• Composites Research
• /
• 제13권6호
• /
• pp.23-29
• /
• 2000

층상구조재료가 갖는 약점으로는 구성재료층 간의 열.기계적 특성 차이로 인하여 내부응력이 발생되고 비틀림 변형이 유발되어 형상 제어가 매우 어려울 뿐만 아니라, 반복적인 열 하중으로 인해 열이력을 받을 경우 접합부에서의 파손이 생길 수 있다는 것이다. 최근 층상구조에서 조직 혹은 조성이 점차적으로 변하는 계면을 삽입한 경사조성재료는 열.기계적 변형특성 차이에 의한 재료의 손상을 최소화시킬 수 있으나, 용도에 적합한 구조설계를 위해서 열.기계적 해석이 필요하다. 본 연구에서는 전자패키징용 $Al-SiC_p$ 경사조성 복합재료의 기하학적 구조와 온도변화에 따른 곡면화 변형 및 내부응력분포를 해석하고자 하였다. 한편 층상구조 $Al-SiC_p$ 경사조성 복합재료의 열변형량을 측정하고 내부응력분포를 실험적으로 구하여, 이론적으로 계산한 결과와 비교하였다. 본 연구의 해석결과는 경사조성 층상구조재료의 최적구조 설계에 유용하게 적용할 수 있다.

• 한국세라믹학회:학술대회논문집
• /
• 한국세라믹학회 2000년도 추계총회,초청강연,특별강연,연구발표회
• /
• pp.165.2-165
• /
• 2000

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2005년도 춘계학술대회
• /
• pp.196-200
• /
• 2005

In this work, we investigated simple Aㅣ/TCO/a-Si:H(n)/c-Si(p)/Al hetero-junction solar cells prepared by low temperature processes, unlike conventional thermal diffused c-Si solar cells. a-Si:H/c-Si hetero-junction solar cells are processed by low temperature deposition of n-type hydrogenated amorphous silicon (a-Si:H) films by plasma-enhanced chemical vapor deposition on textured and flat p-type silicon substrate. A detailed investigation was carried out to acquire optimization and compatibility of amorphous layer, TCO (ZnO:Al) layer depositions by changing the plasma process parameters. As front TCO and back contact, ZnO:Al and AI were deposited by rf magnetron sputtering and e-beam evaporation, respectively. The photovoltaic conversion efficiency under AMI.5 and the quantum efficiency on $1cm^2$ sample have been reported. An efficiency of $12.5\%$ is achieved on hetero-structure solar cells based on p-type crystalline silicon.

• 한국분말야금학회:학술대회논문집
• /
• 한국분말야금학회 1994년도 추계학술대회강연 및 발표대회 강연및 발표논문 초록집
• /
• pp.26-26
• /
• 1994

• 한국주조공학회지
• /
• 제17권4호
• /
• pp.347-355
• /
• 1997

It is well known that the coarse primary Si in hypereutectic Al-Si alloys deteriorate castability, machinability, and mechanical properties. So, many treatment has been tried to refine the primary Si increasing cooling rate and adding refinement agent. Therefore. the purpose of our work was the observation of the effect on the refinement of primary Si and the analysis of the trend to apply to the casting process by changing the amount of P addition and the cooling rate while fixing the temperature at $750^{\circ}C$ of P addition and the type of AlCuP. In the condition of amount of P addition was fixed, primary Si was finer as cooling rate increased but in case of cooling rate was fixed, the effect of refinement was resisted as incersed the amount of P addition. At a relatively slow cooling rate of $22^{\circ}C/sec$, refinement was governed by the amount of P addition rather than cooling rate. At elevated cooling rate of $51^{\circ}C/sec$ and $99^{\circ}C/sec$, the undercooling due to faster cooling rate promoted nucleation of primary Si rather than P addition more significantly.

