• 제목/요약/키워드: $BaTiO_3$ thin film

검색결과 203건 처리시간 0.028초

티타늄 기판 위에 강유전성 BaTiO3박막 형성과 분극처리에 의한 Eagle’s MEM 용액에서의 Calcium Phosphate 생성 (Fabrication of Ferroelectric BaTiO3Thin Film on Ti Substrate and Formation of Calcium Phosphate in Eagle’s MEM Solution)

  • 이용렬;정영화;황규석;송호준;박영준
    • 한국재료학회지
    • /
    • 제12권7호
    • /
    • pp.560-567
    • /
    • 2002
  • Titanium (Ti) is a bioinert material and has lower elastic coefficient and better strength/volume property than other metals. Ferroelectric materials show alignment of positive and negative charges by poling treatment. This study was purposed to develop a new implant system by combining the advantages of Ti and ferroelectric property of $BaTiO_3$ (BTO). It was performed with the assumption that the $Ca^{2+ }$ ions would be easily attracted on negatively charged surface and the attracted cation might behave as nuclei for bone-like crystal growth in biological solutions. A ferroelectric BTO thin film on Ti was fabricated and the effect of poling treatment on the improvement of calcium phosphate (Ca-P) formation in biological solutions was evaluated. After immersion in Eagle’s minimum essential media (MEM) solution, NaCl was formed on Ti, and Ca-P layer containing NaCl was formed on Ti-O. Weak and sparse Ca-P layers were formed on BTO, while thick, homogeneous, and dense Ca-P layer was formed on negatively polarized BTO (N-BTO), which was confirmed by FE-SEM and EDX. In summary, these results demonstrate that poling the ferroelectric BTO surface negatively is effective for the formation of Ca-P layer in MEM solution, and that N-BTO coating on Ti could be used as a possible alternative method for enhancing the osseointegration of the implants.

화학증착법에 의한 고온 초전도 Y-Ba-Cu-O 박막의 제조 조건 확립에 관한 연구 (Establishment of Preparation Conditions for High-Tc Superconducting Y-Ba-Cu-O Thin Film by Chemical Vapor Deposition)

  • 박정식;조익준;김춘영;이희균;원동연;신형식
    • 공업화학
    • /
    • 제3권3호
    • /
    • pp.412-421
    • /
    • 1992
  • 단결정 기판위에 증착된 고온 초전도 박막은 microelectronic 장치의 실제적인 응용을 위한 가능성을 보여주고 있다. 고온 초전도 Y-Ba-Cu-O 박막을 원료물질로서 $Y(thd)_3$, $Ba(thd)_2$$Cu(thd)_2$의 유기금속 킬레이트를 사용하였고 단결정 MgO(100), YSZ(100), $SrTiO_3(100)$와 다결정 $SrTiO_3$기판에 화학증착법을 통해 제조하였다. 박막의 증착두께는 증착시간이 증가함에 따라 선형적으로 증가하였다. 단결정 MgO(100), YSZ(100), $SrTiO_3(100)$ 기판 위에 증착한 Y-Ba-Cu-O 박막은 액체질소 비등온도($T_{C,onset}=87{\sim}89K$, $T_{C,zero}=85{\sim}86K$) 이상에서 초전도성을 나타내었으나 다결정 $SrTiO_3$ 기판은 액체질소 비등온도 이상에서 제로저항을 갖지 않았다.

  • PDF

잉크젯 프린팅 공정을 통해 제작된 BaTiO3 Capacitor의 유전특성 분석 (Dielectric Property Analysis of BaTiO3 Capacitor Manufactured by Inkjet Printing Process)

  • 김유진;이경영;이인곤;홍익표;김지훈
    • 한국전기전자재료학회논문지
    • /
    • 제35권6호
    • /
    • pp.610-615
    • /
    • 2022
  • BaTiO3 is one of the ferroelectric materials with excellent dielectric properties such as high dielectric constant, low dielectric loss, and is widely used for the manufacturing of capacitors, piezoelectric converters, microsensors, and ferroelectric memories. Inkjet printing is a technology which uses digital and contactless methods which significantly improves flexibility associated with material and structural design, reducing manufacturing costs. Therefore, the top and bottom electrodes, BaTiO3 ink, and photocurable resin were all printed by an inkjet to produce a BaTiO3 capacitor. The properties of the printed thin film were analyzed. It was confirmed that the photocurable resin ink was well-infiltrated between the BaTiO3 powder particles printed by inkjet. The dielectric properties of the capacitor such as dielectric constant which varies in accordance with frequency, polarization and tunability that changes with voltage, were measured.

