• 자원환경지질
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• 제19권spc호
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• pp.3-17
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• 1986

Hundred mineral deposits including W-Mo, Pb-Zn-Cu, fluorite and talc occur in the Cambre-Ordovician limestone contacting with the Cretaceous Muamsa and Wolak granitoids in the Susanri-Hwanggangri mineralized zone. In most mineral deposits characterized by metasomatic replacement, skarn and hydrothermal vein types, two distinct tendencies were found as W-Mo mineralization in or/and near granitoid batholith and ($Pb-Zn-Cu(CaF_2)$) mineralization which is gradually increased toward the batholith. W-Mo veins of extensive vein system occupy northly striking fractures whilst $Pb-Zn-Cu-CaF_2$ veins strike northeast or northwest. In this work, three representative lead-zinc-copper deposits choosing the Dangdu, Useog and Eoksu mines were dealt with in detail. Skarn ore bodies in the Dangdu mine were grouped into early diopside rich clinopyoxene-garnet, barren skarn and ore bearing late hedenbergite rich clinopyroxene-garnet skarn. Temperature and $X_{CO_2}$, obtained from hedenbergite-andradite-calcite-quartz mineral equilibria in the Dangdu ore deposits were $580{\sim}650^{\circ}C$ and 0.15~0.3, respectively. Fluid inclusien evidence in the Useog mine indicates that main stage mineralization temperature ranges from 224 to $389^{\circ}C$ with a salinity of 2~17 equivalent wt. percent NaCl. Sphalerites from the Dangdu and Useog mines have 16~17.7 mole percent in FeS which is relatively consistent to those of some other lend-zinc ore deposits in South Korea. Filling tcmjCerature of fluid inclusion frem the Eoksu mine shows deposition of ore within the temperature ranges from 237 to $347^{\circ}C$ and within the salinity ranges from 2.6 to 10.77 equivalent wt. percent NaCl.

• 한국표면공학회지
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• 제38권2호
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• pp.60-64
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• 2005

The ICP-CVD (inductively coupled plasma chemical vapor deposition) process was applied to the deposition of $TiB_2$ films. For plasma generation, 13.56 MHz r.f. power was supplied to 2-turn Cu coil placed inside chamber. And the gas mixture of $TiCl_4,\;BCl_3,\;H_2$ and Ar was used for $TiB_2$ deposition. $TiB_2$ films with high hardness (<40 GPa) were obtained at extremely low deposition temperature $(250^{\circ}C)$, and the films hardness increased with ICP power and gas flow ratio of $TiCl_4/BCl_3$. The film structure was changed from (100) preferred orientation to random orientation with increasing RF power. It is supposed that the enhanced hardness of films was caused by a strong Ti-B chemical bonding of stoichiometric $TiB_2$ films and film densification induced by high density plasma.

• 한국세라믹학회지
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• 제29권6호
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• pp.471-479
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• 1992

AlN powder was synthesized by carbothermal reduction and nitridation using Al2(SO4)3.18H2O as the starting material. The synthesized AlN powder was fine but contained oxygen. Therefore carbonaceous material (carbon black or phenol novolac) was added teogether with the sintering aids (CaO, CaF2, CaCl2, Y2O3 and YF3). It was found that pressureless sintering at 1700~180$0^{\circ}C$ after deoxidation at 150$0^{\circ}C$ suppressed the formation of second phase (27R) and reduced the contents of lattice oxygen within AlN ceramics.

• 한국식품저장유통학회지
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• 제13권6호
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• pp.686-690
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• 2006

백미와 함께 혼합 취반하여 섭취하는 두태류의 영양소 손실이나 식미감의 감퇴, 편이성과 저장성의 문제 등을 개선하기 위한 방법으로 서리태와 팥을 대상으로 가염 침지후 마이크로파 건조하여 그 특성을 검토하였다. 가염 두태류의 제조는 $25^{\circ}C$, 3% 소금물에 서리태는 6시간 동안, 팥은 12시간 동안 침지시켰다. 침지 후 측정한 두태류의 수분함량은 서리태 35.8%, 팥 35.1%이었다. 여기에 1차 마이크로파 조사를 한 후 $5{\sim}10^{\circ}C$ 냉풍으로 급속냉각 시킨 다음 2차 마이크로파 조사와 냉각을 실시하여 수분함량을 최종 $12{\sim}14%$로 하여 최종제품으로 가공하였다. 최종 가공된시료 색차 변화 양상은 품종간 차이가 있었으며, 경도는 가염 서리태가 $3,309g_f$로 일반 $12,863g_f$에 비하여 낮아졌다. 또한 일반 백미와 두태류의 비율을 7:3으로 하여 혼합 취반한 결과, 경도가 $3,165g_f$으로 일반 혼합곡밥에 비하여 낮았고, 관능평가결과 가염 처리한 혼합곡밥이 이미의 냄새와 경도가 일반 혼합곡밥에 비해 낮고 외관과 냄새, 맛, 조직감에 기호도가 높게 나타났으며, 전반적인 기호도 또한 8.0으로 일반 혼합곡밥에 비하여 높은 것으로 나타났다. 따라서 가염 침지 및 마이크로파건조로 전처리한 두태류는 취반전 별도의 침지과정이 필요 없으며, 일반 두태류 취반에 비하여 식미와 조직감이 개선된 것으로 나타났다.

