• 한국자기공명학회논문지
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• 제16권1호
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• pp.78-90
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• 2012

To understand the electronic structure of $[NiS_4]^-$ complex ions, two complexes with such $[NiS_4]^-$ core, $FcCH=CHPymCH_3[Ni(dmit)_2]$ (Pym = pyridinium, $dmit^{2-}$ = 2-thioxo-1,3-dithiole-4,5-dithiolate) and $FcCH=CHPymCH_3[Ni(dddt)_2]{\cdot}{\frac{1}{2}}H_2O$ ($dddt^{2-}=5,6-dihydro-1,4-dithiin-2,3-dithiolato$), were synthesized to be characterized by X-ray crystallography, single crystal electron paramagnetic resonance (EPR) and density functional theory (DFT) calculation. Powder EPR spectra show narrow g-anisotropy but the anisotropy is bigger in $[Ni(dmit)_2]^-$ than in $[Ni(dddt)_2]^-$, indicating bigger spin density in Ni(III) d-orbital of $[Ni(dmit)_2]^-$ than in $[Ni(dddt)_2]^-$, which is consistent to DFT results. EPR studies of the crystals of the complexes surprisingly suggest that the $g_y$-axis of $[Ni(dddt)_2]^-$ is approximately on or perpendicular to the $[NiS_4]^-$ plane while the $g_y$-axis of $[Ni(dmit)_2]^-$ is on the plane, though DFT study of the complexes of this study and previously reported $[NiS_4]^-$ complexes indicate that the $g_y$-axis is on the $[NiS_4]^-$ plane.

• 한국세라믹학회지
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• 제37권4호
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• pp.381-387
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• 2000

Si3N4/stainless steel 316 joints with Ni buffer layer were fabricated by direct active brazing method (DIB) using Ag-Cu-Ti brazing alloy only and double brazing method (DOB) using Ag-Cu brazing alloy with Si3N4 pretreated with Ag-Cu-Ti brazing alloy. For the joint brazed by DIB method, Ti was segregated at the Si3N4/brazing alloy interface, but was not enough to form a stable joint interface. In addition, large amounts of Ni-Ti inter-metallic compounds were formed in tehbrazing alloy near the joint interface, which could deplete the contents of Ti involved in the interfacial reaction. However, for the joint brazed by DOB method, segregation of Ti at the joint interface were enough to enhance the formation of stable interfacial reaction products such as TiN and Ti-Si-Ni-N-(Cu) multicompounds, which restricted the formation of Ni-Tio inter-metallic compounds in the brazing alloy during brazing with Ni buffer layer. Fracture strength of Si3N4/S.S 316 joints with Ni buffer layer was much improved by using DOB method rather than DIB method. It could be deduced that the differences of fracture strength of the joint with Ni buffer layer depending on brazing process adapted were directly affected by the formation of stable joint interface and the change in microstructure of the brazing alloy near the joint interface. It was found that fracture strength of Si3N4/S.S 316 joints with Ni buffer layer was gradually reduced as the thickness of interface. It was found that fracture strength of Si3N4/S.S 316 joints with Ni buffer layer was gradually reduced as the thickness of Ni buffer layer in the joint was increased from 0.1 mm to 10 mm. It seems to due to the increased residual stress in the joint as the thickness of Ni buffer layer is increased. The maximum fracture strength of Si3N4/S.S 316 joints with Ni buffer layer was 386 MPa, and the fracture of joint was originated at Si3N4/brazing alloy joint interface and propagated into Si3N4 matrix.

• Journal of Magnetics
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• 제4권4호
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• pp.128-130
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• 1999

We have measured the magnetization of Ni/Ag(Ni at %)/Ni (50$\AA$/30 $\AA$/50 $\AA$) trilayered films including Ni atoms inserted in non-magnetic Ag spacer. The magnetization as a function of applied field at 5 K and as a function of temperature at 100 Oe were investigated respectively using SQUID magnetometer. In these measurements peaks of magnetization at some critical temperatures were observed in all the samples. The antiferromagnetic coupling energy between neighboring Ni layers showed oscillatory behaviors according to the amounts of the Ni atoms inserted in Ag spacer. Loose spin model suggested by slonczews야 was used to explain such results.

