• 제목/요약/키워드: $Ar^+$ laser

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API강재의 파이버레이저 용접시 유기하는 플라즈마의 방사특성 (III) - 보호가스가 플라즈마 방사 신호에 미치는 영향 - (Characteristics of Plasma Emission Signals in Fiber Laser Welding of API Steel (III) -The Effect on Plasma Emission Signals by Shield Gas-)

  • 이창제;김종도;김유찬
    • Journal of Welding and Joining
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    • 제31권3호
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    • pp.60-65
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    • 2013
  • Ar, $N_2$, and He are the conventional kind of shield gas that are used for laser welding. Many researches on the impact of laser welding shield gas have been done, and it is on going until now. However, there are few studies that analyze the changes and differences of the plasma emission signal. Therefore, in this study, we evaluated the change in the penetration characteristics according to the type of shield gas during fiber laser welding impacts to the plasma signal. As a result, if was checked that the difference in molecular weight of Ar, $N_2$, and He affects to the amount of spatter, and also found that the measured plasma radiation signal changes similar to the order of the molecular weight of the gases. Especially, clear change on the signal intensity per each shield gas was measured through RMS, and found that the shield gas was nothing to do with the FFT analyzed result.

집속된 아르곤 이온 레이저에 의한 실리콘의 미세가공 및 평가 (Microprocess of silicon using focused Ar$^+$ llaser and estimates)

  • 정재훈;이천;황경현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 추계학술대회 논문집
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    • pp.473-476
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    • 1997
  • Focused Ar ion laser beam can be utilized to fabricate microstructures on silicon substrate as well as other materials(e.g. such as ceramic). The laser using in this study is an argon ion laser with maximum power of 6 W, wavelength of 514 nm. This laser beam is focused by objectives with a high numerical aperture, a long working distance. We have achieved line width about 1 ${\mu}{\textrm}{m}$ with high scan speed. The resolution for Si machining is determined by the selectivity of the chemical reaction rather than the laser spot size. In this study, we have obtained the maximum etch rate of 434.7 ${\mu}{\textrm}{m}$/sec with high aspect ratio. The characteristics of etched groove was investigated by scanning electron microscope(SEM) and auger electron spectroscopy(AES). It is assumed that the technique using arson ion laser is applicab1e to fabricate microstructures.

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레이져 용삭법에 의한 탄소입자 운동모델 - 플라즈마와의 상관관계 - (The Carbon Plume Simulation by Pulsed Laser Ablation Method - Interactions between Ar plasmas and Carbon Plume -)

  • 소순열;정해덕;이진;민용기;박계춘;김창선;문채주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 광주전남지부
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    • pp.96-100
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    • 2006
  • A pulsed laser ablation deposition (PLAD) technique is an excellent method for the fabrication of amorphous carbon (a-C) films. This paper was focused on the understanding and analysis of the motion of carbon atom (C) and carbon ion ($C^+$) particles in laser ablation assisted by Ar plasmas. The simulation has carried out under the pressure P=10~100 mTorr of Ar plasmas. Two-dimensional hybrid model consisting of fluid and Monte-Carlo models was developed and three kinds of the ablated particles which are C, $C^+$ and electron were considered in the calculation of particle method. The motions of energetic $C^+$ and C deposited upon the substrate were investigated and compared.

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ArF PLD System을 사용한 YBCO 박막과 STO/YBCO 박막의 제작 (Deposition of YBCO and STO/YBCO thin films using ArF PLD system)

  • 정태봉;장주억;강준희
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.43-47
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    • 1999
  • Instead of using KrF excimer lasers( ${\lambda}$ = 248 nm) in depositing oxide thin films, as in the most of the laboratories in Korea, we have used an ArF excimer laser( ${\lambda}$ = 197 nm) which has a shorter wavelength. By using a beam which has a shorter wavelength, we could obtain higher quality and smoother surface YBCO thin films. We fabricated YBCO thin films with the various substrate temperature conditions and analyzed the characteristics of these films. We also studied the charateristics of the films fabricated under the various conditions of the power of laser and the oxygen pressure. The characterization tools used in this work were a transport measurement setup, an XRD , and a SEM. We also fabricated STO/YBCO multilayers to use in SFQ devices fabrication. XRD patterns of the multilayers showed that the multilayer films were grown epitaxially.

