Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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RF Generator Design for High-quality Power at Light Load

  • Hee Sung Shin (Myongji University, Department of Electronic Engineering) ;
  • Shin Ui Lee (Myongji University, Department of Electrical Engineering) ;
  • Kyung Hyun Lim (Myongji University, Department of Electrical Engineering ) ;
  • Euihoon Chung (Myongji University, Department of Electrical Engineering )
  • Received : 2024.06.05
  • Accepted : 2024.06.21
  • Published : 2024.06.30
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Abstract

To generate the plasma required in dry cleaning processes, the plasma chamber must be supplied with a high-quality AC voltage with a voltage of more than 1 kV and a frequency of 400 kHz. In the existing research, many methods to supply high power have been studied, but how to improve the quality of the power for high-quality plasma has been relatively little studied. In this paper, we propose a study to improve the quality of RF power circuit for high-quality plasma generation in dry cleaning method. Existing methods in the environment of full-bridge-based RF power circuits must perform PWM duty control in the light load region. This causes distortions in the waveform, resulting in poor power quality, which directly leads to poor plasma quality. To solve these problems, a half-bridge switching method is proposed and the improvement in waveform quality is verified. To verify the feasibility of the design and control algorithm proposed in this paper, an RF power circuit prototype is fabricated and the proposed design and control method is verified through simulation and actual experiments under dummy load.

Keywords

Acknowledgement

This research was supported by the Korea Institute for Advancement of Technology (KIAT) under the 2024 InterMinistry Collaboration Semiconductor Major Track Project (G02P1880000 5502).

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