• 대한화학회지
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• 제31권4호
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• pp.334-343
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• 1987

$NiL_m{^{2+}}$착이온 {$Ni(rac-1[14]7-diene)^{2+},\;Ni(meso-1[14]7-diene)^{2+},\;Ni(1[14]4-diene)^{2+},\;{\alpha}-Ni(rac-[14]-decane)^{2+},\;{\beta}-Ni(rac-[14]-decane)^{2+},\;and\;Ni(meso-[14]-decane)^{2+}$}과 $CN^-$이온 사이의 화학반응은 분광광도법으로 연구하였다. $NiL_m{^{2+}}$착이온과 $CN^-$이온으로부터 1:1착이온, $[NiLm(CN)]^+$생성반응의 평형상수$(K_1)$는 3 ~ $25^{\circ}C$ 범위에서 결정되었다. $NiL_m{^{2+}}$착이온이 $Ni(rac-1[14]7-diene)^{2+},\;Ni(meso-1[14]7-diene)^{2+},\;Ni(1[14]4-diene)^{2+},\;{\alpha}-Ni(rac-[14]-decane)^{2+},\;{\beta}-Ni(rac-[14]-decane)^{2+}$, 그리고 $Ni(meso-[14]-decane)^{2+}$일때 평형상수($K_1$)은 $15^{\circ}C$에서 각각 4.7, 5.3, 6.2, 7.5, 9.4, 및 9.8이었다. $K_1$값은 온도가 증가함에 따라 감소하였다. $K_1$에 대한 온도영향으로 부터 열역학적 파라메터 $({\Delta}G^{\circ},\;{\Delta}H^{\circ},\;{\Delta}S^{\circ})$를 계산하였으며, 이 결과 $[NiLm(CN)]^+$ 생성반응은 모두 발열반응으로 나타났다. $NiL_m{^{2+}}$ 착이온과 $CN^-$이온은 반응하여 Ni(CN)_4{^{2-}}$이온과 거대고리 리간드 (Lm)가 생성된다. $[CN^-],\;[HCN],\;and\;[OH^-]$ 변화에 따라 $Ni(CN)_4{^{2-}}$이온의 생성속도는 0.5M $NaClO_4$, 온도 3∼$25^{\circ}C$ 범위에서 연구되었다. $[CN^-]$가 일정할 때 [HCN]가 증가하면 $k_{obs}/[CN^-]^2$값은 선형으로 증가하였다. $OH^-$ 이온이 과량으로 존재할 때 [$OH^-$]에 따라 역시 $k_{obs}/[CN^-]^2$ 값은 선형으로 증가하였다. $NiL_m{^{2+}}$ 착이온과 $CN^-$이온 반응의 속도상수($k_{obs}$)에 대한 온도영향으로 부터 활성화 파라메터$({\Delta}H^{\neq},\;{\Delta}S^{\neq})$를 결정하였다. $Ni(rac-1[14]7-diene)^{2+},\;Ni(meso-1[14]7-diene)^{2+},\;{\alpha}-Ni(rac-[14]-decane)^{2+},\;{\beta}-Ni(rac-[14]-decane)^{2+}$, 그리고 $Ni(meso-[14]-decane)^{2+}$ 순서로 d-d 전이에너지, $ν(cm^{-1})$가 감소할수록, ${\Delta}H^{\neq}$도 점차적으로 감소하였다. 그리고 5가지의 $NiL_m{^{2+}}$ 착이온과 $CN^-$이온 사이의 반응은 동일한 경로로 반응이 진행되었다.

