Deposition of 3C-SiC Films by Plasma-enhanced Chemical Vapor Deposition (I): Deposition Behaviors of SiC with Deposition Parameters (PECVD법에 의한 3C-SiC막 증착(I): 증착변수에 따른 SiC 증착거동)
-
- Journal of the Korean Ceramic Society
- /
- v.38 no.6
- /
- pp.531-536
- /
- 2001