• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.63-63
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• 2003

플라즈마 공정은 DRAM, 이종접합 양극성 트랜지스터(HBTs), 레이저, 평면도파로(planar lightwave circuit)와 같은 전자소자 및 광조자 제작에 있어서 핵심 공정중의 하나이다. 최근 미세 구조의 크기가 극도로 감소하게 됨에 따라 실제 소작 제작에 있어서 미세한 모양을 식각하는 공정이 매우 중요하게 되었다. 그 중에서 고밀도 유도결합 플라즈마(high density inductively coupled plasma)를 이용한 기술은 빠르고 정확한 식각률, 우수한 식각 균일도와 높은 재현성 때문에 습식식각 기술보다 선호되고 있다. 본 연구는 평판형(planar) 고밀도 유도결합 플라즈마 식각장치를 이용하여 BCl$_3$와 BCl$_3$/Ar 플라즈마에 따른 AlGaAs/GaAs의 식각결과를 비교 분석하였다. 공정 변수는 ICP 소스(source power)파워, RIE 척(chuck) 파워, 공정 압력, 그리고 Ar 조성비(0-100%)이었다. BCl$_3$에 Ar을 첨가하게 되면 순수한 BCl$_3$ 플라즈마에서의 AlGaAs/GaAs 식각률(> 3000 $\AA$/min) 보다 분당 약 1000$\AA$ 이상 높은 식각률(>4000 $\AA$/min)을 나타내었다. 이 결과는 Ar 플라즈마의 이온보조(ion-assisted)가 식각률 증가에 기인한다고 예측된다. 그리고 전자주사 현미경(SEM)과 원자력간 현미경(AFM)을 사용하여 식각 후 표면 거칠기 및 수직 측벽도 둥을 분석하였다. 마지막으로 XPS를 이용하여 식각된 후에 표면에 남아 있는 잔류 성분 분석을 연구하였다. 본 결과를 종합하면 BCl$_3$에 기초한 평판형 유도결합 플라즈마는 AlGaAs/GaAs 구조의 식각시 많은 우수한 특성을 보여주었다.79$\ell/\textrm{cm}^3$, 0.016$\ell/\textrm{cm}^3$, 혼합재료 2는 0.045$\ell/\textrm{cm}^3$, 0.014$\ell/\textrm{cm}^3$, 혼합재료 3은 0.123$\ell/\textrm{cm}^3$, 0.017$\ell/\textrm{cm}^3$, 혼합재료 4는 0.055$\ell/\textrm{cm}^3$, 0.016$\ell/\textrm{cm}^3$, 혼합재료 5는 0.031$\ell/\textrm{cm}^3$, 0.015$\ell/\textrm{cm}^3$, 혼합재료 6은 0.111$\ell/\textrm{cm}^3$, 0.020$\ell/\textrm{cm}^3$로 나타났다. 3. 단일재료의 악취흡착성능 실험결과 암모니아는 코코넛, 소나무수피, 왕겨에서 흡착능력이 우수하게 나타났으며, 황화수소는 펄라이트, 왕겨, 소나무수피에서 다른 재료에 비하여 상대적으로 우수한 것으로 나타났으며, 혼합충진재는 암모니아의 경우 코코넛과 펄라이트의 비율이 70%:30%인 혼합재료 3번과 소나무수피와 펄라이트의 비율이 70%:30%인 혼합재료 6번에서 다른 혼합재료에 비하여 우수한 것으로 나타났으며, 황화수소의 경우 혼합재료에 따라 약간의 차이를 보였다. 4. 코코넛과 소나무수피의 경우 암모니아가스에 대한 흡착성능은 거의 비슷한 것으로 사료되며, 코코넛의 경우 전량을 수입에 의존하고 있다는 점에서 국내 조달이 용이하며, 구입 비용도 적게 소요되는 소나무수피를 사용하는 것이 경제적이라고 사료된다. 5. 마지막으로 악취제거 미생물균주를 접종한 소나무수피 70%와 펄라이트 30%의 혼합재료를 24시간동안 장기간 운전

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.145-145
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• 2008

