• 에너지공학
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• 제5권1호
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• pp.65-71
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• 1996

Ni-Cu를 SiO$_2$에 담지시켜 공간속도(Space Velocity; S.V), 메탄올 분압, 반응온도 및 Ni-Cu 조성비에 따른 메탄올 분해 반응의 활성을 조사하였다. S.V는 10,000~30,000h$^{-1}$, 반응온도는 150~40$0^{\circ}C$까지 변화시켰으며 Cu/(Ni＋Cu)비는 0, 0.25, 0.5, 0.75, 1로 변화시켜 보았다. Ni 단일 촉매의 경우 온도가 상승하면서 전환율이 100%에 도달함에 따라 CO의 선택도가 급감소하는 반면 Ni에 Cu를 첨가함으로써 높은 선택도를 유지하였다. 반응의 주생성물로서 CO와 H$_2$가 생성되었고 $CO_2$와 CH$_4$가 부생성물로서 주로 생성되었다.

• 한국전산유체공학회:학술대회논문집
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• 한국전산유체공학회 2011년 춘계학술대회논문집
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• pp.6-9
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• 2011

In this study, the two-phase incompressible flow in two-dimensional channel considering the effect of surface tension is simulated using an improved level-set method. Quadratic element is used for solving the continuity and Navier-Stokes equations to avoid using an additional pressure equation, and Crank-Nicholson scheme and linear element are used for solving the advection equation of the level set function. Direct approach method using geometric information is implemented instead of the hyperbolic-type partial differential equation for the reinitializing the level set function. The benchmark test case considers various arrays of defomable droplets under different flow conditions in straight channel. The deformation and migration of the droplets are computed and the results are compared very well with the existing studies.

• Journal of Magnetics
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• 제5권4호
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• pp.120-123
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• 2000

Co-Ni-Fe-N thin films were fabricated by a $N_2$ reactive rf magnetron sputtering method. The nitrogen partial pressure ($P_{N2}$) was varied in the range 0~10% . As$P_{N2}$ increases in this range, the saturation magnetization $B_s$ linearly decreases from 19.8 kG to 14 kG and the electrical resistivity ($\rho$) increases from 27 to 155 $\mu\Omegacm$. The coercivity $H_c$ exhibits the minimum value at 4% $P_{N2}$. The magnetic anisotropy fields ($H_k$) are in the range of 20$\sim$50 Oe. High frequency characteristics of $(Co_{22.2}Ni_{27.6}Fe_{50.2})_{100-x}N_x$ films are excellent in the range of 3$\sim$5% of $P_{N2}$. In particular, the effective permeability of the film fabricated at 4% $P_{N2}$ is 800, which is maintained up to 600 MHz. This film also shows Bs of 17.5 kG, $H_c$/ of 1.4 Oe, resistivity of 98$\mu\Omegacm$ and $H_k$ of about 25 Oe. Also, the corrosion resistance of $(Co_{22.2}Ni_{27.6}Fe_{50.2})_{100-x}N_x$ films was imp roved with increasing N concentration.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2000년도 International Symposium on Magnetics The 2000 Fall Conference
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• pp.492-499
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• 2000

Co-Ni-Fe-N thin films were fabricated by a N$\sub$2/ reactive rf magnetron sputtering method. The nitrogen partial pressure (P$\sub$N2/) was varied in the range of 0∼10%. As P$\sub$N2/ increases in this range, the saturation magnetization (B$\sub$s/) linearly decreases from 19.8 kG to 14 kG and the electrical resistivity ($\rho$) increased from 27 to 155 ${\mu}$$\Omega$cm. The coercivity (H$\sub$c/) exhibits the minimum value at 4% of P$\sub$N2/. The magnetic anisotropy (H$\sub$k/) are in the range of 20∼50 Oe. High frequency characteristics of (Co$\sub$22.2/Ni$\sub$27.6/Fe$\sub$50.2/)$\sub$100-x/N$\sub$x/ films are excellent in the range of 3∼5% of P$\sub$N2/. Especially the effective permeability of the film fabricated at 4% of P$\sub$N2/ is 800, which is maintained up to 600 MHz. This film also shows Bs of 17.5 kG, H$\sub$c/ of 1.4 Oe, resistivity of 98 $\Omega$cm and H$\sub$k/ of about 25 Oe. Also, the corrosion resistance of (Co$\sub$22.2/Ni$\sub$27.6/Fe$\sub$50.2/)$\sub$100-x/N$\sub$x/ were improved with the increase in N concentration.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1352-1354
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• 1997