• Journal of Welding and Joining
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• 제13권4호
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• pp.147-154
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• 1995

In order to study the bonding mechanism of Ni/B/Ni transient liquid phase bonding system, width of liquid layers were calculated, where in this system melting point of insert material(B) is higher than bonding temperature and melting point of base metal(Ni). Caclulated values were compared with experimental ones which were measured by bonding Ni/B/Ni system at 1433-1474K under vacuum atmosphere. As results, the width of initial liquid layer of Ni/B/Ni system was calculated as $W_{IL}$ = $W_{o}$[1 + {2.100..rho.$_{S/}$ ( $X_{3}$ + $X_{4}$)..rho.$_{Ni}$ }-.rho.$_{S/}$.rho. Ni/], and it was nearly same with experimental values. Maximum width of liquid layer, width of liquid layer during isothermal solidification and isothermal solidification time were calculated also.o.o.o.

• 대한화학회지
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• 제45권3호
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• pp.242-246
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• 2001

사성분계 thiophosphates, $A_2NiP_2S_6>(A=Rb$, Cs)를 halide fluxes 법으로 합성하였으며 단결정 X-ray 회절방법으로 결정 구조를 해석하였다. 이 화합물들을 $C_{2h}^5-P2_1/n$ 의 공간군을 가지며, $Rb_2NiP_2S_6$의 경우 a=5.960(2), b=12.323(4), $c=7.491(3)\AA$, $\beta=97.05(3)^{\circ}$, $V=546.0(3)\AA^3$이고$Cs_2NiP_2S_6$의 경우 a=5.957(4),b=12.696(7), $c=7.679(4)\AA$, $\beta=93.60(5)^{\circ}$, $V=579.7(5)\AA^3$인 격자상수를 갖는다. 이 두화합물은 동일한 결정 구조를 갖는다. 이들의 구조는 결정학적인 a축을 따라 성장한 1차원적인 무한사슬 $_{\infty}^1[NiP_2S_6^{2-}]$로 구성되어 있으며 이 사슬들은 알칼리 금속과의 정전기적 인력을 통하여 안정화 되어있다. Ni원자는 6개의 S원자에 의해 팔면체 배위를 하고 있고, Ni$S_6$팔면체는 $[P_2S_6^{4-}]$ 음이온 3개의 $\mu-S$ 원자들에 의해 연결되어 무한 1차원적인 사슬을 형성한다. $Cs_2NiP_2S_6$에 대한 자화율 측정결과 Neel temperature($T_N$)에 상응하는 8K 이하에서 superexchange를 통한 반자기성 magnetic coupling을 발견하였다. $T_N$이상의 온도에서는 Curie-Weiss법칙을 따른다. 자기 모멘트, C(Curie), 그리고 $\theta$(Weiss Constant)는 각각 2.77 B.M., 0.9593K, 그리고 -19.02K 이다. 측정 결과로부터 얻은 유효 자기 모멘트는 spin-only $Ni^{2+}d^8$(2.83 B.M.)계의 결과와 일치한다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권10호
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• pp.495-499
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• 2004

Characteristics of ohmic Ni/Si/Ni contacts to n-type 4H-SiC are investigated systematically. The ohmic contacts were formed by annealing Ni/Si/Ni sputtered sequentially The annealings were performed at 950℃ using RTP in vacuum ambient and N₂ ambient, respectively. The specific contact resistivity(p/sub c/), sheet resistance(R/sub s/), contact resistance (R/sub c/) transfer length(L/sub T/) were calculated from resistance(R/sub T/) versus contact spacing(d) measurements obtained from TLM(transmission line method) structure. While the resulting measurement values of sample annealed at vacuum ambient were p/sub c/ = 3.8×10/sup -5/Ω㎠, R/sub c/ = 4.9 Ω and R/sub T/ = 9.8 Ω, those of sample annealed at N₂ ambient were p/sub c/ = 2.29×10/sup -4/Ω㎠, R/sub c/ = 12.9 Ω and R/sub T/ = 25.8 Ω. The physical properties of contacts were examined using XRD 3nd AES. The results showed that nickel silicide was formed on SiC and Ni was migrated into SiC. This result indicates that Ni/Si/Ni ohmic contact would be useful in high performance electronic devices.

