• 한국전기전자재료학회논문지
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• 제13권3호
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• pp.183-187
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• 2000

In this study the SrBi$_2$Ta$_2$$O_{9}$ (SBT) thin films were etched by using magnetically enhanced inductively coupled Ar/CHF$_3$plasma as function of CHF$_3$/(Ar+CHF$_3$)gas mixing ratio. Maximum etch rate of SBT thin films was 1650 $\AA$/min and the selectivities of SBT to Pt and photoresist(PR) were 1.35 and 0.94 respectively under CHF$_3$/(Ar+CHF$_3$) of 0.1 For study on etching mechanism of SBT thin film X-ray photoelectron spectroscopy (XPS) surface analyses and secondary ion mass spectrometry (SIMS) mass analysis of etched SBT surfaces were performed. Among the elements of SBT thin film. M(Sr, Bi, Ta)-O bonds are broken by Ar ion bombardment and form SrF and TaF$_2$by chemical reaction with F. SrF and TaF$_2$are removed more easily by Ar ion bombardment. Scanning electron microscopy(SEM) was used for the profile examination of etched SBT film and the cross-sectional SEM profile of etched SBT film under CHF$_3$(Ar+CHF$_3$) of 0.1 was about 85$^{\circ}$X>.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.41-43
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• 1999

Among the feffoelectric thin films that have been widely investigated for ferroelectric random access memory (FRAM) applications, SrBi$_2$Ta$_2$$O_{9}$ thin film is appropriate to memory capacitor materials for its excellent fatigue endurance. However, very few studies on etch properties of SBT thin film have been reported although dry etching is an area that demands a great deal of attention in the very large scale integrations. In this study, the a SrBi$_2$Ta$_2$$O_{9}$ thin films were etched by using magnetically enhanced inductively coupled Ar/CHF$_3$ plasma. Etch properties, such as etch rate, selectivity, and etched profile, were measured according to gas mixing ratio of CHF$_3$(Ar$_{7}$+CHF$_3$) and the other process conditions were fixed at RF power of 600 W, dc bias voltage of 150 V, chamber pressure of 10 mTorr. Maximum etch rate of SBT thin films was 1750 A77in, under CHF$_3$(Ar+CHF$_3$) of 0.1. The selectivities of SBT to Pt and PR were 1.35 and 0.94 respectively. The chemical reaction of etched surface were investigated by X-ray photoelectron spectroscopy (XPS) analysis. The Sr and Ta atoms of SBT film react with fluorine and then Sr-F and Ta-F were removed by the physical sputtering of Ar ion. The surface of etched SBT film with CHF$_3$(Ar+CHF$_3$) of 0.1 was analyzed by secondary ion mass spectrometer (SIMS). Scanning electron microscopy (SEM) was used for examination of etched profile of SBT film under CHF$_3$(Ar+CHF$_3$) of 0.1 was about 85˚.85˚.˚.

• 한국전기전자재료학회논문지
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• 제11권7호
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• pp.517-521
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• 1998

After etching Al-Cu alloy films using $SiCl_4/Cl_2/He/CHF_3$ plasma, a corrosion phenomenon on the metal surface has been studied with XPS(X-ray pheotoelectron spectroscopy) and SEM (Scanning electron microscopy). In Al-Cu alloy system, the corrosion occurs rapidly on the etched surface by residual chlorine atoms. To prevent the corrosion, $CHF_3$ plasma treatment subsequent to the etch has been carried put. A passivation layer is formed by fluorine-related compounds on the etched Al-Cu surface after $CHF_3$ treatment, and the layer suppresses effectively the corrosion on the surface as the $CHF_3$treatment in the pressure of 300m Torr.

• 에너지공학
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• 제12권2호
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• pp.139-144
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• 2003

본 연구는 초음파 진동의 영향을 받는 풀비등 조건에서의 CHF 열전달 촉진현상을 이해하기 위해 수행되었다. 평판에 얇은 구리박판이 덮여 있는 시료와 증류수를 냉각제로 사용하여 초음파 유무, 경사각도의 변화 및 물의 과냉도 변화에 대하여 평판 가열면에서의 CHF를 측정하였다. 실험장치는 수조, 전원공급장치, 시험부, 초음파 발생장치, 데이터 획득장치 등으로 구성되었다. 실험조건은 3가지 과냉도에 대한 실험과 6가지 시편의 경사각도를 변화시켜 수행되었다. 측정값을 통해 초음파 진동이 CHF를 증진시키며, 그 영향은 경사각의 변화뿐만 아니라 과냉도에 따라서 크기가 달라지는 것을 알 수 있다. 초음파 진동에 의한 CHF증가율은 과냉도가 커질수록, 그리고 시편의 경사각도가 수직에서 수평하향 방향으로 기울어질수록 증가하였다. 가시화 실험을 통해 CHF 증가의 원인이 음장에서 기포 생성과 이탈의 동적거동과 밀접하게 관련되어 있음을 확인하였다.