Transparent conductive thin films have found many application in many active and passive electronic and opto-electronic devices as like flat Panel display electrode and window heat mirror, etc. Low resistivity and high transmittance of this films can be obtained by controlling deposition parameters, which are oxygen partial Pressure, substrate temperature and dopant concentration. In this study, We prepared non-stoichiometric and Sb-doped thin films of tin dioxide by reactive DC magnetron sputtering technology. The lowest resistivity of about $3.0{\times}10^{-3}\;{\Omega}cm$ and 80% transmittance in the visible light region have heed obtained at optimal deposition condition.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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• pp.9-9
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• 2009

Coated conductor is required to have good critical current property for high efficiency of electric power applications. Until now, long coated conductor does not show high Jc over 3 MA/$cm^2$ in thick superconducting layer because of texture degradation by thick superconducting layer. In this study, in order to overcome this issue, thicker superconducting layer was deposited with optimized conditions to reduce the degradation of critical current density. SmBCO superconducting coated conductor was deposited with 1~3 um of thickness at $750\sim850^{\circ}C$ under 15~20 mTorr of oxygen partial pressure using batch type EDDC( evaporation using drum in dual chamber). The buffered substrate for superconducting layer deposition was used IBAD-MgO template with the architecture of $LaMnO_3/MgO/Y_2O_3/Al_2O_3$/Hastelloy. After fabrication of coated conductor, critical current was measured by 4-prove method under self-magnetic field and 77K. In addition, surface morphology and texture were analyzed by SEM and XRD, respectively. 3 um thick SmBCO coated conductor shows highest $I_C$ values of 638A/cm-w in 1 m long in the world.

• 멤브레인
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• 제21권3호
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• pp.290-298
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• 2011

팔라듐이 코팅된 $V_{53}Ti_{26}Ni_{21}$ 합금 분리막을 통해 수소 투과시 혼합가스의 영향에 대해 알아보았다. 순수 수소, 수소, 이산화탄소 및 일산화탄소의 혼합가스를 공급가스로 주입할 때, $450^{\circ}C$, 1-3 bar의 압력에서 팔라듐이 코팅된 $V_{53}Ti_{26}Ni_{21}$ 합금 분리막의 수소 투과 실험을 수행하였다. 수소만을 공급한 투과 실험에서 팔라듐 코팅된 $V_{53}Ti_{26}Ni_{21}$ 합금 분리막(두께: 0.5 mm)의 수소 투과량은 3 bar, $450^{\circ}C$ 조건에서 $5.36mL/min/cm^2$였다. 또한 수소/이산화탄소, 수소/일산화탄소 및 수소/이산화탄소/일산화탄소를 공급한 투과실험에서 $V_{53}Ti_{26}Ni_{21}$ 합금 분리막의 수소 투과량은 각각 4.46, 5.20, $3.91mL/min/cm^2$였다. 따라서, 수소/이산화탄소, 수소/일산화탄소 및 수소/이산화탄소/일산화탄소 혼합가스를 각각 공급할 때 투과량은 온도와 압력에 상관없이 수소 분압 감소만큼 감소하였고 모든 경우 Sievert 법칙을 잘 만족시켰다. 투과 후 분리막의 XRD 결과로부터 $V_{53}Ti_{26}Ni_{21}$ 합금 분리막은 여러 혼합가스에 대해 안정성과 내구성이 우수하다는 것을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.44-44
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• 2008

