• 제목/요약/키워드: $\alpha$-${Si_3}{N_4

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Al2O3 + (Fe2O3, Al, Cr and Si) 소결 복합재료의 고온 부식 특성 (High-temperature corrosion properties of Al2O3 + (Fe2O3, Al, Cr and Si) mixed sintering materials)

  • 김민정;원성빈;봉성준;이동복;손인진
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 춘계학술발표회 논문집
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    • pp.170-171
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    • 2012
  • $Fe_2O_3$, Al, Cr과 Si 분말을 고 에너지 볼 밀링해서 나노분말을 제조한 후 고주파유도 가열 활성 연소합성 장치로 1분 이내의 짧은 시간에 합성 및 소결한 $Al_2O_3+4.65(Fe_{0.43}Cr_{0.17}Al_{0.323}Si_{0.077})$, $Al_2O_3$ + 5.33 ($Fe_{0.375}Cr_{0.11}Al_{0.3}Si_{0.075}$), $Al_2O_3$ + 6.15 ($Fe_{0.325}Cr_{0.155}Al_{0.448}Si_{0.072}$), $Al_2O_3$ + 3.3 ($Fe_{0.6}Cr_{0.3}Al_{0.6}$) 소결체 시편을 $700^{\circ}C$의 온도에서 100시간 동안 공기 중에서 산화 및 $N_2-H_20-H_2S$ 혼합 가스 내에서 황화 부식을 실시하였다. 그 결과 산화 및 황화 부식 후에 ${\alpha}-Al_2O_3$가 표면에 생성되어 보호 피막으로 작용하여 우수한 내식성을 보였다.

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$N_2/CH_4$가스비에 따른 Hydrogenated Amorphous Carbon Nitride 박막의 특성 (Hydrogeneted Amorphous Carbon Nitride Films on Si(100) Deposited by DC Saddle Field Plasma Enhanced Chemical Vapor Deposition)

  • 장홍규;김근식;황보상우;이연승;황정남;유영조;김효근
    • 한국진공학회지
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    • 제7권3호
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    • pp.242-247
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    • 1998
  • DC saddle-field-plasma-enhanced chemical-vapor deposition(PECVD) 장치를 이용 하여 상온에서 p-type Si(100)기판위에 hydrogenated amorphous carbon nitride [a-C:H(N)] 박막을 증착하였다. 원료가스인 $CH_4$$N_2$의 전체압력은 90mTorr로 고정하고 $N_2/CH_4$비를 0 에서 4까지 변화하면서 제작한 a-C:H(N)박막의 미세구조의 변화를 연구하였다. 진공조의 도달 진공도는 $1\times10^{-6}$Torr이고, 본 실험시 $N_2+CH_4$가스의 유량은 5sccm으로 고정하고 배 기량을 조절하여 진공조의 가스 압력을 90mTorr로 고정하였으며 기판에 200V의 직류 bias 전압을 인가하였다. $\alpha$-step과 X-ray photoelectron spectroscopy(XPS)를 이용한 분석결과 $N_2/CH_4$비가 0에서 0.5로 증가함에 따라 박막 두께는 4840$\AA$에서 2600$\AA$으로 급격히 감소하 였으며, 박막내의 탄소에 대한 질소함유량(N/C비)는 N2/CH4비가 4일 때 최대 0.25로 증가하 는 것을 확인하였다. 또한 XPS 스펙트럼의 fitting 결과 $N_2/CH_4$비가 증가할수록 CN결합이 증가하였다. Fourier Transformation Infrared(FT-IR) 분석결과 $N_2/CH_4$비가 증가함에 따라 박막내의 C-H결합은 감소하고, N-H, C≡N결합은 증가하였다. Optical bandgap 측정 결과 $N_2/CH_4$비가 0에서 4로 증가함에 따라 a-C:H(N)박막의 bandgap 에너지는 2.53eV에서 2.3eV 로 감소하는 것을 확인하였다.

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공명 핵반응을 이용한 수소적층 분석 (Hydrogen Depth Profiling by Nuclear Resonance Reaction)

  • 김영석;김준곤;홍완;김덕경;조수영;우형주;김낙배
    • 한국진공학회지
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    • 제2권4호
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    • pp.416-423
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    • 1993
  • Hydrogen depth profiling was performed by H(19F, $\alpha$${\gamma}$) nuclear resonance reactin . A cesium sputtering ion sorce and 1.7MV Tandem Van de Graaff accelerator was used for the production of 6.5MeV 19F ion. The ${\gamma}$ rays produced by the reaction were measure dby 3" $\times$3" and 6" $\times$8" Nal detectors . A test measurement was done for hydrogen contaminatin layer of a bare silicon wafer, Si3N4(H) and Zr(O)a-Si/Si for the purpose of verifying the applicability , detection limit and the reliability of the method.ility of the method.