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LIF를 이용한 Hg-Ar 플라즈마 특성 평가 (Evaluation of Plasma Characteristics for Hg-Ar Using LIF)

  • 문종대
    • 전기학회논문지P
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    • 제57권2호
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    • pp.79-83
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    • 2008
  • In this paper, we introduced a LIF measurement method and summarized the theoretical side. When an altered wavelength of laser and electric power, lamp applied electric power, we measured the relative density of the metastable state in mercury after observing a laser induced fluorescence signal of 404.8nm and 546.2nm, and confirmed the horizontal distribution of plasma density in the discharge lamp. Due to this generation, the extinction of atoms in a metastable state occurred through collision, ionization, and excitation between plasma particles. The density and distribution of the metastable state depended on the energy and density of plasma particles, intensely. This highlights the importance of measuring density distribution in plasma electric discharge mechanism study. The results confirmed the resonance phenomenon regarding the energy level of atoms along a wavelength. change, and also confirmed that the largest fluorescent signal in 436nm, and that the density of atoms in 546.2nm ($6^3S_1{\to}6^3P_2$) were larger than 404.8nm ($6^3S_1{\to}6^3P_2$). According to the increase of lamp applied electric power, plasma density increased, too. When increased with laser electric power, the LIF signal reached a saturation state in more than 2.6mJ. When partial plasma density distribution along a horizontal axis was measured using the laser induced fluorescence method, the density decreased by recombination away from the center.

Impact of CO2 Laser Pretreatment on the Thermal Endurance of Bragg Gratings

  • Gunawardena, Dinusha Serandi;Lai, Man-Hong;Lim, Kok-Sing;Ahmad, Harith
    • Journal of the Optical Society of Korea
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    • 제20권5호
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    • pp.575-578
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    • 2016
  • The thermal endurance of fiber Bragg gratings (FBGs), written with the aid of 193-nm ArF excimer laser irradiation on H2-loaded Ge/B codoped silica fiber, and pretreated with a CO2 laser and a subsequent slow cooling process, is investigated. These treated gratings show relatively less degradation of grating strength during the thermal annealing procedure. The thermal decay characteristics of treated and untreated fiber, recorded over a time period of 9 hours, have been compared. The effect on the Bragg transmission depth (BTD) and the center-wavelength shift, as well as the growth of refractive-index change during the grating inscription process for both treated and untreated fiber, are analyzed.

비정질 $As_2S_3$ 박막의 광유도 비등방성과 비등방축의 가역성 (Photoinduced Anisotropy and Reorientation of Anisotropic Axis in Amorphous $As_2S_3$ Thin Film)

  • 김향균
    • 한국광학회:학술대회논문집
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    • 한국광학회 1990년도 제5회 파동 및 레이저 학술발표회 5th Conference on Waves and lasers 논문집 - 한국광학회
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    • pp.162-166
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    • 1990
  • Photoinduced anisotropy (PIA) in amorphous As2S3 (a-As2S3 ) thin film, deposited by vacuum evaporation, is investigated. PIA is induced by linearly polarized Ar+ laser beam (λ=514.5nm) and probed by weak Ar+ laser (λ=514.5nm) and He-Ne laser (λ=632.8nm) beam through the crossed analyzer. Keeping pump beam intensity constantly, rotation of pump beam polarization direction induces reorientation phenomina of anisotropic axis. Introducing directional factor into simplified 3-level system, which is used to analyze photodarkening phenomina, an analytical expression of PIA is derived. Temporal behavior of PIAand its reorientation phenomina are investigated andcompared with theory. In the experiment pump beam intensity is 100mW/$\textrm{cm}^2$ and thickness of a-As2S3 thin film is 3${\mu}{\textrm}{m}$. In those condition, time constant of photoinduced anisotropy obtained by method of least square curve fitting is 4.0$\times$10-2sec-1. The time constant of PIA we obtained is larger than that of photodarkening, 2.8$\times$10-2sec-1.

