Journal of Surface Science and Engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Enhancements of Crystallization and Opto-Electrical performance of ZnO/Ti/ZnO Thin Films

ZnO/Ti/ZnO 박막의 결정성 및 전기광학적 완성도 개선 연구

  • Jin-Kyu Jang (School of Materials Science and Engineering, University of Ulsan) ;
  • Yu-Sung Kim (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Yeon-Hak Lee (School of Materials Science and Engineering, University of Ulsan) ;
  • Jin-Young Choi (School of Materials Science and Engineering, University of Ulsan) ;
  • In-Sik Lee (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Dae-Wook Kim (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Byung-Chul Cha (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Young-Min Kong (School of Materials Science and Engineering, University of Ulsan) ;
  • Daeil Kim (School of Materials Science and Engineering, University of Ulsan)
  • 장진규 (울산대학교 첨단소재공학부) ;
  • 김유성 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 이연학 (울산대학교 첨단소재공학부) ;
  • 최진영 (울산대학교 첨단소재공학부) ;
  • 이인식 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 김대욱 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 차병철 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 공영민 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2023.02.22
  • Accepted : 2023.03.23
  • Published : 2023.04.30
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Abstract

Transparent ZnO (100 nm thick) and ZnO/Ti/ZnO (ZTZ) films were prepared with radio frequency (RF) and direct current (DC) magnetron sputtering on the glass substrate at room temperature. During the ZTZ film deposition, the thickness of the Ti interlayer was varied, such as 6, 9, 12, and 15 nm, while the thickness of ZnO films was kept at 50 nm to investigate the effect of the Ti interlayer on the crystallization and opto-electrical performance of the films. From the XRD pattern, it is concluded that the 9 nm thick Ti interlayer showed some characteristic peaks of Ti (200) and (220), and the grain size of the ZnO (002) enlarged from 13.32 to 15.28 nm as Ti interlayer thickness increased. In an opto-electrical performance observation, ZnO single-layer films show a figure of merit of 1.4×10-11 Ω-1, while ZTZ films with a 9 nm-thick Ti interlayer show a higher figure of merit of 2.0×10-5 Ω-1.

Keywords

Acknowledgement

본 논문은 한국생산기술연구원 기관주요사업 "IMO대응 LNG선박 극저온 연료탱크 스마트 제조 기술개발(4/6)(JA-23-0003)"의 지원으로 수행한 연구입니다.

References

  1. M. Yahya, M. R. Fadavieslam, The effects of argon plasma treatment on ITO properties and the performance of OLED devices, Optical Mater., 120 (2021) 111400. 
  2. D. Kim, Improved electrical and optical properties of GZO films with a thin TiO2 buffer layer deposited by RF magnetron sputtering, Ceram. Inter., 40 (2014) 1457-1460.  https://doi.org/10.1016/j.ceramint.2013.07.029
  3. S. H. Choe, S. B. Heo, J. K. Jang, H. J. Kim, J, W. Choi, D. Kim, Effect of electron irradiation on the optical and electrical properties of TIO/Ag/TIO films, J. Korean Soc. Manuf. Technol. Eng., 30 (2021) 410-414. 
  4. S. H. Choe, J. K. Jang, H. J. Kim, J. W. Choi, S. B. Heo, Y. S. Kim, Y. M. Kong, D. Kim, Influence of Ag interlayer thickness on the optical, electrical and mechanical properties of Ti-doped In2O3/Ag/Ti-doped In2O3 multilayer flexible transparent conductive electrode, Kor. J. Met. Mater., 59 (2021) 545-550.  https://doi.org/10.3365/KJMM.2021.59.8.545
  5. W. Zhao, Q. Zhou, X. Zhang, X. Wu, A study on Ti-doped ZnO transparent conducting thin films fabricatedby pulsed laser deposition, Appl. Surf. Sci., 305 (2014) 481-486.  https://doi.org/10.1016/j.apsusc.2014.03.119
  6. Y. Park, S. Choe, Y. Kim, B. Cha, Y. Gong, D. Kim, Influence of Au interlayer thickness on the opto-electrical properties of ZnO thin films, J. Kor. Inst. Surf. Eng., 53 (2020) 104-108. 
  7. B. D. Cullity, Elements of X-ray diffraction, Addison-Wesley Pub. Co., Boston (1978). 
  8. Y. S. Kim, J. H. Park, D. H. Choi, H. S. Jang, D. Kim, ITO/Au/ITO multilayer thin films for transparent conducting electrode applications, Appl. Surf. Sci., 254 (2007) 1524-1527.  https://doi.org/10.1016/j.apsusc.2007.07.080
  9. S. Peng, T. Yao, Y. Yang, K. Zhang, J. Jiang, K. Jin, G. Li, Y. Wang, Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature, Physica B., 503 (2016) 111-116.  https://doi.org/10.1016/j.physb.2016.09.027
  10. J. Tauc, Amorphous and liquid semiconductor, Plenum, New York (1974). 
  11. Y. H. Song, T. Y. Eom, S. B. Heo, D. Kim, Effect of post-deposition rapid thermal annealing on the electrical and optical properties of ZTO/Ag/ZTO tri-layer thin films, J. Korean. Soc. Heat Treat., 30 (2017) 151-155.