Acknowledgement
AFM 헤드를 장착할 수 있도록 도움을 주신 (주)파크시스템스의 한승호 박사님께 감사드립니다.
References
- E. W. Mueller, "Field Emission Microscopy," in Physical Methods in Chemical Analysis, W. G. Berl, Ed. (Academic Press Inc., NY, USA, 1956), Vol. 3, pp. 135-181.
- R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 1st ed. (North-Holland Publishing, Amsterdam, Netherlands, 1987).
- S. Y. Kim, Ellipsometry (Ajou University, Suwon, Korea, 2000).
- H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (John Wiley & Sons, Japan, 2007).
- K. Vedam, P. J. McMarr, and J. Narayan, "Nondestructive depth profiling by spectroscopic ellipsometry," Appl. Phys. Lett. 47, 339-341 (1985). https://doi.org/10.1063/1.96156
- J. Narayan, S. Y. Kim, K. Vedam, and R. Manukonda, "Formation and nondestructive characterization of ion implanted silicon-on-insulator layers," Appl. Phys. Lett. 51, 343-345 (1987). https://doi.org/10.1063/1.98435
- S. Y. Kim and K. Vedam, "Simultaneous determination of dispersion relation and depth profile of thorium fluoride thin film by spectroscopic ellipsometry," Thin Solid Films 166, 325-334 (1988). https://doi.org/10.1016/0040-6090(88)90394-X
- C.-S. Jun, "차세대 반도체 device 개발과 생산을 위한 측정 검사 기술," in Proc. 2019 Next Generation Lithography Conference (Incheon, Korea, Aug. 21-23, 2019).
- C. Wang, X. Chen, C. Chen, S. Sheng, L. Song, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Reconstruction of finite deep subwavelength nanostructures by Mueller-matrix scattered-field microscopy," Opt. Express 29, 32158-32168 (2021). https://doi.org/10.1364/OE.432611
- S. J. Kim, H. K. Yoon, M. H. Lee, S. J. In, S. Y. Cho, Y. H. Kwon, B. K. Kim, D. H. Bae, J. H. Shin, and S. Y. Kim, "Development and evaluation of micro spot spectroscopic ellipsometer," in Proc. 8th International Conference on Spectroscopic Ellipsometry (Barcelona, Spain, May 26-31, 2019) p. 152.
- S. J. Kim, M. H. Lee, and S. Y. Kim, "Development of a microspot spectroscopic ellipsometer using reflective objectives, and the ellipsometric characterization of monolayer MoS2," Curr. Opt. Photonics 4, 353-360 (2020).
- S. Y. Kim, "Design of a free-form Mueller matrix ellipsometer with imperfect compensators," Korean J. Opt. Photon. 33, 59-66 (2022).
- J. Lee, P. I. Rovira, I. An, and R. W. Collins, "Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth," Rev. Sci. Instrum. 69, 1800-1810 (1998). https://doi.org/10.1063/1.1148844
- I. An, J. A. Zapien, C. Chen, A. S. Ferlauto, A. S. Lawrence, and R. W. Collins, "Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer," Thin Solid Films 455-456, 132-137 (2004). https://doi.org/10.1016/j.tsf.2003.11.221
- J. Opsal, J. Fanton, J. Chen, J. Leng, L. Wei, C. Uhrich, M. Senko, C. Zaiser, and D. E. Aspnes, "Broadband spectral operation of a rotating-compensator ellipsometer," Thin Solid Films 313-314, 58-61 (1998). https://doi.org/10.1016/S0040-6090(97)00769-4
- T. Mori and D. E. Aspnes, "Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system," Thin Solid Films 455-456, 33-38 (2004). https://doi.org/10.1016/j.tsf.2003.12.037
- S. Y. Cho, S. J. Kim, M. H. Lee, and S. Y. Kim, "편광자 연속회전 광량측정법과 Incomplete Fourier Transformation을 적용한 실시간 분광타원계의 개발," in Proc. OSK Annual Meeting (Hoengseong, Korea, Feb. 20-22, 2019), paper F1A-II-1.