• Title/Summary/Keyword: $\alpha$-${Si_3}{N_4

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Effect of Rapid Thermal Annealing on the Resistivity Changes of Reactively Sputtered Tungsten Nitride Thin Film (Sputtering법으로 제조된 Tungsten Nitride 박막의 저항변화에 미치는 급속 열처리 영향)

    • Korean Journal of Materials Research
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    • v.10 no.1
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    • pp.29-33
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    • 2000
  • The amorphous tungsten nitrides, WNx, film could be fabricated by reactive sputtering process. The nitrogen concentration for the amorphization ranges from 10 at% to 40at%. The amorphous $W_{67}N_{33}$ film was crystallized into low resistivity $\alpha$-tungsten phase with equiaxed grains and excess nitrogen after the rapid thermal annealing for 1min at 1273K, which was similar to the resistivity of the sputtered pure tungsten film. The excess nitrogen was depleted from $\alpha$-tungsten crystals and then segregated at $\alpha$-tungsten/poly-Si interface. The segregated nitrogen has favored the formation of the homogeneous diffusion barrier layer comprised of silicon nitride, $Si_3N_4$, nano-crystals, which undertaken the inhibition of the high resistivity tungsten silicide reaction.

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Growth and Structural Properties of Fe Thin Films Electrodeposited on n-Si(111) (n-Si(111) 기판 위에 전기증착에 의한 Fe 박막의 성장과 구조적 특성)

  • Kim Hyun-Deok;Park Kyeong-Won;Lee Jong-Duk
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.9
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    • pp.1663-1670
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    • 2006
  • Single crystal Fe thin films were grown directly onto n-Si(111) substrates by pulsed electrodeposition. Cyclic Voltammogram(CV) indicated that the $Fe^{2+}/n-Si(111)$ interface shows a good diode behavior by forming a Schottky barrier. From Mott-Schottky (MS) relation, it is found that the flat-band potential of n-Si(111) substrate and equilibrium redox potential of $Fet^{2+}$ ions are -0.526V and -0.316V, respectively. The nucleation and growth kinetics at the initial reaction stages of Fe/n-Si(111) substraste was studied by current transients. Current transients measurements have indicated that the deposition process starts via instantaneous nucleation and 3D diffusion limited growth. After the more deposition, the deposition flux of Fe ions was saturated with increase of deposition time. from the as-deposited sample obtained using the potential pulse of 1.4V and 300Hz, it is found that Fe nuclei grows to three dimensional(3D) islands with the average size of about 100nm in early deposition stages. As the deposition time increases, the sizes of Fe nuclei increases progressively and by a coalescence of the nuclei, a continuous Fe films grow on the Si surface. In this case, the Fe films show a highly oriented columnar structure and x-ray diffraction patterns reveal that the phase ${\alpha}-Fe$ grows on the n-Si(111) substrates.

Fabrication of Silicon Nitride Ceramics Using Semiconductor-Waste-Si Sludge (반도체 폐 Si 슬러지를 이용한 질화규소세라믹의 제조)

  • Lee, Byong-Taek;Yoo, Jung-Ho;Kim, Hai-Doo
    • Korean Journal of Materials Research
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    • v.9 no.12
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    • pp.1170-1175
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    • 1999
  • The microstructures and mechanical properties of $Si_3N_4$ ceramics produced by nitridation and post-sintering using semiconductor-waste-Si sludge were investigated. Lots of microcracks were observed in the waste-Si powders which contained some amounts of amorphous $SiO_2$. The nitridation rate of waste-Si compacts showed lower value than that of commercial Si powder compacts. The nitridation rate was increased with increasing nitridation temperature and then the percent of nitridation at 1470$^{\circ}C$ showed 98%. The phases of $Si_3N_4$ in the reaction-bonded bodies were mixed with ${\alpha}$ and ${\beta}$-type, and small amounts of $Si_2N_2O$ phase while those after post-sintering were ${\beta}$-$Si_3N_4$ and ${\alpha}$-Sialon. The sample post-sintered at 1950$^{\circ}C$ showed the fracture toughness of 5.6 $^MPa{\cdot}m^{1/2}$ and the fracture strength of 497 MPa which were lower than those of sintered body using commercial Si powder possibly due to the formation of ${\alpha}$-Sialon phase.