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CdS/CIGS 박막의 열처리 온도에 따른 Photoluminescence 특성

  • 조현준;김대환;최상수;배인호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.295-295
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    • 2011
  • CIGS박막을 동시 증발법(co-evaporation)으로 몰리브덴이 증착된 소다라임 유리 위에 성장시켰다. CdS 박막은 화학적 용액 성장법 (chemical bath deposition: CBD)을 이용하여 약 60 nm를 증착하였다. 열처리는 가열판 (hot-plate)을 사용하여 공기중에서 하였다. 열처리 온도는 0~350$^{\circ}C$까지 변화하였으며, 열처리 시간은 각각 5분이었다. 시료의 표면 및 계면의 변화를 SEM측정을 통하여 관측하였다. CdS/CIGS 박막의 열처리 온도 변화에 따른 photoluminescence 특성을 조사하였다. 여기 레이저는 488 nm ($Ar^+$ laser)와 632.8 nm (He-Ne laser)를 사용하여 결함의 근원을 조사하였다. 온도 의존성 실험을 통하여 CIGS 박막의 띠 간격 에너지를 확인할 수 있었으며, 결함 준위의 활성화 에너지 및 특성을 알 수 있었다. $Ar^+$ laser에서만 관측되는 신호의 근원은 CdS에 기인한 것이었다.

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Infrared Multiphoton Dissociation of ${CF_2}HCl$: Laser Fluence Dependence and the Effect of Intermolecular Collisions

  • Song, Nam-Woong;Shin, Kook-Joe;Lee, Sang-Youb;Jung, Kyung-Hoon;Choo, Kwang-Yul;Kim, Seong-Keun
    • Bulletin of the Korean Chemical Society
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    • 제12권6호
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    • pp.652-658
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    • 1991
  • The effect of intermolecular collisions in the infrared multiphoton dissociation (IRMPD) of difluorochloromethane was investigated using He, Ar, and $N_2$ as buffer gases. The reaction probability for IRMPD of difluorochloromethane was measured as a function of laser fluence and the buffer gas pressure under unfocused beam geometry. It was observed that the reaction probability was initially enhanced with the increase of buffer gas pressure up to about 20 torr, but showed a decline at higher pressures. The reaction probability increases monotonically with the laser fluence, but the rate of increase diminishes at higher fluences. An attempt was made to simulate the experimental results by the method of energy grained master equation (EGME). From the parameters that fit the experimental data, the average energy loss per collision, $<{\Delta}E>_d$, was estimated for the He, Ar, and $N_2$ buffer gases.

넓은 범위의 압력에서 Xe 농도 변화에 대한 XeF$(C\rightarrowA$ 레이저의 출력특성 (Output Characteristics of XeF$(C\rightarrowA$ Laser for the variation of Xe concentration under the pressures of broad region)

  • 류한용;이주희
    • 한국광학회지
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    • 제6권3호
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    • pp.214-221
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    • 1995
  • 레이저매질의 넓은 압력범위(0.5-3.5 기압)에 대해 70ns[FWHM]의 전자빔 가속기(800kV, 21kA)로 여기할 때 free-running XeF$(C\rightarrowA$ 엑시머 레이저의 출력과 Xe 농도와의 상호관계를 조사하였다. 공진기를 쌍색성의 출력거울로 구성하고, 레이저 출력을 레이저매질 $(Xe/F_2/Ar)$의 총압력과 가스혼합비의 함수로써 최적화 하였다. $F_2$ 0.46%를 고정한 조건에서 레이저 고유효율은 총압력 1, 2, 3기압에서 최대 0.38%, 1.03%, 0.29%로 측정되었다. 이때 레이저의 최대 고유효율은 레이저매질의 총압력이 낮을수록 높은 Xe 농도에서 높게 나타났다. 이같은 상호관계를 $XeF^*(C)$의 형성효율 및 XeF$(C\rightarrowA$ 레이저 추출 효율에 대해 동력학적으로 해석하므로써 Xe 농도의 의존성을 설명하였다. 그 결과로 대기압 XeF$(C\rightarrowA$ 레이저의 효율적인 동작을 제안한다.

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