졸-겔법에 의한 강유전 BST 박막의 제조 및 특성 (Fabrication and properties of ferroelectric BST thin films prepared by sol-gel method)

  • 이진홍;박병옥
    • 한국결정성장학회지
    • /
    • 제11권2호
    • /
    • pp.60-66
    • /
    • 2001
  • ($Ba_x$$Sr_{1-x}$)$TiO_3$ (x=0.9, 0.7, 0.5)박막을 졸-겔법으로 ITO-coated glass기판 위에 제조하였다. BST의 perov-skite상 생성온도는 $600^{\circ}C$ 이상이며 Sr함량이 증가할수록, $Ba^{2+}$ 이온보다 작은 $Sr^{2+}$ 이온에 의해 perovskite상들의 피크가 높은 회절 각도로 이동하였다. 그리고 온도가 증가할수록 결정립은 조대화 되었고, Sr 함량이 증가할수록 결정립은 미세화 되었다. BST(50/50)의 유전상수 값은 다른 두 조성보다 큰 값을 나타내고 유전손실 값은 더 낮았다. 1 kHz때의 BST(50/50)박막의 유전상수 및 유전손실 값은 각각 652와 0.042였다.

  • PDF

RF Power에 따른 PZT/BST 이종층 박막의 구조 및 유전 특성 (The Structural and Dielectric Properties of the PZT/BST Heterolayered Thin Films with RF Power)

  • 이상철;남성필;이성갑;이영희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제54권1호
    • /
    • pp.13-17
    • /
    • 2005
  • The Pb(Zr/sub 0.52/Ti/sub 0.48/)O₃/(Ba/sub 0.6/Sr/sub 0.4/)TiO₃[PZT/BST] heterolayered thin films were deposited on Pt/Ti/SiO₂/Si substrates by using the RF sputtering method with different RF power. The PZT/BST heterolayered thin films had the tetragonal structure of the PZT phase and BST phase. Increasing the RF power. the intensity of the PZT (100), (110) peaks and BST (111) peaks were decreased and the intensity of the BST (100), (110) peaks were increased. The thickness ratio of the top layered BST thin film and the bottom layered PZT thin film was 2 to1. The atomic concentration of the Ba, Sr, Pb. Zr, Ti atoms were constant in the PZT thin films and BST thin films, respectively. The Pt atom was diffused to the PZT region in the PZT/BST heterolayered thin films deposited at condition of 60[W] RF power. Increasing the frequency, dielectric constant and loss of the PZT/BST heterolayered thin films were decreased. The dielectric constant and loss of the PZT/BST heterolayered thin films deposited with RF power of 90[W] were 406 and 3%, respectively.

기판에 따른 BST 박막의 전기적 특성에 관한 연구 (Study on electrical properties of BST thin film with substrates)

  • 이태일;최명률;박인철;김홍배
    • 한국진공학회지
    • /
    • 제11권3호
    • /
    • pp.135-140
    • /
    • 2002
  • 본 논문에서는 p-type (100)Si, (100)MgO 그리고 MgO/si 기판 위에 RF Magnetron sputtering 법으로 $Ba_{0.5}Sr_{0.5}TiO_3$(BST)박막을 증착하였다. BST 박막 증착 후 RTA(Rapid Thermal Annealing)를 이용하여 $600^{\circ}C$에서 산소분위기로 1분간 고온 급속 열처리를 하였다. 증착된 BST박막의 결정화를 조사하기 위해 XRD(X-Ray Diffraction)측정을 한 결과 모든 기판에서 (110) $Ba_{0.5}Sr_{0.5}TiO_3$(의 주피크가 관찰되어졌고, 열처리 후 재결정화에 기인하여 피크 세기가 증가함을 관찰할 수 있었다. Al 전극을 이용한 커패시터 제작 후 측정한 C-V(Capacitance-Voltage) 특성에서 각각의 기판에서 측정된 커패시턴스 값으로 계산된 유전율은 120(bare Si), 305(Mgo/Si) 그리고 310(MgO)이었다. 누설 전류 특성에서는 0.3 MV/cm이내의 인가전계에서 1 $\mu\textrm{A/cm}^2$ 이하의 안정된 값을 보여주었다. 결론적으로 MgO 버퍼층을 이용한 기판이 BST 박막의 증착을 위한 기판으로써 효과적임을 알 수 있었다.

Phase-shifters 응용을 위한 MgO 박막위에 성장된 BST(100) 박막의 유전적 특성 (Dielectric properties of (100)-oriented $Ba_{0.6}Sr_{0.4}TiO_3$ Thin Films grown on MgO (100) thin films for phase-shifters)

  • 이병기;김창일
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
    • /
    • pp.663-666
    • /
    • 2004
  • In this paper, we have investigated the structure and dielectric properties of the $(Ba_{0.6}Sr_{0.4})TiO_3$ (BST) thin films film fabricatedon MgO(100)/Si substrate by an alkoxide-based sol-gel method. Both the structure and morphology of films were analyzed by x-ray diffraction (XRD) and atomic force microscope (AFM). For the MgO(100)/Si substrates, the BST thin films exhibited highly (100) orientation. The highly (100)-oriented BST thin films showed high dielectric constant, tunability, and figure of merit (FOM). The dielectric constants, dielectric loss and tunability of the BST thin films annealed at 700 C deposited on the MgO(100)/Si substrates measured at 10 kHz were 515.9, 0.0082, and 54.3 %, respectively.