• Applied Biological Chemistry
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• 제31권1호
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• pp.26-32
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• 1988

본 연구는 효모의 killer toxin을 포도주 발효효모에 도입시켜 발효중 다른 야생효모의 생육을 억제함으로서 starter를 절감하고 발효기간을 단축시키는 보다 효율적인 발효균주를 개발하기 위하여 수행되었다. 포도주 효모 Saccharomyces cerevisiae M524 균주에 N-methyl-N'-nitro-N-nitrosoguanidine을 처리하여 3종의 영양요구 변이주$CHM2(thr^-),\;CHM3(asp^-),\;CHM6(tyr^-)$를 만들었고, 이 변이주 각각을 killer 효모인 S. cerevisiae 1368R $({\alpha}\;his\;4\;kar\;1-1[kil-K][K_0]$, respiratory deficient)과 세포융합시켜 4종의 융합주 $CHF21(thr^-kil^+)\;CHF22(thr^-\;kil^+)\;CHF31(asp^-\;kil^+)\;CHF61\;(tyr^-\;kil^+)$을 만들었다. 이중 CHF31 융합주를 killer 효모 1368R과 killer 감수성 효모 S. cerevisiae $5{\times}47$에 각각 혼합 배양한 바 CHF31이 killer로서의 특성과 모균주에 못지 않은 ethanol 생성능을 지녔음이 확인되었다.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 1997년도 추계학술발표회논문집(1)
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• pp.534-539
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• 1997

A CHF table method has been assessed in this study for rod bundle CHF predictions. At the conceptual design stage for a new reactor, a general critical heat flux (CHF) prediction method with a wide applicable range and reasonable accuracy is essential to the thermal-hydraulic design and safety analysis. In many aspects, a CHF table method (i.e., the use of a round tube CHF table with appropriate bundle correction factors) can be a promising way to fulfill this need. So the assessment of the CHF table method has been performed with the bundle CHF data relevant to pressurized water reactors (PWRs). For comparison purposes, W-3R and EPRI-1 were also applied to the same data base. Data analysis has been conducted with the subchannel code COBRA-IV-I. The CHF table method shows the best predictions based on the direct substitution method. Improvements of the bundle correction factors, especially for the spacer grid and cold wall effects, are desirable for better predictions. Though the present assessment is somewhat limited in both fuel geometries and operating conditions, the CHF table method clearly shows potential to be a general CHF predictor.

• Nuclear Engineering and Technology
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• 제37권5호
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• pp.457-468
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• 2005

An experimental study on post-CHF heat transfer has been performed with a $3\times3$ rod bundle using a vertical steam-water two-phase flow at low flow conditions. The effects of various parameters on the post-CHF heat transfer are investigated and the reasons for the parametric effects are discussed. As the heat transfer regime changes from CHF to post-CHF, the radial wall temperature distribution is changed depending on the pressure and the mass flux conditions. The superheat of the fluid increases considerably with an increase of the wall temperature (or heat flux) and with a decrease of the mass flux. This implies, indirectly, a strong thermal non-equilibrium at high wall temperature and low mass flux conditions. In order to improve the prediction accuracy of the existing post-CHF correlations, it is necessary to perform more experiments, particularly direct measurement of the vapor superheat, and to modify the correlation by considering a strong thermal non-equilibrium at low flow and low pressure conditions.

• Nuclear Engineering and Technology
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• 제33권3호
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• pp.283-297
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• 2001

The CHF in PWR rod bundles is usually predicted by the local flow correlation approach based on subchannel analysis while difficulty exists due to the existence of spacer grids especially with mixing vanes. In order to evaluate the effect of spacer grids on CHF, the experimental rod bundle data with various types of spacer grids were analyzed using the subchannel code, COBRA-IV-i. For the Plain grid data, a CHF correlation was described as a function of local flow conditions and heated length, and then the residuals of the CHF in mixing vaned grids predicted by the correlation were examined in various kinds of grids. In order to compensate for the residual, three parameters, distances between grids and from the last grids to the CHF site, and equivalent hydraulic diameter were introduced into a grid parameter function representing the remaining effect of spacer grids predicted most of the CHF data points in plaing grids within $\pm$20 percent error band. Good agreement with the CHF data was also shown when the grid parameter function for mixing vaned grids of a specific design was used to compensate for the residuals of the CHF data predicted by the correlation.

• 한국진공학회지
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• 제1권1호
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• pp.145-152
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• 1992

Si surfaces exposed to CHF3/C2F6 gas plasmas ih reactive ion etching (RIE) have been characterized by X-ray photoelectron spectroscopy (XPS). CHF3/C2F6 gas plasma exposure of Si surface leads to the deposition of residual film containing carbon and fluorine. The narrow scan spectra of C 1s show various bonding states of carbon as C-Si, C-F/H, C-CFx(x $\leq$ 3), C-F, C-F2, and C-F3. The chemical bonding states of fluorine are described with F-Si, F-C and F-O. And the oxygen and silicon are also detected. The effects of parameters for reactive ion etching as CHF3/C2F6 gas ratio, RF power, and pressure are investigated.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 1999년도 춘계학술발표회요약집
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• pp.155-155
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• 1999

Pool boiling critical heat flux (CHF) have been investigated using plate type test sections with different widths (3 cm & 4 cm) and lengths (10 cm, IS cm & 20 cm) under various incli- nation angles. As the inclination angle increases from $0^{\circ}$ (horizontally facing downward plate) to $30^{\circ}$, CHF sharply increases. After that angle, CHF gradually increases with the increase of the inclination angle. There must be a transition angle between $0^{\circ}$ and $30^{\circ}$, at which the CHF increase rate remarkably changes. According to the comparison of present and previous ex- periments, the transition angle may be affected by heater size and increase with the increase of heater size. The size effect of heated surface on CHF is noticeable in the L15 & L20 series and W4 series; however, it seems to be difficult to find the size effect in L10 series and W3 series.