• Journal of Microbiology and Biotechnology
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• 제4권2호
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• pp.134-140
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• 1994

An antagonistic bacterium Pseudomonas stutzeri YPL-1 liberated extracellular chitinase and $\beta$-1,3-glucanase which are key enzymes in the decomposition of fungal hyphal walls. The lytic enzymes caused abnormal swelling and retreating at the hyphal tips of plant pathogenic fungus Fusarium solani in a dual culture. Scanning electron microscopy revealed the hyphal degradation of F. solani in the regions interacting with P. stutzeri YPL-1. The production of chitinase and properties of a crude preparation of the enzyme from P. stutzeri YPL-1 were investigated. Peak of the chitinase activity was detected after 4 hr of cultivation. The enzyme had optimum temperature and pH of 50$^{\circ}C$ and pH 5.3, respectively. The enzyme was stable in the pH range of 3.5 to 6.0 up to 50$^{\circ}C$. The enzyme was significantly inhibited by metal compounds such as $HgCl_2$, but was stimulated by $CoCl_2$. P. stutzeri YPL-1 produced high levels of the enzyme after 84 hr of incubation. Among the tested carbon sources, chitin was the most effective for the enzyme production, at the concentration level of 3%. As a source of nitrogen, peptone was the best for the enzyme production, at the concentration level of 4%. The maximum amount of enzyme was produced by cultivating the bacterium at a medium of initial pH 6.8.

• 한국미생물·생명공학회지
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• 제41권2호
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• pp.145-152
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• 2013

소나무잔나비버섯(Fomitopsis pinicola MKACC 54347)의 균사체로부터 endoglucanase를 생산하기 위한 최적 배양조건을 조사하였다. 복합배지 중 MSM이 가장 높은 endoglucanase 활성을 나타내었으며, MSM의 성분과 농도를 각각 2.0% CMC, 2.0% yeast extract, 0.2% $KH_2PO_4$, 0.03% $MnSO_4$ 및 0.3% trace metal 용액으로 첨가하였을 때 효소활성이 가장 우수하였다. 따라서 F. pinicola로부터 endoglucanase를 생산하기 위한 최적 배지조건은 2.0% CMC, 2.0% yeast extract, 0.2% $KH_2PO_4$, 0.03% $MnSO_4$ 및 0.3% trace metal 용액이다. 이상의 배지를 사용하여 배양온도 $25^{\circ}C$에서 8일 동안 배양하였을 때 최대로 효소 활성이 나타내는 것을 확인하였다. CMC를 기질로 사용한 activity staining의 결과를 통해 F. pinicola 균사체의 endoglucanase 활성여부를 확인할 수 있었으며 그 분자량이 43-70 kDa 임을 확인하였고, 배양액 중의 효소활성의 최적 pH와 온도는 각각 pH 5.0과 $55^{\circ}C$인 것으로 나타났다.

• Asian-Australasian Journal of Animal Sciences
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• 제13권9호
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• pp.1210-1218
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• 2000

Four experiments were conducted to evaluate the effect of temperature and humidity on biochemical indices of Arbor Acres broilers at different weeks of age. The alkaline phosphatase (AKP), acid phosphatase (ACP), lactic dehydrogenase (LD), creatine kinase (CK), plasma glucose (Glu), calcium (Ca), potassium (K), chloride (Cl), urea nitrogen (UN), uric acid (UA), plasma thyroxin (T4), triiodothyronine (T3) and insulin levels were determined in all the four experiments. In experiment 1, the plasma Glu, LD and CK levels were increased by heat exposure ($35{^{\circ}C}$ and 35, 60, or 85% RH, 2 h) and this effect was aggravated by longer exposure (24 h). No significant changes (p>0.05) were found in Ca concentration, activity of AKP and ACP. In experiment 2, temperature (10, 20, 30, $33{^{\circ}C}$) had significant effect on the levels of K, Cl, UN, UA levels and the activity of LD (p<0.01), but had no significant influence on the activity of CK (p>0.05). The UN, UK and LD levels were elevated by low temperature $(10{^{\circ}C})$ (p<0.01), Cl content was increased by high temperature ($(33{^{\circ}C})$ (p<0.01), and K level was decreased by high ($(33{^{\circ}C})$ or low $(10{^{\circ}C})$ temperature and increased by medium temperature $(30{^{\circ}C})$ (p<0.01). The humidity (35, 85% RH) only had significant effect on Cl concentration which was decreased by high humidity (p<0.01). In experiment 3, the result showed that only the LD and CK activity were significantly increased (p<0.01) by high temperature (7, 24, 28, $32{^{\circ}C}$) or high humidity (35, 85% RH). Temperature and humidity had no significant effect on K, Cl, UA, UN and Glu levels (p>0.05). In experiment 4 (24, 27, 30, $33{^{\circ}C}$; 30, 45, 60, 75, 90% RH), plasma T3 level was declined by high temperature $(33{^{\circ}C})$, and this phenomena disappeared in birds under high temperature and high humidity environment. T4 concentration in plasma was not affected by temperature (p>0.05), but was increased by high or low humidity (p<0.01). Neither temperature nor humidity had significant effect on plasma insulin concentration (p>0.05). The results of the four experiments suggested that broilers at different growth periods might have different thermal requirements and would response differently to heat exposure. The plasma biochemical indices themselves had big variation; the reaction of the indices to thermal exposure treatment differed with the age of broilers. The big variation of biochemical indices themselves might cover the response of indices to temperature and humidity treatments.