  • PDF

유도결합 플라즈마에 의한(Ba, Sr)TiO$_3$ 박막의 식각 특성 연구 (The Study on the Etching Characteristics of (Ba, Sr)TiO$_3$ Film by Inductively Coupled Plasma)

  • 김승범;이영준;염근영;김창일
    • 전자공학회논문지D
    • /
    • 제36D권4호
    • /
    • pp.56-62
    • /
    • 1999
  • 본 연구에서, (Ba,Sr)TiO\sub 3\ 박막이 rf 전력, dc 바이어스 전압 및 반응로 압력과 같은 식각 공정 변수를 변화하여 ICP에서 Cl\sub 2\Ar 가스 혼합비에 따라 식각되었다. 0.2의 Cl\sub 2\/(Cl\sub 2\+Ar) 가스 혼합비, 600 W의 rf 전력,250 V의 dc 바이어스 전압 및 5 mTorr의 반응로 압력의 공정 조건하에서 식각율은 56nm/min이었다. 이때 Pt, SiO\sub 2\ 막에 대한 BST 박막의 식각 선택비는 각각 0.52, 0.43이었다. 식각된 BST 박막의 표면반응은 XPS로 분석하였다. Ba는 BaCl\sub 2\ 와 같은 화학적인 반응과 물리적인 스퍼터링에 의해 제거되었다. Sr의 제거는 Sr과 Cl의 화확적인 반응보다 Ar 이온 충격이 더 효과적이었다. Ti는 TiCl\sub 4\ 와 같은 화학반응에 의해 용이하게 제거되었다. XPS 분석 결과를 비교하기 위하여 SIMS의 분석을 수행하여 비교한 결과 동일한 결론을 도출하였다.

  • PDF

Variations of Interface Potential Barrier Height and Leakage Current of (Ba, Sr)$TiO_3$ Thin Films Deposited by Sputtering Process

  • Hwang, Cheol-Seong;Lee, Byoung-Taek
    • The Korean Journal of Ceramics
    • /
    • 제2권2호
    • /
    • pp.95-101
    • /
    • 1996
  • Variations of the leakage current behaviors and interface potential barrier $({\Phi}_B)$ of rf-sputter deposited (Ba, Sr)$TiO_3$ (BST) thin films with thicknesses ranging from 20 nm to 150nm are investigated as a function of the thickness and bias voltages. The top and bottom electrodes are dc-sputter-deposited Pt films. ${\Phi}_B$ critically depends on the BST film deposition temperature, postannealing atmosphere and time after the annealing. The postannealing under $N_2$ atmosphere results in a high interface potential barrier height and low leakage current. Maintaining the BST capacitor in air for a long time reduces the ${\Phi}_B$ from about 2.4 eV to 1.6 eV due to the oxidation. ${\Phi}_B$ is not so dependent on the film thickness in this experimental range. The leakage conduction mechanism is very dependent on the BST film thickness; the 20 nm thick film shows tunneling current, 30 and 40 nm thick films show Shottky emission current.

  • PDF

상온분사분말공정에 의해 SrTiO3 (100), (110) Seed에 코팅된 BaTiO3의 고온 성장 거동 분석 (High Temperature Grain Growth Behavior of Aerosol Deposited BaTiO3 Film on (100), (110) Oriented SrTiO3 Single Crystal)

  • 임지호;이승희;김기현;지성엽;정승운;박춘길;정한보;정대용
    • 한국재료학회지
    • /
    • 제29권11호
    • /
    • pp.684-689
    • /
    • 2019
  • Single crystals, which have complexed composition, are fabricated by solid state grain growth. However, it is hard to achieve stable properties in a single crystal due to trapped pores. Aerosol deposition (AD) is suitable for fabrication of single crystals with stable properties because this process can make a high density coating layer. Because of their unique features (nano sized grains, stress inner site), it is hard to fabricate single crystals, and so studies of grain growth behavior of AD film are essential. In this study, a $BaTiO_3$ coating layer with ${\sim}9{\mu}m$ thickness is fabricated using an aerosol deposition method on (100) and (110) cut $SrTiO_3$ single crystal substrates, which are adopted as seeds for grain growth. Each specimen is heat-treated at various conditions (900, 1,100, and $1,300^{\circ}C$ for 5 h). $BaTiO_3$ layer shows different growth behavior and X-ray diffraction depending on cutting direction of $SrTiO_3$ seed. Rectangular pillars at $SrTiO_3$ (100) and laminating thin plates at $SrTiO_3$ (110), respectively, are observed.