GdBCO coated conductor have been fabricated using reactive co-evaporation. The batch type co-deposition system was specially designed and was named EDDC (evaporation using drum in dual chamber) that is possible to deposit superconducting layer with optimum composition ratio of materials at temperature over $700^{\circ}C$ and several mTorr of oxygen. The IBAD-MgO substrate with the architecture of LaMnO3(LMO)/IBAD-MgO/Hastelloy was used for coated conductor. In this study, GdBCO superconducting layer was deposited on IBAD-MgO substrate at optimal oxygen partial pressure (pO2) and deposition temperature. After fabrication of GdBCO coated conductor, critical current density was measured by 4-probe method. Surface morphology and texture of GdBCO coated conductors were analyzed by the SEM and XRD, respectively.

• Bulletin of the Korean Chemical Society
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• 제31권5호
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• pp.1295-1300
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• 2010

The $CO_2-CH_4$ reaction catalyzed by Ni/silicon wafers was kinetically studied by using a photoacoustic technique. The catalytic reaction was performed at various partial pressures of $CO_2$ and $CH_4$ (50 Torr total pressure of $CO_2/CH_4/N_2$) in the temperature range of 500 - $650^{\circ}C$ in a static reactor system. The photoacoustic signal that varied with the $CO_2$ concentration during the catalytic reaction was recorded as a function of time. Under the reaction conditions, the $CO_2$ photoacoustic measurements showed the as-prepared Ni thin film sample to be inactive for the reaction, while the $CO_2/CH_4$ reactions carried out in the presence of the sample pre-treated in $H_2$ at $600^{\circ}C$ were associated with significant time-dependent changes in the $CO_2$ photoacoustic signal. The rate of $CO_2$ disappearance was measured from the $CO_2$ photoacoustic signal data in the early reaction period of 50 - 150 sec to obtain precise kinetic data. The apparent activation energy for $CO_2$ consumption was determined to be 6.9 kcal/mol from the $CO_2$ disappearance rates. The partial reaction orders, determined from the $CO_2$ disappearance rates measured at various $PCO{_2}'S$ and $PCH{_4}'S$ at $600^{\circ}C$, were determined to be 0.33 for $CH_4$ and 0.63 for $CO_2$, respectively. Kinetic data obtained in these measurements were compared with previous works and were discussed to construct a catalytic reaction mechanism for the $CO_2-CH_4$ reaction over Ni/silicon wafer at low pressures.

• 대한화학회지
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• 제28권2호
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• pp.79-85
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• 1984

부피 퍼센트 95%의 에탄올-물 혼합용매내에서 2,4,6,N-테트라메틸 피리디늄요오드(TeMPI)의 이온회합 상수(K)를 수정한 자외선분광 및 전기 전도도 혼용법으로 온도범위 $25^{\circ}C{\sim} 50^{\circ}C$, 압력범위 1 ${\sim}$ 2,000 bars에서 결정하였다. K값은 압력이 증가함에 따라서 증가하였고 $40^{\circ}C$에서 최대값을 나타내었다. 부분몰부피변화(${\Delta}V$)는 비교적 작은 음의 값이었으며 ${\Delta}V$의 절대값은 $40^{\circ}C$에서 최소값을 보여주었다. TeMPI의 이온 크기 변수(a)는 $40^{\circ}C$에서 최대값을 가졌다. ${\Delta}H^{\circ}$값은 40, $25^{\circ}C$ 그리고 $50^{\circ}C$에서 각각 영, 음수 및 양수로 나타났으며 엔트로피(${\Delta}S^{\circ}$)와 자유에너지(${\Delta}G^{\circ}$)와 같은 다른 열역학변수 값도 계산하였다. 이와 같은 실험결과로부터 우리들은 TeMPI가 압력증가에 대하여 안정화되고, $40^{\circ}C$까지는 온도증가에 따라서도 안정화됨을 보여주었다. 그러나 $40^{circ}C$에서는 TeMPI 두 분자에 있는 8개 메틸기의 분자간 소수성 상호작용으로 인하여 약한 이량체를 형성하고 $50^{\circ}C$이상에서는 다시 열적으로 분해된다는 결론을 얻게 되었다.