The etching properties of $Al_2O_3$ thin films in $N_2/Cl_2/BCl_3$ and Ar/$Cl_2/BCl_3$ gas chemistry
(유도결합 플라즈마를 이용한 $Al_2O_3$ 식각 특성)
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- Proceedings of the KIEE Conference
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- 2004.11a
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- pp.72-74
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- 2004