High-k materials have been paid much more attention for their characteristics with high permittivity to reduce the leakage current through the scaled gate oxide. Among the high-k materials, $ZrO_2$ is one of the most attractive ones combing such favorable properties as a high dielectric constant (k= 20 ~ 25), wide band gap (5 ~ 7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2$/Si structure. During the etching process, plasma etching has been widely used to define fine-line patterns, selectively remove materials over topography, planarize surfaces, and trip photoresist. About the high-k materials etching, the relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Among several etching techniques, we chose the inductively coupled plasma (ICP) for high-density plasma, easy control of ion energy and flux, low ownership and simple structure. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. During the etching process, the wafer surface temperature is an important parameter, until now, there is less study on temperature parameter. In this study, the etch mechanism of $ZrO_2$ thin film was investigated in function of $Cl_2$ addition to $BCl_3$/Ar gas mixture ratio, RF power and DC-bias power based on substrate temperature increased from $10^{\circ}C$ to $80^{\circ}C$. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by scanning emission spectroscope (SEM). The chemical state of film was investigated using energy dispersive X-ray (EDX).

• The Journal of Natural Sciences
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• v.5 no.1
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• pp.67-75
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• 1992

In the our country, especially in Yeongil and Wolsung area, abundant authigenic zeolites are found from the tuffaceous sediments and volcanic rocks of Miocene age showing wide variation in their mineralogy and abundance from horizon to horizon. The principal zeolite species identified are clinopti-lolite. mordenite. heulandite. ferrierite, and erionite. etc. Zeolite minerals are widely used in many countries in the following applications; (a) in air separation adsorption processes; (b)as desiccants; (c)in inorganic building materials; (d)in papermaking; (e)in fertilizers; (f)as soilconditioners-this application is based upon the ability of the zeolite to ion exchange with soil nutrients; (g)in the treatment of radioactive wastes; and (h)as adsorbents for toxic gases, etc. In the present paper, using natural zeolite mordenite treated with IN hydrochloric acid or IN sodium chloride solution as column packings, separation characteristics of argon, nitrogen, carbon monoxide, and methane gases have been studied by gas chromatography. By the use of mordenite treated with hydrochloric acid solution, the tailing peak of methane showed from untreated mordenite was satisfactorily reduced, although it was difficult to separate it from carbon monoxide with a column activated at $300^{\circ}C$. Using a column activated at $350^{\circ}C$, methane could be separated from carbon monoxide easily but only carbon monoxide eluted as a bad defined peak. Mordenite treated with sodium chloride solution was generally similar to chromatograms obtained by using the untreated mordenite. Both the above chemical treatments of mordenite had little effect on the separations of argon and nitrogen. The separations and the HETP values obtained from natural zeolite mordenite treated with continuously hydrochloric acid and sodium chloride solutions were almost identical with those obtained with synthetic molecular sieve 5A zeolite. On the other hand, the efficiency of column was good in the range 20~3Oml/min of the carrier helium gas rate.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.323-329
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• 2000

In this study we have calculated an ideal complex refractive index of a TiN trim used in a layer of anl1reilecnon (I\R) coatmg, [air$ISiO_2ITiNIglass$] in the visible. Also we simulated the rellectance of lwo-layer AR coating by varying the thicknesses of TiN and $SiO_2$ layers, respecl1vely. The simolation results show that we can controllhe lowest reflectance and AR band of tile AR coating. The TIN fihns were fabricated by a RF magnetron sputtering apparalus. The chemical, structural and electrical properties of TiN fih11S were inveshgated by the Rutherford backscattering spech'oscopy (RBS), atomic force microscope (AFM) and 4-point probe. The optical properlies were inve,tigated by the spectrophotometer and vanable angle spectroscopic ellipsometer (VASE). The smface roughness of TiN flhns \vas $9~10\AA$. TIle resistivity of TiN films was TEX>$360~730\mu$\Omega $ cm. The ,toichlOllletry of TiN film was 1'1: O:N = I: 0.65 :0.95 and ilic oxygen wa~ found on ilie smface. With these experimental and simu]al1on resulLs, we deposited duo: two-layer AR coating, [air$ISiO_2ITiNIglass$] and the refleClance was under 0.5% ill the regIOn of 440-650 run. 0 run.

• Journal of the Korean Solar Energy Society
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• v.26 no.4
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• pp.55-61
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• 2006

Titanium oxide ($TiO_2$) films are deposited on the indium tin oxide (ITO) substrate in an $Ar/O_2$ atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of $TiO_2$ films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry Li+ interalation/deintercalation in $TiO_2$ films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure $TiO_2$ films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of $1.0\;{\times}\;10^{-2}\;torr$ and oxygen flow raes of $10{\sim}15\;sccm$, respectively.

