• Korean Chemical Engineering Research
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• v.43 no.2
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• pp.215-221
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• 2005

A Fe-containing mesoporous silica (Fe-MCM-41) in which part of Si in the framework was replaced by Fe(Si-O-Fe) has been successfully prepared using $Fe^{3+}$ salt by a direct synthesis route. Physical properties of the material were characterized by XRD, $N_2$ adsorption, SEM/TEM, UV-vis and FT-IR spectroscopies. Fe-MCM-41 exhibited high catalytic activity in phenol hydroxylation using $H_2O_2$ as oxidant, giving phenol conversion of ca. 60% at $50^{\circ}C$ [phenol : $H_2O_2$ = 1:1, water solvent]. Fe-MCM-41 was also applied to the growth of CNTs, utilizing a thermal-CVD reactor using acetylene gas, which demonstrated that multi-wall CNTs could be prepared efficiently using the Fe-MCM-41 catalyst.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.174-174
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• 2000

A strong antiferromagnetic coupling in Fe/Si multilayered films (MLF) had been recently discovered and much consideration has been given to whether the coupling in the Fe/Si MLF system has the same origin as the metal/metal MLF. Nevertheless, the nature of the interfacial ron silicide is still controversial. On one hand, a metal/ semiconductor structure was suggested with a narrow band-gap semiconducting $\varepsilon$-FeSi spacer that mediates the coupling. However, some features show that the nature of coupling can be well understood in terms of the conventional metal/metal multilayered system. It is well known that both magneto-optical (MO) and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In this study, the nature of the interfacial regions is the Fe/Si multilayers has been investigated by the experimental and computer-simulated MO and optical spectroscopies. The Fe/Si MLF were prepared by rf-sputtering onto glass substrates at room temperature with the number of repetition N=50. The thickness of Fe sublayer was fixed at 3.0nm while the Si sublayer thickness was varied from 1.0 to 2.0 nm. The topmost layer of all the Fe/Si MLF is Fe. In order to carry out the computer simulations, the information on the MO and optical parameters of the materials that may constitute a real multilayered structure should be known in advance. For this purpose, we also prepared Fe, Si, FeSi2 and FeSi samples. The structural characterization of Fe/Si MLF was performed by low- and high -angle x-ray diffraction with a Cu-K$\alpha$ radiation and by transmission electron microscopy. A bulk $\varepsilon$-FeSi was also investigated. The MO and optical properties were measured at room temperature in the 1.0-4.7 eV energy range. The theoretical simulations of MO and optical properties for the Fe/Si MLF were performed by solving exactly a multireflection problem using the scattering matrix approach assuming various stoichiometries of a nonmagnetic spacer separating the antiferromagnetically coupled Fe layers. The simulated spectra of a model structure of FeSi2 or $\varepsilon$-FeSi as the spacer turned out to fail in explaining the experimental spectra of the Fe/Si MLF in both intensity and shape. Thus, the decisive disagreement between experimental and simulated MO and optical properties ruled out the hypothesis of FeSi2 and $\varepsilon$-FeSi as the nonmagnetic spacer. By supposing the spontaneous formation of a metallic ζ-FeSi, a reasonable agreement between experimental and simulated MO and optical spectra was obtained.

• Proceedings of the Korean Magnestics Society Conference
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• 2003.12a
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• pp.120-120
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• 2003

• Journal of the Korean Magnetics Society
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• v.10 no.1
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• pp.1-6
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• 2000

Amorphous Fe$_{79.7}$Si$_{9.3}$B$_{9.7}$Ni$_{1.4}$ ribbon alloys were fabricated by a single roll method. To enhance D. C. bias properties, the magnetic and micro-structural changes have been investigated as the variation of annealing time and condition. The D. C. bias properties were found to be directly related to micro-structural changes. Primary ${\alpha}$-Fe dendrites with 200∼300 nm showed the best D. C. bias properties, which resulted from the magnetic domain wall pinning effect. Due to the differences of cooling rate, the growth shape and distribution of the dendrites is divided into two areas.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.127-128
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• 2009

CCP방식의 식각에 있어서 CF4/O2 Plasma Etch에 Ar을 첨가함으로써 Etch특성이 어떻게 변화하는지를 조사하였다. FE-SEM를 이용하여 Etch Profile를 측정하였다. 또한 Elipsometer와 Nanospec을 이용하여 Etch rate를 측정하였다. Ar의 비율이 전체의 47%정도를 차지하였을 때까지 Etch Profile이 향상되었다가 그이후로는 다시 감소하는 것을 볼 수 있었다. Ar을 첨가할수록 etch rate은 계속 향상되었다. Ar을 첨가하는 것은 물리적인 식각으로 반응하여 Etch rate의 향상과 적정량의 Ar을 첨가했을 때 Etch profile이 향상되는 결과를 얻었다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.3
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• pp.96-102
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• 2020

In this paper, AlN epilayers on 6H-SiC (0001) substrate are grown by mixed source hydride vapor phase epitaxy (MS-HVPE). AlN epilayer of 0.5 ㎛ thickness was obtained with a growth rate of 5 nm per hour. The surface of AlN epilayer grown on 6H-SiC (0001) substrate was investigated by field emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDS). Dislocation density was considered through HR-XRD and related calculations. A fine crystalline AlN epilayer with screw dislocation density of 1.4 × 10⁹ cm^-2 and edge dislocation density of 3.8 × 10⁹ cm^-2 was confirmed. The AlN epilayer on 6H-SiC (0001) substrate grown by using the mixed source HVPE method could be applied to power devices.

