Journal of Surface Science and Engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Effect of various seed layers on the formation of self-organized nano structure

다양한 시드층이 자기조립화된 나노 구조체 형성에 미치는 영향

  • Dong-Hyun Kim (Department of Materials Engineering, Kwangwoon University) ;
  • Jun-Pyo Lee (Department of Materials Engineering, Kwangwoon University) ;
  • Joon-Seok Heo (Department of Materials Engineering, Kwangwoon University) ;
  • Masao Kamiko (Institute of Industrial Science, The University of Tokyo) ;
  • Keita Ito (Institute for Materials Research,Tohoku University) ;
  • Takeshi Seki (Institute for Materials Research,Tohoku University) ;
  • Jae-Geun Ha (Department of Materials Engineering, Kwangwoon University)
  • Received : 2024.05.07
  • Accepted : 2024.07.11
  • Published : 2024.10.31
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Abstract

Using DC magnetron sputtering, we deposited a bilayer composed of a seed layer consisting of Ti, Cr, Co, and Zr, and an overlayer of Ag on MgO(001) single crystal substrates, creating self-assembled nanostructures. When Ti was used as the seed layer, it was observed that the formed nano-dots inherently aggregated into dot shapes. Additionally, Cr, Co, and Zr were chosen to investigate their influence on SLAA(Seed layer Assisted Agglomeration) depending on the seed layer material, revealing different shapes of the formed nano-dots. Moreover, it was observed that aggregation was inhibited as the thickness of the seed layer exceeded a critical point. X-ray diffraction analysis of the Ti seed layer revealed epitaxial growth of Ag along the (001) direction of the MgO substrate. In contrast, no epitaxial growth was observed when Cr, Co, and Zr were used as seed layer materials. Ultimately, Ti was identified as the most suitable seed layer material for the fabrication of self-assembled nanostructures utilizing the aggregation phenomenon of the bilayer. This research is deemed sufficiently valuable in addressing the limitations associated with the low productivity and high cost of current nano thin film processes.

Keywords

Acknowledgement

이 연구는 2023년도 광운대학교 연구년에 의하여 연구되었으며, 이에 감사드립니다.

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