• 대한소아치과학회지
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• 제28권1호
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• pp.129-141
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• 2001

우식치아의 교합면과 정상치아의 교합면에서 균을 채취한 결과, 우식치아의 교합면에서는 $3.43\times10^5$ CFU, 정상치아의 교합면에서는$3.43\times10^3$ CFU가 MSB 배지상에서 검출되었다. API test를 이용하여 당발효 및 생화학적 성상을 관찰한 결과, 우식치면에서 분리된 세균은 20종 모두 S. mutans였으나, 건강한 치면에서는 2개의 세균만 S. mutans로 동정되었다. 우식치면과 정상치면에서 분리된 균주 S. mutans SM1과 S. mutans SM2는 $\alpha-galactosidase$ 활성을 제외하곤 당발효 및 생화학적 성상이 모두 일치하였다. 증식에 있어서, 두 균주 모두 pH 5.5에서 증식이 가장 활발하였고, 자당의 농도는 SM1은 20%일 때 SM2는 5%일 때 최대 증식을 보였다. SM1은 배지의 $CaCl_2$농도가 16mM, KCl농도가 160mM, $MgCl_2$농도가 6.4mM 이었을 때 증식이 가장 활발하였고, SM2는 $CaCl_2$ 농도가 16mM, KCl 농도가 40mM, $MgCl_2$ 농도가 6.4mM 이었을때 증식이 가장 활발하였다. Sodium bicarbonate 완충액과 Sodium phosphate 완충액의 경우, SM1과 SM2 모두 1mM에서 증식이 활발하였다. Tris 완충액의 경우, SM1은 1mM에서, SM2는 10mM에서 증식이 활발하였다. Potassium phosphate 완충액의 경우, SM2는 농도가 증가함에 따라 증식이 억제된 반면, SM1은 100mM 까지는 농도가 증가할수록 증식이 활발하였다. SM1과 SM2의 염색체를 추출한 후 Primer gtfB-F961과 gtfC-R5574를 사용하여 gtf 유전자를 PCR 한결과, 4.6kb의 단일 band를 얻었고 이 band를 분리하여 제한효소로 처리한 결과, EcoR I 처치시 S. mutans GS-5, SM1과 SM2모두 약 0.8kb와 3.8kb의 DNA절편을 보여 같은 양상을 나타냈고, Hind III 처치시 GS-5와 SM1은 잘리지 않았고, SM2의 경우 2.4kb, 1.8kb, 400bp의 3조각의 절편으로 나뉘어 SM1과 SM2의 gtf 유전자의 상사성이 관찰되었다. BamH I처치시 SM1과 SM2는 4조각의 절편으로 절단되어 같은 양상을 보였고, GS톤의 경우는 3조각의 절편으로 절단되었다. Kpn I, Sma I, Xho I 그리고 Pst I에는 절단되지 않았다.

• 공업화학
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• 제19권4호
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• pp.407-412
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• 2008

니들 코크스의 활성화 방법으로서 기존의 방법과는 다른 $HNO_3$와 $NaClO_3$ 혼합용액에서의 산처리와 $300^{\circ}C$ 열처리 방법을 이용하였다. 산처리 코크스와 열분해 코크스의 미세구조는 XRD, FESEM, element analysis, BET, Raman spectroscopy를 이용하였으며, 전기이중층 거동은 충방전 분석을 행하였다. 니들 코크스는 산처리 시간에 따라 산소의 중량 %의 증가와 함께 (001) 구조로 상변화가 일어나고, $300^{\circ}C$ 열처리에서 흑연구조인 (002) 구조로 환원한다. 이들 산처리-상분해 과정에서 층간에 유기된 층간 구조결함은 first 충전에서 전계 활성화에 의해 pore를 생성하고 second 충전에서는 전기이중층 용량을 발생시킨다. 24 h 산처리-$300^{\circ}C$ 열처리한 열분해 코크스의 2.5 V까지의 2 전극 기준에서 구한 활물질 중량 당 용량과 전극 부피 당 용량는 각각 33 F/g과 30 F/mL를 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.