• Journal of the Korean Magnetics Society
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• v.14 no.5
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• pp.163-168
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• 2004

We prepared ultra thin film structure of Si(100)/ $SiO_2$(200 nm)/Ta(5 nm)/Ni$_{80}$Fe$_{20/(l～15 nm)}$Ta(5 nm) using an inductively coupled plasma(ICP) helicon sputter. Magnetic properties and cross-sectional microstructures were investigated with a superconduction quantum interference device(SQUID) and a transmission electron microscope(TEM), respectively. We report that NiFe films of sub-3 nm thickness show the B$_{bulk}$ = 0 and B$_{surf}$=-3 ${\times}$ 10$^{-7}$(J/$m^2$). Moreover, Curie temperature may be lowered by decreasing thickness. Coercivity become larger as temperature decreased with 0.5 nm - thick Ta/NiFe interface intermixing. Our result implies that effective magnetic properties of magnetoelastic anisotropy, saturation magnetization, and coercivity may change abruptly in nano-thick films. Thus we should consider those abrupt changes in designing nano-devices such as MRAM applications.

• Journal of the Korean Ceramic Society
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• v.36 no.8
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• pp.835-842
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• 1999

Si3N4 -Si3N4 joints were made using Ag-Cu-Ti and Ag-Cu-In-Ti via brazing method and the change in joint strength was investigated after heat treatment at $400^{\circ}C$ or $650^{\circ}C$ for up to 2000h. The initial strength of as-brazed joints with Ag-Cu-In-Ti was lower but the reduction of the strength was less dramatic than that with Ag-Cu-Ti. The joints made of a new brazing alloy Au-Ni-Cr-Mo-Fe which is developed for high temperature applications were heat-treated at $650^{\circ}C$ for 1000h. As the heat treatment time increased the bond strength increased. The results of the joining system with Mo or Cu interlayer showed that the strength of the joint with Mo interlayer was higher but the system incurred problems in joint production Also it was found from oxidation experiment that Ti and In affected the oxidation resistance of brazing alloy.

• KOREAN JOURNAL OF CROP SCIENCE
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• v.28 no.2
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• pp.267-271
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• 1983

The southern parts varieties have shown higher content of Oleic acid, Linoleic acid, Vitamin A, Alcaloid, Ca, P and Fe than northern parts Varieties. The $N.\;P_2O_5\;and\;K_2O content of narrow leaf were higher than wide leaf, on the other hand the Ca, Mg, Fe and $SiO_2$ content of wide leaf were higher than narrow leaf. The content of $N, \;P_2O_5, \;K_2O$ have shown higher in first yellow leaf date, the content of Ca has shown higher in first falling leaf date and the content of Mn and Cu content have shown higher in second new leaf date.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.179-179
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• 2016

희토류계 영구자석은 높은 보자력과 잔류 자화을 가지고 있어 자기기록저장매체, MEMS(엑츄에이터), 센서 등의 응용 분야에 적용시키기 위해 다양한 연구들이 진행되고 있다. 하지만 희토류계 원소의 수급 및 가격의 문제점으로 친환경자석으로의 전환 및 희토류나 중희토류를 사용하지 않는 비희토류계 영구자석을 개발하는 연구에 대한 필요성이 대두되고 있다. 이 중 Fe-N 계 자성 물질인 $Fe_{16}N_2$는 포화 자화 값이 현재까지의 자성물질 중 가장 높은 값(240emu/g)을 나타내며 상대적으로 높은 결정자기이방성 상수를 가지고 있어 비희토류계 영구자석 물질 중 하나로 주목받고 있다. 본 연구에서는 $Fe_{16}N_2$ 박막을 얻기 위해 DC Magnetron Sputtering 방법을 이용하여 Si wafer 위에 박막을 증착하고 증착공정 조건 중 질소 유량 및 Sputtering Power를 변수로 따른 박막의 성장, 조직변화, 자성 특성을 관찰을 통해 최적의 공정 조건을 찾고자 하였다. $N_2$ 가스 유량 변화에 따른 박막의 성장 속도는 거의 변화가 없었으며 $N_2$ 가스 유량의 증가에 따라 박막 내 Fe의 함유량은 감소하였다. 모든 공정 조건에서 $Fe_3N$, $Fe_4N$, $Fe_{16}N_2$ 상들이 섞여 성장하였으며 XRD를 통한 상분석과 더불어 VSM을 통한 자성 특성을 분석해본 결과 $Fe_{16}N_2$의 분율이 가장 높게 성장된 공정 조건은 Power는 200W, $N_2$ 가스 유량은 20sccm이었으며 이 조건에서 2.45T의 포화 자화 값과 1.4T의 잔류 자화 값을 얻을 수 있었다.