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MOCVD growth of GaN and InGaN in a rotating-disk reactor

  • 문용태;김동준;김준형
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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    • pp.109-109
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    • 1998
  • 최근 들어 MOCVD 법으로 성장시킨 GaN, InGaN, AIGaN를 이용한 광소자 ( (LED, LD)와 전자소자(FET, MODFET)에 대한 관심이 고조되면서, MOCVD 법 을 이용한 GaN 중심의 질화물 반도체 성장에 관심이 집중되고 있다. 금번 실험에 사용된 MOCVD 장비는 수직형 MOCVD 장비이다. 특히, wafer c carner를 1$\alpha$)() rpm이상의 고속으로 회전시킬 수 있는 장치로서 원료 가스의 반웅 기 내에서의 흐름을 균일하게 하여 uniformity가 높은 질화물 반도체를 성장시킬 수 있다 .. GaN 에피충은 c-plane 사파이어를 기판으로 하여 11 00 "C 이상의 고온 에서 수소를 이용하여 기판을 cleaning하고, 500 "C 부근에서 핵생성충올 성장시 킨 후 1050 "C에서 trimethylgallium(TMGa)과 NI-h를 이용하여 성장시켰다. n n -GaN를 성장시키기 위해서는 SiH4을 사용하였으며, InGaN의 경우는 t trimethylindium(TMIn)을 In원 료 가스로 하여 635 - 725 "C 범 위 에 서 성 장시 켰 다. 성 장된 undoped GaN, n-GaN, InGaN는 X -ray di잔raction(XRD), H떠l m measurement, Photoluminescence(PU동올 이용하여 결정성과 전기적 및 광학적 특성올 고찰하였다 .. 2ttm 두께로 성장된 undoped G값V박막의 경우 Hall 측정결과 6 6 X lOI6/e며 정도의 낮은 도핑 농도를 보였으며, V!lII ratio(2500 - 5000)증가에 따라 결정성이 향상됨을 GaN (102)면의 X -ray e -rocking분석올 통하여 확인하 였다 .. n-GaN의 경우 SiH4양올 3 - 13 sccm으로 증가시킴에 따라 n -type 도명농 도가 선형적으로 증가하였고, 1017/c며 범위 내로 도평이 된 경우 상온에서 300 e마 N Ns 이상의 high mobility를 얻올 수 있었다 .. PL 관측 결과로부터 Si 도핑으로 인 하여 GaN bandedge emission이 강화됨을 알 수 있었다 .. InGaN 박막의 경우 성 장온도를 낮춤에 따라서 m의 양을 증가시킬 수 있었다. 또한 유량비(TMIn I T TMGa)가 1에 가까운 경 우에서도 온도를 635 "C 정도로 낮훈 경우 410 nm정도에 서 PL bandedge peak올 얻을 수 있었으며, 이 때의 반치폭은 50 meV정도의 낮 은 값을 보였다. 반치폭은 50 meV정도의 낮 은 값을 보였다.

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MEASUREMENT OF THE D-D NEUTRON GENERATION RATE BY PROTON COUNTING

  • Kim, In-Jung;Jung, Nam-Suk;Choi, Hee-Dong
    • Nuclear Engineering and Technology
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    • 제40권4호
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    • pp.299-304
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    • 2008
  • A detection system was set up to measure the neutron generation rate of a recently developed D-D neutron generator. The system is composed of a Si detector, He-3 detector, and electronics for pulse height analysis. The neutron generation rate was measured by counting protons using the Si detector, and the data was crosschecked by counting neutrons with the He-3 detector. The efficiencies of the Si and He-3 detectors were calibrated independently by using a standard alpha particle source $^{241}Am$ and a bare isotopic neutron source $^{252}Cf$, respectively. The effect of the cross-sectional difference between the D(d,p)T and $D(d,n)^3He$ reactions was evaluated for the case of a thick target. The neutron generation rate was theoretically corrected for the anisotropic emission of protons and neutrons in the D-D reactions. The attenuations of neutron on the path to the He-3 detector by the target assembly and vacuum flange of the neutron generator were considered by the Monte Carlo method using the MCNP 4C2 code. As a result, the neutron generation rate based on the Si detector measurement was determined with a relative uncertainty of ${\pm}5%$, and the two rates measured by both detectors corroborated within 20%.

