross-side to bar-side at intersection angle 0.4$^{\circ}$, index change of 0.002, waveguide width of 3[$\mu$m], electrode gap 2[$\mu$m]. By the above results, we can obtain design conditions of theoretical analysis of an X-switch optical waveguide.e.e.

• 대한전자공학회논문지SD
• /
• 제37권6호
• /
• pp.64-71
• /
• 2000

등간격, 동일 구조의 $Ti:LiNbO_3$ 세 도파로를 이용한 광스위치를 설계하고 제작하였다. 공도파로는 z-cut $LiNbO_3$ 기판상에 Ti를 내부 확산시켜 제작하였다. TM 모드 전파 손실을 줄이기 위하여 도파로 위에 $SiO_2$ 박막을 증착시킨 후, 광스위칭을 위하여 CPW(Coplanar Waveguide)구조 Al 전극을 형성시켰다. 가운데 도파로에 입사된 ${\lambda}=1.3{\mu}m$ 광에 대하여 세 도파로가 대칭적으로 detuning 되도록 전계 인가시 광 스위칭이 일어남을 확인하였다.

• Journal of the Optical Society of Korea
• /
• 제8권2호
• /
• pp.90-95
• /
• 2004

The structure of Ti:LiNbO$_3$optical waveguide with a mode size far different from that of single mode optical fiber has been optimized by tapering the waveguide ends. This work was focused on determining the optimized sets of parameters for the fabrication of low-loss Ti indiffused optical waveguides in LiNbO$_3$. Numerical and analytical modeling were applied to simulate the guiding quality and to determine the mode sizes. Based on these modeling results, new waveguide structures with tapered ends have been defined, fabricated and characterized in the respect of the coupling of fiber to Ti-indiffused LiNbO$_3$waveguide.

• 한국광학회지
• /
• 제2권3호
• /
• pp.149-152
• /
• 1991

리튬나이오베이트 결정에 Ti를 열확산시켜 광도파로를 만드는 방법에서 문제가 되는 out-diffusion(삼출) 문제를 해결하는 방안으로 확산과정 이전에 $SiO_2$ 박막을 시료 위해 입히고 Ti을 열확산시켜 광도파로를 제조하는 방법을 제안하였으며, 기존의 방법에 의해서 만들어진 광도파로와 본 연구의 방법에 의해서 만든 광도파로의 근시야상(near field pattern)을 비교하였다.

• 한국전기전자재료학회논문지
• /
• 제11권5호
• /
• pp.400-406
• /
• 1998

We investigated the preparation and guided-mode properties of $Ti:LiNbO_3$ waveguides which were fabricated by Ti in-diffusion. The diffusion method to reduce the Li out-diffusion was proposed. The optical guided-mode and propagation loss based on butt-coupling pigtailed with PMF-input were measured. How to improve the polishing grade of waveguide endfaces is newly proposed in this paper. To show the mode propagations, the BPM simulations of channel waveguide are described.

• E2M - 전기 전자와 첨단 소재
• /
• 제10권7호
• /
• pp.682-691
• /
• 1997

We have investigated the guided optical properties of a Ti:LiNbO$_3$optical waveguide which was fabricated by Ti-diffusion in an air atmosphere and proposed an effective polishing method of waveguide endfaces. And the results of guided optical mode and fabrication condition were obtained as follows; \circled1 propagation loss : 0.53 dB/cm \circled2 mode size : horizontal/vertical=12.5${\mu}{\textrm}{m}$ \circled3 mode mismatch : 1.7 dB \circled4 diffusion temperature : 105$0^{\circ}C$, time : 8 hours \circled5 atmosphere : air

• 한국전기전자재료학회논문지
• /
• 제13권12호
• /
• pp.1051-1057
• /
• 2000

A traveling-wave CPW(coplanar waveguide) electrode with abruptly broken input/output-taper for LiNbO$_3$optical modulator was designed and fabricated. The electrical characteristics of traveling-wave electrode on z-cut LiNbO$_3$crystal with SiO$_2$buffer layers were measured by network analyzer. To confirm the possibility of the electro-optic modulator electrode, detailed calculations of the impedance, microwave effective index and attenuation constants are presented as a function of the microwave electrode thickness, but the buffer layer thickness is fixed as 1${\mu}{\textrm}{m}$. These characteristics are discussed from the viewpoint of the device optimization and are expected to be design guides for the LiNbO$_3$modulator’s electrodes.

• 대한전자공학회논문지
• /
• 제26권10호
• /
• pp.1584-1590
• /
• 1989

In this study, a planar waveguide has been fabricated on a Y-cut LiNbO3 substrate by the Ti indiffusion technique and its guiding characteristics are measured by bright M-line spectroscopy. Using the photolithography method, an electro-optic grating modulator with interdigital electrodes has been fabricated by depositing Al on the Ti:LiNbO3 planar waveguide. And the beam intensity diffracted by the grating is measured as the applied voltage is increased.