• Proceedings of the KSME Conference
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• 2001.06e
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• pp.733-737
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• 2001

Heat generated from the electronic parts in PDP is undesirable physical properties. To attain optimal arrangement of the electronic parts in PDP, thermal flows in PDP should be analyzed. PIV measurement has been made to quantify the characteristics of the inner flows and outer flows of an actual PDP. The quantity of heat flux from PDP has been estimated using the PIV results. Measurement system consists of Ar-ion laser, CCD camera and an image grabber installed on a host computer.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.10 no.4
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• pp.449-455
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• 1998

A header' is the device that makes uniform flow distribution in all branches from header of heat exchangers, pipe burner or chemical equipments. In this study, experimental tests have been performed in order to investigate the flow distribution characteristics in a straight header and tapered header which have 6 and 11 glass pipe branches. The experimental equipment consists of a water circulation system where the fluid velocity in each glass pipe is measured by Ar-ion LDV system. From the experiments and the theoretical equation, it could be recommended that tapered header should be determined so that its internal velocities inside the header become uniform according to taper of the header and number of attached branches for uniform flow distribution in energy systems.

• Journal of the Korean Society of Industry Convergence
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• v.6 no.3
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• pp.253-259
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• 2003

An experimental study was performed for turbulent flow behind a circular and a square cylinder by using 2-D PIV(Particle Image Velocimetry) technique in a cylindrical tube. The Reynolds number investigated were 10,000, 30,000 and 50,000. The measuring system consists of CCD camera. Ar-ion laser, image grabber and a host computer. The mean velocity vector, time mean axial velocity, turbulent intensity and Reynolds shear stress were measured along the test tube. The results are compared each other for the circular and the square cylinder.

• Journal of the Korean Vacuum Society
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• v.2 no.3
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• pp.294-298
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• 1993

CuGaSe2 단결정을 고순도(99.9999%)의 Cu, Se 원소를 화학조성비로 칭량한 후 Se을 3mole% 과잉으로 첨가하여 합성된 ingot를 사용하여 iodine(99.9999%)을 수송매체로 한 화학수송법으로 성장시켰다. 성장된 단결정은 검정색을 띠고 있었으며, 10K에서 optical energy gap이 1.755eV로 주어졌다. Ar-ion laser로 여기시켜 측정한 photoluminescence(PL) 스펙트럼으로부터 1.667eV, 1.085eV, 1.025eV에 위치한 세 개의 PL peak를 얻었다. Thermally stimulated current(TSC) 측정에서 0.660eV, 0.720eV의 deep donor level을 관측하였으며, PL peak intensity의 thermal quenching으로 구한 activation energy는 0.010eV이었다. CuGaSe2 단결정에서 PL mechanism은 edge emission 및 donor-acceptor pair recombination임을 규명했다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.236-236
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• 2003

교환바이어스(exchange bias)현상은 강자성과 반강자성의 접합계면에서 강한 상호 교환결합력에 의해 발생하는 것으로 알려져 있다. 이 현상은 1956년 Meiklejohn과 Bean에 의해 CoO층으로 둘러싸인 Co 입자에서 발견된 이후[l], 강자성과 반강자성의 접합계면을 가지는 다층박막에서의 교환바이어스에 대한 연구가 진행되어왔다[2-6]. 이는 강자성/반강자성 박막의 교환바이어스 특성을 이용하여, 강자성 박막의 스핀방향을 고정시킬 수 있기 때문이다. 이러한 교환바이어스 특성은 하드드라이브의 고밀도 자기헤드소자 및 비휘발성 자기메모리소자에 응용되어지는 등 경제적 가치를 갖는 기술적인 면과 교환바이어스라는 자기특성의 학문적인 가치로 인해 이 분야에 대한 집중적인 투자와 연구가 이루어지고 있다. 최근에는 교환바이어스 현상의 원인과 형성기구에 대한 연구가 활발히 진행되고 있다. 그러나 강자성과 반강자성 박막의 단거리 상호 교환결합력에 의한 교환바이어스 현상은, 계면의 원자구조, 자기구조 및 각자성층의 여러 가지 인자들에 대해서 지속적으로 연구되고 있다.