과제정보
본 논문은 교육부의 재원으로 한국연구재단의 BK21 FOUR 사업, 2022학년도 한국기술교육대학교 교수교육연구진흥과제 및 2023년도 교육부의 재원으로 한국연구재단의 지원을 받아 수행된 지자체-대학 협력기반 지역혁신 사업.(2022RIS-004)의 결과입니다.
참고문헌
- K. Ishibashi, K. Hirata, and N. Hosokawa, "Mass spectrometric ion analysis in the sputtering of oxide targets", Journal of Vacuum Science & Technology A., 10, Iss. 4, pp. 1718-1722 (1992). https://doi.org/10.1116/1.577776
- K. Tominaga, T. Udea, T. Ao, A. Katkoka, and I. Mori, "ITO films prepared by facing target system", Thin Solid Films, 281-282, pp. 194-197 (1996). https://doi.org/10.1016/0040-6090(96)08611-7
- Y. Hoshi, H. Kato, and K. Funatsu, "Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering", Thin Solid Films, 445, pp. 245-250 (2003). https://doi.org/10.1016/S0040-6090(03)01182-9
- Radhouane Bel Hadj Tahar, Takayuki Ban, Yutaka Ohya, and Yasutaka Takahashi, "Tin doped indium oxide thin films: Electrical properties", J. Appl. Phys., 83, pp. 2631-2645 (1998). https://doi.org/10.1063/1.367025
- Tania Konry, Robert S. Marks, "Physico-chemical studies of indium tin oxide-coated fiber optic biosensors", Thin Solid Films, 492, pp. 313-321 (2005). https://doi.org/10.1016/j.tsf.2005.07.049
- Takafumi Aoi, Nobuto Oka, Yasushi Sato, Ryo Hayashi, Hideya Kumomi and Yuzo Shigesato. "DC sputter deposition of amorphous indium-gallium-zinc-oxide(a-IGZO) films with H2O introduction", Thin Solid Films, 518, pp. 3004-3007 (2010). https://doi.org/10.1016/j.tsf.2009.09.176
- H. Hosono, "Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application", Journal of non-crystalline solids, 352, pp.851-858 (2002). https://doi.org/10.1016/j.jnoncrysol.2006.01.073
- K. Nomura, T. Kamita and H. Hosono, "Effects of diffusion of hydrogen and oxygen on electrical properties of amorphous oxide semiconductor, In-Ga-Zn-O", ECS J Solid State Sci. Technol. 2, pp. 5-8 (2013).
- L. Raniero, I. Ferreira, A. Pimentel, A. Goncalves, P. Canhola, E. Fortunato, and R. Martins, "Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings," Thin Solid Films, Vol. 511-512, pp. 295- 298 (2006). https://doi.org/10.1016/j.tsf.2005.12.057
- S. K. Kwon and K. M. Lee, "Electrical and Optical Characteristics of IZO Thin Films Deposited in Different Oxygen Flow Rate", Journal of the Semiconductor & Display Technology, Vol. 12, pp. 49-54 (2013).
- N. Ito, Y. Sato, P.K. Song, A. Kaijio, K. Inoue, and Y. Shigesato, "Electrical and optical properties of amorphous indium zinc oxide films", Thin Solid Films, 496(1), pp.99-103 (2006). https://doi.org/10.1016/j.tsf.2005.08.257
- S. I. Hann and H. B. Kim, "A Study on Properties of RF-sputtered Al-doped ZnO Thin Films Prepared with Different Ar Gas Flow Rates," Appl. Sci. Converg. Technol. 25(6), pp. 145-148 (2016). https://doi.org/10.5757/ASCT.2016.25.6.145
- K. L. Hong and K. M. Lee, "Effect of Substrate Temperature and Gas Flow Rate of Atmosphere Gases on Structural and Electrical Properties of AZO Thin Film," Journal of the Semiconductor & Display Technology, 20, pp. 1-6 (2021).
- K. K. Banger, Y. Yamashita, K. Mori, R. L. Peterson, T. Leedham, J. Rickard, and H. Sirringhaus, "Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a 'sol-gel on chip' process", Nature Materials, 10, pp. 45-50 (2011). https://doi.org/10.1038/nmat2914
- Y. S. Jung, J. Y. Seo, D. W. Lee, and D. Y. Jeon, "Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film", Thin Solid Films, 445, pp.63-71(2003). https://doi.org/10.1016/j.tsf.2003.09.014