• 한국표면공학회지
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• 제50권4호
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• pp.272-276
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• 2017

The response of AISI 310 type austenitic stainless steel to the novel low temperature plasma carburizing process has been investigated in this work. This grade of stainless steel shows better corrosion resistance and high temperature oxidation resistance due to its high chromium and nickel content. In this experiment, plasma carburizing was performed on AISI 310 stainless steel in a D.C. pulsed plasma ion nitriding system at different temperatures in $H_2-Ar-CH_4$ gas mixtures. The working pressure was 4 Torr (533Pa approx.) and the applied voltage was 600 V during the plasma carburizing treatment. The hardness of the samples was measured by using a Vickers micro hardness tester with the load of 100 g. The phase of carburized layer formed on the surface was confirmed by X-ray diffraction. The resultant carburized layer was found to be precipitation free and resulted in significantly improved hardness and corrosion resistance.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.241-241
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• 2015

플라즈마 건식 식각 기술은 반도체 식각공정에서 효과적으로 이용되고 있으며, 반도체 소자의 크기가 줄어듬에 따라 미세하고 정확하게 식각 깊이를 제어 할 수 있는 원자층 식각기술 많은 관심을 받고 있다. 실리콘을 대체 할 수 있는 우수한 전기적 특성을 가진 III-V 화합물 반도체 재료인 InGaAs에 대한 원자층 식각을 통하여, 흡착가스에 대한 표면흡착 및 탈착가스에 대한 표면탈착 메커니즘을 고찰하였다. 또한, 성분 및 표면분석 장치를 이용하여 InGaAs 원자층 식각 특성에 대해 연구하였다.

• 한국초전도저온공학회:학술대회논문집
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• 한국초전도저온공학회 2003년도 학술대회 논문집
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• pp.51-54
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• 2003

We investigated the quench characteristics of thin film type SFCLs with shunt layers of various thickness. The SFCLs ware based on 2 inch diameter YBa$_2$Cu$_3$O$_{7}$ thin films coated in-situ with a gold shunt layer. The shunt layer thickness was varied by Ar ion milling. The limiters were tested with simulated fault currents at various source voltages. The thinner the shunt layer was, the slower was the rise of SFCL temperatures. This means SFCLs of thinner shunt layers had higher voltage ratings. The voltage rating was approximately inversely proportional to the square root of the shunt layer thickness. This result could be understood through the concept of heat balance.e.

• 한국초전도저온공학회:학술대회논문집
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• 한국초전도저온공학회 2003년도 학술대회 논문집
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• pp.242-245
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• 2003

We investigated the quench characteristics of thin film type SFCLs with shunt layers of various thickness. The SFCLs ware based on 2 inch diameter YBa$_2$Cu$_3$3O$_{7}$ thin films coated in-situ with a gold shunt layer. The shunt layer thickness was varied by Ar ion milling. The limiters were tested with simulated fault currents at various source voltages. The thinner the shunt layer was, the slower was the rise of SFCL temperatures. This means SFCLs of thinner shunt layers had higher voltage ratings. The voltage rating was approximately inversely proportional to the square root of the shunt layer thickness. This result could be understood through the concept of heat balance.e.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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• pp.422-424
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• 2000

ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the emission properties of ZnO thin films, PL measurements with an Ar ion laser as a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited PL bands centered around 390, 510 and 640 nm, labeled near ultra-violet (UV), green and orange bands. Structural properties of ZnO thin films are analized with X-ray diffraction (XRD).

• 한국전기전자재료학회논문지
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• 제16권4호
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• pp.280-285
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• 2003

The influence of silicon surface damage on nickel-silicide (NiSi) has been characterized and H$_2$ anneal and TiN rapping has been applied to suppress the electrical, morphological deterioration phenomenon incurred by the surface damage. The substrate surface is intentionally damaged using Ar IBE (Ion beam etching) which can Precisely control the etch depth. The sheet resistance of NiSi increased about 18% by the surface damage, which is proven to be mainly due to the reduced silicide thickness. It is shown that simultaneous application of H: anneal and TiN capping layer is highly effective in suppressing the surface damage effect.

• 대한인간공학회지
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• 제7권2호
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• pp.23-30
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• 1988

The methods suggested up to now for 3-dimensional anthroponetry require much efforts and costs in measuring and analysing. To solve these problems, we adopt the methods such as Moire Interferometry, Image processing and Computer Vision Technique which are efficient in processing anthropomorphic data. Moire contourgraph was constructed by using Ar-ion laser as a light source (2 Watt power and 5145 A wavelength) and laser beam expander(20X). Image data can be 3-dimensionally reconstructed as the surface patch and geographical relation between faces expressed by mash-point and edges as units. This research is focused on the followings; 1) Development of an economical and reliable measuring method. 2) Design of reproduction methods of 3-dimensional human body data. Therefore, our research makes it possible to study further advanced quantitative analysis of human body.

• 한국광학회지
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• 제2권2호
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• pp.59-66
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• 1991

표면 플라즈몬 공명이 일어나는 공명각과 최적 두께를 여러 금속 박막에 대해 어드미턴스 다이어그램을 이용하여 계산하였으며, 표면 플라즈몬 공명에서 측정한 반사율과 이론치를 곡선 맞춤하여 은박막과 알루미늄 박막의 광학 상수와 두께를 결정하였다. 한 파장에 대해 두 개의 해가 존재하므로 알곤 레이저의 두 파장에서 같은 두께를 갖는 해를 광학 상수의 유일 해로 선택하였으며, 금속 박막을 공기 중에 노출시킬 경우, 박막의 표면 변화에 의해 이동된 표면 플라즈몬 공명으로부터 변화된 금속 박막의 광학 상수를 결정하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.207-207
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• 1999

고분자 재료에 이온을 주입함으로서 소재 표면은 경도, 내마모, 내피로성의 기계적인 특성과 내부식성의 화학적 특성, 전기 전도도, 광학적 특성(Optical Density)의 물리적인 특성이 향상된다. 본 논문에서는 MPPO(Modified-Polyphenylene Oxide) 표면에 Ar, N2, He, H 이온을 50, 70, 100 KeV, Dose 1$\times$1014~1$\times$1017 ions/$ extrm{cm}^2$로 조사하였다. XPS와 RBS로 소재의 Binding Energy와 이온의 침투깊이, 분자 조성과 결합 상태 등의 특성을 관찰하였다. 표면 저항값은 1$\times$1011~6.7$\times$106($\Omega$/$\square$)으로 감소함으로서 전기 전도도가 향상되었고, Optical Density는 증가하여 전기적 특성과 광학적 특성간의 상관 관계가 있음을 보여준다.

• 유체기계공업학회:학술대회논문집
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• 유체기계공업학회 2003년도 유체기계 연구개발 발표회 논문집
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• pp.678-683
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• 2003

Mixers are used in various industrial fields where it is necessary to intimately mix two reactants in a short period of time. However, despite their widespread use, complex unsteady flow characteristics of industrial mixers are not systematic investigated. The present study aimed to clarify unsteady flow characteristics induced by various impellers in a tank. Impellers are pitched blade turbine and neo-hydrofoil turbine types. A high speed CCD camera and an Ar-Ion laser for illumination were adopted to clarify the time-dependent flow characteristics of the mixers. The rotating speed of impellers increased from 6Hz to 60Hz by 6Hz. The maximum velocity around PBT impeller is higher than the hydrofoil type impeller. These two types of turbine shows that typical flow characteristics of axial turbine and suitable for mixing high -viscosity materials.