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Microstructures Of Continuously Porous SiC-Si3N4 Composites Fabricated Using Waste SiC Sludge (폐 SiC 슬러지를 이용하여 제조한 연속다공질 SiC-Si3N4 복합체의 미세조직)

  • Gain Asit Kumar;Lee Hee-Jung;Jang Hee-Dong;Lee Byong-Taek
    • Korean Journal of Materials Research
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    • v.15 no.3
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    • pp.177-182
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    • 2005
  • Large amounts of the waste SiC sludge containing small amounts of Si and organic lubricant were produced during the wire cutting process of the single silicon crystal ingots. The waste SiC sludge was purified by the washing process and the purified SiC powders were used to fabricate continuously porous $SiC-Si_3N_4$ composites using a fibrous monolithic process, in which carbon, $6wt\%\;Y_2O_3-2\;wt\%\;A1_2O_3$ and ethylene vinyl acetate were added as a pore-forming agent, sintering additives, and binder, respectively. In the burning-out process, carbon was fully removed and continuously porous $SiC-Si_3N_4$ composites were successfully fabricated. The green bodies containing SiC, Si particles and sintering additives were nitrided at $1410^{\circ}C$ in a flowing $N_2+10\%\;H_2$ gas mixture. Continuously porous composites were combined with SiC, ${\alpha}Si_3N_4,\;\beta-Si_3N_4$ and a few $\%$ of Fe phases. The pore size of the 2nd and the 3rd passed $SiC-Si_3N_4$ composites was $260\;{\mu}m$ and $35\;{\mu}m$ in diameter, respectively.

Separation of $H_2$/$N_2$ Gas Mixture by SiO$_2$-B$_2$O$_3$ Membrane (SiO$_2$-B$_2$O$_3$ 막에 의한 수소/질소 혼합기체 분리)

  • Kang Tae-Bum;Park Jin-Ho
    • Membrane Journal
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    • v.14 no.4
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    • pp.312-319
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    • 2004
  • The porous SiO$_2$-B$_2$O$_3$ membrane was prepared from Si(OC$_2$$H_5$)$_4$-($CH_3$O)$_3$B-C$_2$$H_5$OH-$H_2O$ system by sol-gel method. In order to investigate the characteristics of this membrane, we examined that using BET, IR spectrophotometer, X-ray diffractometer, SEM and TEM. At $700^{\circ}C$, the surface area of SiO$_2$-B$_2$O$_3$ membrane was 354.398 $m^2$/, the median pore diameter was 0.0048 ${\mu}{\textrm}{m}$, and the particle size of SiO$_2$-B$_2$O$_3$ membrane was 7 nm. The separation properties of the gas mixture ($H_2$/$N_2$) through the SiO$_2$-B$_2$O$_3$ membrane was studied as a function of pressure. The real separation factor($\alpha$) of SiO$_2$-B$_2$O$_3$ membrane for $H_2$/$N_2$ gas mixture was 4.68 at 155.15 cmHg and $25^{\circ}C$. The real separation factor($\alpha$), head separation factor($\beta$) and tail separation factor((equation omitted)) were increased as the pressure of permeation cell increased.

The Effect of Al2O3 addition on the Characteristics of Sintering Behavior, Phase Transformation and Mechanical Properties of Spark Plasma Sintered Si3N4 Ceramics (알루미나 첨가에 의한 질화규소의 방전 플라즈마 소결 거동과 상전이 특성 및 기게적 특성에 미치는 영향)

  • Chae, Jae-Hong;Kim, Dae-Gean;Kim, Kyoung-Hun;Park, Joo-Seok;Ahn, Jong-Pil;Sim, Kwang-Bo
    • Journal of the Korean Ceramic Society
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    • v.45 no.2
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    • pp.94-98
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    • 2008
  • Silicon nitride($Si_3N_4)$ is one of the most widely used structural ceramic materials. However silicon nitride is difficult to sinter because of its strong covalent bonding characteristics. In this study, $Si_3N_4$ ceramics were fabricated by spark plasma sintering process with $Y_2O_3$ and $Al_2O_3$ addition to improve the sinterability and the mechanical properties and their phase transformation behavior, microstructure and mechanical properties were evaluated. Fully densified $Si_3N_4$ ceramics could be obtained by spark plasma sintering process at a lower temperature than conventional sintering method. The formation of network microstructure was affected by the addition of $Al_2O_3$ because it could accelerate a to ${\alpha}$ to ${\beta}$ phase transformation of $Si_3N_4$. As a result, the mechanical properties depended on amounts of $Al_2O_3$ addition. The hardness value increased with increasing ${\alpha}$-phase fraction, but fracture toughness value increase with increasing ${\beta}$-phase fraction.