• 대한전기학회논문지:전기물성ㆍ응용부문C
• /
• 제52권7호
• /
• pp.293-297
• /
• 2003

Silicon dioxide (SiO$_2$) layers were fabricated on Si$_3$N$_4$/SiO$_2$/Si layer structures by low pressure chemical vapor deposition (LPCVD). Potassium and aluminum were then coimplanted by implanting potassium ions with the energy of 100 ［keY］ and dose of 5x10$^{16}$ [cm￣$^2$］ and 1x10$^{17}$ [cm￣$^2$］ into an aluminum buffer layer on the SiO$_2$Si$_3$N4/SiO$_2$/Si structure. The pH, pNa, and pK ion sensitivities of the resulting layers were investigated and compared to those of as-deposited silicon dioxide layer. The pK-sensitivity of the silicon dioxide was enhanced by the K and Al coimplantation. On the contrary, the pH and pNa-sensitivities of the coimplanted silicon dioxides were quite lower than that of the as-deposited silicon dioxide.

• 한국세라믹학회지
• /
• 제24권1호
• /
• pp.23-32
• /
• 1987

Synthesis of high purity ultrafine Si3N4 and ${\beta}$-Sialon powders was investigated via the simultaneous reduction and nitriding of amorphous SiO2, SiO2-Al2O3 system prepaerd by hydrolysis of alkoxides, using carbonablack as a reducing agent. In Si(OC2H5)4-C2H5 OH-H2 O-NH4OH system, hydrolysis rate increased with increasing reaction temperature and pH. Pure ${\alpha}$-Si3N4 was formed at 1350$^{\circ}C$ for 5 hrs in N2 atmosphere. In Si(OC2H5)4-Al(OC3H7)3-C6H6-H2 O-NH4OH system, weight loss increased as Si/Al ratio decreased. Single phase ${\beta}$-Sialon consisted of Si/Al=2 was formed at 1350$^{\circ}C$ in N2 and minor phases of ${\alpha}$-Si3N4, AIN, and X-phase were existed besides theSialon phase at other Si/Al ratios. The Si3N4 and Sialon powders synthesized from alkoxides consisted of uniform find particles of 0.05-0.2$\mu\textrm{m}$ in diameter, respectively.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2009년도 하계학술대회 논문집
• /
• pp.195-196
• /
• 2009

This paper describes the fabrication and characteristics of polycrystalline 3C-SiC thin film diodes for extreme environment applications, in which the this thin film was deposited onto oxidized Si wafers by APCVD using HMDS In this work, the optimized growth temperature and HMDS flow rate were $1,100^{\circ}C$ and 8sccm, respectively. A Schottky diode with a Au, Al/poly 3C-SiC/$SiO_2$/Si(n-type) structure was fabricated and its threshold voltage ($V_d$), breakdown voltage, thickness of depletion layer, and doping concentration ($N_D$) values were measured as 0.84V, over 140V, 61nm, and $2.7{\times}10^{19}cm^2$, respectively. To produce good ohmic contact, Al/3C-SiC were annealed at 300, 400, and $500^{\circ}C$ for 30min under a vacuum of $5.0{\times}10^{-6}$Torr. The obtained p-n junction diode fabricated by poly 3C-SiC had similar characteristics to a single 3C-SiC p-n junction diode.

• 한국재료학회지
• /
• 제5권4호
• /
• pp.412-419
• /
• 1995

과공정 Al-18wt%Si합금의 초정 Si입자의 미세화에 미치는 첨가원소의 영향에 관하여 조사하였다. 초정 Si입자의 크기는 P량이 증가함에 따라 미세해졌으며 적정 P량은 40ppm이었다. 최적주입온도는 AlCuP, CuP 경우 각각 75$0^{\circ}C$, 80$0^{\circ}C$이었으며 미세화 처리 후 10분 이상 경과되어도 초정 Si입자의 크기는 변화가 없었다. 또한 WDS분석 결과 초정 Si내에 AIP가 핵생성 site로 존재함을 알 수 있었다.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 1993년도 춘계학술발표회
• /
• pp.95-97
• /
• 1993