New Boron Compound, Silicon Boride Ceramics for Capturing Thermal Neutrons (Possibility of the material application for nuclear power generation)

  • Matsushita, Jun-ichi
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.15-15
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    • 2011
  • As you know, boron compounds, borax ($Na_2B_4O_5(OH)_4{\cdot}8H_2O$) etc. were known thousands of years ago. As for natural boron, it has two naturally occurring and stable isotopes, boron 11 ($^{11}B$) and boron 10 ($^{10}B$). The neutron absorption $^{10}B$ is included about 19~20% with 80~81% $^{11}B$. Boron is similar to carbon in its capability to form stable covalently bonded molecular networks. The mass difference results in a wide range of ${\beta}$ values between the $^{11}B$ and $^{10}B$. The $^{10}B$ isotope, stable with 5 neutrons is excellent at capturing thermal neutrons. For example, it is possible to decrease a thermal neutron required for the nuclear reaction of uranium 235 ($^{235}U$). If $^{10}B$ absorbs a neutron ($^1n$), it will change to $^7Li+^1{\alpha}$ (${\alpha}$ ray, like $^4He$) with prompt ${\gamma}$ ray from $^{11}B$ $^{11}B$ (equation 1). $$^{10}B+^1n\;{\rightarrow}\;^{11}B\;{\rightarrow}\; prompt \;{\gamma}\;ray (478 keV), \;^7Li+4{\alpha}\;(4He)\;\;\;\;{\cdots}\; (1)$$ If about 1% boron is added to stainless steel, it is known that a neutron shielding effect will be 3 times the boron free steel. Enriched boron or $^{10}B$ is used in both radiation shielding and in boron neutron capture therapy. Then, $^{10}B$ is used for reactivity control and in emergency shutdown systems in nuclear reactors. Furthermore, boron carbide, $B_4C$, is used as the charge of a nuclear fission reaction control rod material and neutron cover material for nuclear reactors. The $B_4C$ powder of natural B composition is used as a charge of a control material of a boiling water reactor (BWR) which occupies commercial power reactors in nuclear power generation. The $B_4C$ sintered body which adjusted $^{10}B$ concentration is used as a charge of a control material of the fast breeder reactor (FBR) currently developed aiming at establishment of a nuclear fuel cycle. In this study for new boron compound, silicon boride ceramics for capturing thermal neutrons, preparation and characterization of both silicon tetraboride ($SiB_4$) and silicon hexaboride ($SiB_6$) and ceramics produced by sintering were investigated in order to determine the suitability of this material for nuclear power generation. The relative density increased with increasing sintering temperature. With a sintering temperature of 1,923 K, a sintered body having a relative density of more than 99% was obtained. The Vickers hardness increased with increasing sintering temperature. The best result was a Vickers hardness of 28 GPa for the $SiB_6$ sintered at 1,923K for 1 h. The high temperature Vickers hardness of the $SiB_6$ sintered body changed from 28 to 12 GPa in the temperature range of room temperature to 1,273 K. The thermal conductivity of the SiB6 sintered body changed from 9.1 to 2.4 W/mK in the range of room temperature to 1,273 K.

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백색 엘이디 디스플레이를 위한 형광체 재료 기술 (Inorganic Phosphor Materials for White LED Display)

  • 이정일;류정호
    • 융복합기술연구소 논문집
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    • 제4권1호
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    • pp.21-27
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    • 2014
  • White LEDs (light-emitting diodes) are promising new-generation light sources which can replace conventional lamps due to their high reliability, low energy consumption and eco-friendly effects. This paper briefly reviews recent progress of oxy/nitride host phosphor and quantum dot materials with broad excitation band characteristics for phosphor-converted white LEDs. Among oxy/nitride host materials, $M_2Si_5N_8:Eu^{2+}$, $MAlSiN_3:Eu^{2+}$ M-SiON(M=Ca, Sr, Ba), ${\alpha}/{\beta}-SiAlON:Eu^{2+}$ are excellent phosphors for white LED using blue-emitting chip. They have very broad excitation bands in the range of 440-460 nm and exhibit emission from green to red. In this paper, In this review we focus on recent developments in the crystal structure, luminescence and applications of the oxy/nitride phosphors for white LEDs. In addition, the application prospects and current trends of research and development of quantum dot phosphors are also discussed.

α-SiC-WC 電導性 세라믹 複合體의 特性에 미치는 無加壓 Annealing 溫度 (Effect of Pressurless Annealing Temperature on the Properties of α-SiC-WC Electroconductive Ceramic Composites.)