• 원예과학기술지
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• 제32권4호
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• pp.434-439
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• 2014

이 연구는 야파 처리 시간대가 살비아 'Salsa'의 영양생장 및 개화에 미치는 영향을 조사하고, 저광도 야파 처리가 광합성을 증가시킬 수 있는지 알아보고자 수행되었다. 살비아는 9시간의 단일조건 또는 9시간 일장에 $3-5{\mu}mol{\cdot}m^{-2}{\cdot}s^{-1}$의 광도의 야파를 추가한 조건의 식물 생육상에서 재배되었고, 야파 처리는 18시-22시(NI18), 22시-02시(NI22), 02시-06시(NI02)의 세 구간으로 나누어 적용되었다. NI18, NI22, NI02 처리구에서 광합성은 야파 처리 시간 동안에 각각 0.33, 0.16, $0.13{\mu}mol{\cdot}CO_2{\cdot}m^{-2}{\cdot}s^{-1}$만큼 증가하였다. 하지만 엽폭, 엽장 등의 영양생장은 단일 조건하의 식물들과 유의성 있는 차이를 나타내지 못하였다. 야파 처리 시 개화까지 걸리는 시간은 9.8일 단축되었고, 17주간 야파 처리 시 꽃의 수는 단일 조건의 36.4개에 비해 NI02 처리구에서 138.7개로 증가하였다. 이러한 결과는 02시부터 06시까지의 야파 처리가 개화를 촉진하는 데에 가장 효과적이라는 것을 보여준다. 그러나 야파 처리 시간 동안에 증가한 광합성량은 살비아의 영양생장 증가에는 효과를 보이지 못하였다. 비록 야파 처리 동안의 미미한 광합성의 증가가 살비아의 영양생장을 증가시키지는 못하였지만, 개화에는 크게 영향을 미쳤다. 단일 조건에서는 44.4%만이 개화하였지만 8주간 야파 처리시 NI18, NI22, NI02 처리구에서는 각각 77.8, 88.9, 100.0% 개화하였다.

• Journal of Magnetics
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• 제6권4호
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• pp.145-147
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• 2001

The effect of interface roughness between [Ni/Mn] superlattice and pinned NiFe layer on magnetoresistance (MR) of [Ni/Mn] superlattice-based spin valve films was investigated. Antiferromagnetic phase structure and interface roughness of [Ni/Mn] superlattice spin valve films were compared in the as-deposited and the annealed samples at 240$\^{C}$, respectively. Surface morphology of spin valves was substantially flattened due to the formation of the antiferromatic NiMn phase. In case of Co insertion between Cu and NiFe, the interlace roughness and MR ratio in the annealed [NiMn] superlattice and pinned NiFe/Co layer increased more than those in the annealed [Ni/Mn] superlattice and pinned NiFe layers respectively.

• 한국수소및신에너지학회논문집
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• 제14권4호
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• pp.298-304
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• 2003

The thermal behavior of $NiFe_2O_4$ prepared by a solid-state reaction was investigated for $H_2$ generation by the thermochemical cycle. The reduction of $NiFe_2O_4$ started from $800^{\circ}C$, and the weight loss was 0.2-0.3 wt% up to $1000^{\circ}C$. In the $H_2O$ decomposition reaction, $H_2$ was generated by oxidation of reduced $NiFe_2O_4$. The crystal structure of $NiFe_2O_4$ maintained during the redox reaction of 5 cycles. From this observation, the lattice oxygen in $NiFe_2O_4$ is released without the structural change during the thermal reduction and oxygen deficient $NiFe_2O_4$ can be restored to the spinel structure of $NiFe_2O_4$.