Preparation of α-Si3N4 Powder in Reaction System Containing Molten Salt by SHS - Part 2. Scale-Up (용융염계에서 자전연소합성법에 의한 α-Si3N4분말의 제조 - 2. 반응물의 증가)

  • Yun Ki Seok;Yang Beom Seok;Park Young Cheol;Won Cang Whan
    • Journal of the Korean Ceramic Society
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    • v.41 no.9
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    • pp.703-708
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    • 2004
  • The variation of the reaction pressure and reaction product during the reaction was investigated according to the total mass of the reaction mixture at the optimum composition for the preparation of u-Si3N4 powder which had been confirmed in the former investigation; 'Preparation of $\alpha$-Si$_3$N$_4$ powder in reaction system containing molten salt by SHS - part 1. synthesizing of powder'. When the total mass of the reaction mixture was 100g, the minimum pressure for a complete reaction was 60atm in 5L reactor, whereas the reaction was incomplete in the case that the mass exceeded 200g because of pressure increase. Also, as the mass of the reaction mixture increased, the reactivity linearly decreased. Hence, the complete reaction was realized by decreasing an initial $N_2$ pressure, and thus obtained minimum initial pressure was recorded 20 atm for the initial mixture of 500g. The reason of the incomplete reaction with pressure Increase was found to be that NH$_4$Cl vapour which was suppressed by the gas pressure acted as a diluent.

High-temperature Corrosion of CrAlSiN Films in Ar/1%SO2 Gas

  • Lee, Dong Bok;Xiao, Xiao;Hahn, Junhee;Son, Sewon;Yuke, Shi
    • Journal of the Korean institute of surface engineering
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    • v.52 no.5
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    • pp.246-250
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    • 2019
  • Nano-multilayered $Cr_{25.2}Al_{19.5}Si_{4.7}N_{50.5}$ films were deposited on the steel substrate by cathodic arc plasma deposition. They were corroded at $900^{\circ}C$ in $Ar/1%SO_2$ gas in order to study their corrosion behavior in sulfidizing/oxidizing environments. Despite the presence of sulfur in the gaseous environment, the corrosion was governed by oxidation, leading to formation of protective oxides such as $Cr_2O_3$ and ${\alpha}-Al_2O_3$, where Si was dissolved. Iron diffused outward from the substrate to the film surface, and oxidized to $Fe_2O_3$ and $Fe_3O_4$. The films were corrosion-resistant up to 150 h owing to the formation of thin ($Cr_2O_3$ and/or ${\alpha}-Al_2O_3$)-rich oxide layers. However, they failed when corroded at $900^{\circ}C$ for 300 h, resulting in the formation of layered oxide scales due to not only outward diffusion of Cr, Al, Si, Fe and N, but also inward movement of sulfur and oxygen.

Synthesis and Optical Properties of M-Si(Al)-O-N (M: Sr, Ca) Phosphors for white Light Emitting Diodes (백색 발광다이오드용 M-Si(Al)-O-N (M: Sr, Ca) 형광체의 합성 및 발광 특성)

  • Lee, Seung-Jae;Lee, Jun-Seong;Kim, Young-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.2
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    • pp.41-45
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    • 2012
  • Oxynitride green phosphors for white light emitting diodes (LEDs) were synthesized and their optical properties were evaluated. The N/O ratio ($\delta$) of $SrSi_2O_{2-{\delta}}N_{2+2/3{\delta}}:Eu^{2+}$ closely depended on the synthesizing conditions. The most excellent green emission (545 nm), which was assigned to the $5d{\rightarrow}4f$ transition of $Eu^{2+}$ ions, was achieved at the conditions of $1700^{\circ}C$, 5 mol% $Eu^{2+}$, and $H_2$ atmosphere. The well-developed $Ca-{\alpha}-SiAlON:Yb^{2+}$ particles with homogeneous size were obtained at m = 3 (n = 0.15) for the compound of $Ca_{0.5m-0.005}Yb_{0.005}Si_{12-(m+n)}Al_{m+n}O_nN_{16-n}$, resulting in the strong green emission at around 550 nm.

Synthesis of Si3N4 using Residual Organics Trapped in the Silica Gel by Sol-Gel Method (졸-겔법으로 제조된 실리카겔중의 잔류유기물을 이용한 $Si_3N_4$의 합성)

  • 김병호;신현호;이재영
    • Journal of the Korean Ceramic Society
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    • v.29 no.5
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    • pp.357-366
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    • 1992
  • Residual organics were considered as impurity in Sol-Gel method. The purpose of this study was to find the conditions to contain as much residual organics as possible in silica gel prepared from TEOS(tetraethylortho-silicate) by Sol-Gel method. Residual organics are to be expected to have reduction effect on synthesizing Si3N4 from silica gel. The results of this study are follows: 1) The maximum content of entrapped carbon was 19.8 wt.%(C/SiO2=0.25 wt.ratio) in silica gel synthesized under the conditions 1.5 fold mole water for incomplete hydrolysis, 2.5 fold mole phenol as a solvent and 0.1 fold mole HCl as a catalyst to TEOS. 2) Silica gel with organics entrapped by Sol-Gel method had a positive effect on the formation of Si3N4 compared with commercial silica gel. 3) Sintered body of synthesized $\alpha$-Si3N4 with Y2O3 and Al2O3 as additives at 175$0^{\circ}C$ in N2 atmosphere showed bending strength, 602$\pm$20 MPa and frature toughness 4.45$\pm$0.15 MPa.m1/2.

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