  • 신용덕;주진영
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권5호
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    • pp.242-242
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    • 2004
  • The composites were fabricated 61 vol.%α-α-SiC and 39vol.% WC powders with the liquid forming additives of 12wt% Al₂O₃+Y₂O₃ by pressureless annealing at 1700, 1800, 1900℃ for 4 hours. The result of phase analysis of composites by XRD revealed α-SiC(2H), WC, and YAG($Al_5Y_3O_{12}$) crystal phase. The relative density, the flexural strength, fracture toughness and Young′s modulus showed respectively the highest value of 99.4%, 375.76㎫, 5.79㎫ㆍ$m^{\frac{1}{2}}$, and 106.43㎬ for composite by pressureless annealing temperature 1900℃ at room temperature. The electrical resistivity showed the lowest value of 1.47×$10^{-3}$/Ω·㎝ for composite by pressureless annealing temperature 1900℃ at 25℃. The electrical resistivity of the α-SiC-WC composites was all positive temperature cofficient resistance (PTCR) in the temperature ranges from 25℃ to 500℃.

나노결정질 다이아몬드가 코팅된 SiC 마모시험기 볼 (Nanocrystalline Diamond Coated SiC Balls in Tribometer)

  • 임종환;강찬형
    • 한국표면공학회지
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    • 제47권5호
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    • pp.263-268
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    • 2014
  • Nanocrystalline diamond(NCD) coated SiC balls were applied in a ball-on-disk tribometer. After seeding in an ultrasonic bath containing nanometer diamond powders, $2.2{\mu}m$ thick NCD films were deposited on sintered 3 mm diameter SiC balls at $600^{\circ}C$ in a 2.45 GHz microwave plasma CVD system. Bare $ZrO_2$ and SiC balls were prepared for comparison as test balls. Tribology tests were performed in air with pairs of three different balls and mirror polished steel(SKH51) disk. The wear tracks on balls and disks were examined by optical microscope and alpha step profiler. Under the load of 3 N, the friction coefficients of steel against $ZrO_2$, SiC and NCD-coated balls were between 0.4 and 0.8. After a few thousands sliding laps, the friction coefficient of NCD-coated balls dropped from 0.45 to below 0.1 and maintained thereafter. Under a higher load of 10 N or 20 N with a long sliding distance of 2 km, $ZrO_2$ and SiC balls exhibited the similar friction coefficients as above. The friction coefficient of NCD-coated balls was less than 0.1 from the beginning and increased to above 0.1 steadily or with some fluctuations as sliding distance increased. NCD coating layers were found worn out after long duration and/or high load sliding test, which resulted in the friction coefficient higher than 0.1.

The Influence of Bcl-3 Expression on Cell Migration and Chemosensitivity of Gastric Cancer Cells via Regulating Hypoxia-Induced Protective Autophagy

  • Hu, Lin;Bai, Zhigang;Ma, Xuemei;Bai, Nan;Zhang, Zhongtao
    • Journal of Gastric Cancer
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    • 제20권1호
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    • pp.95-105
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    • 2020
  • Purpose: Gastric cancer is a highly metastatic malignant tumor, often characterized by chemoresistance and high mortality. In the present study, we aimed to investigate the role of B-cell lymphoma 3 (Bcl-3) protein on cell migration and chemosensitivity of gastric cancer. Materials and Methods: The gastric cancer cell lines, AGS and NCI-N87, were used for the in vitro studies and the in vivo studies were performed using BALB/c nude mice. Western blotting, wound healing assay, Cell Counting Kit-8 assay, immunohistochemistry, and terminal deoxynucleotidyl transferase dUTP nick end labeling assay were used to evaluate the role of Bcl-3 in gastric cancer. Results: We found that the protein expression of hypoxia (HYP)-inducible factor-1α and Bcl-3 were markedly upregulated under hypoxic conditions in both AGS and NCI-N87 cells in a time-dependent manner. Interestingly, small interfering RNA-mediated knockdown of Bcl-3 expression affected the migration and chemosensitivity of the gastric cancer cells. AGS and NCI-N87 cells transfected with si-RNA-Bcl-3 (si-Bcl-3) showed significantly reduced migratory ability and increased chemosensitivity to oxaliplatin, 5-fluorouracil, and irinotecan. In addition, si-Bcl-3 restored the autophagy induced by HYP. Further, the protective role of si-Bcl-3 on the gastric cancer cells could be reversed by the autophagy inducer, rapamycin. Importantly, the in vivo xenograft tumor experiments showed similar results. Conclusions: Our present study reveals that Bcl-3 knockdown inhibits cell migration and chemoresistance of gastric cancer cells through restoring HYP-induced autophagy.