Acknowledgement
2021년도 정부 (과학기술정보통신부)의 재원으로 한국연구재단- 현장맞춤형 이공계 인재양성 지원사업의 지원을 받아 수행된 연구임(No. NRF2019H1D8A1105567)
References
- S. Y. Chun, A comparative study of TiN coatings deposited by DC and pulsed DC asymmetric bipolar sputtering, J. Kor. Inst. Surf. Eng., 44 (2011) 179-184. https://doi.org/10.5695/JKISE.2011.44.5.179
- S. Y. Chun, J. W. Beak, A comparative study of CrN coatings deposited by DC and asymmetric bipolar pulsed DC sputtering, J. Kor. Inst. Surf. Eng., 47 (2014) 86-92. https://doi.org/10.5695/JKISE.2014.47.2.086
- S. Y. Chun, S. Y. Lee, Effect of inductively coupled plasma on the microstructure, structure and mechanical properties of VN coatings, J. Kor. Inst. Surf. Eng., 49 (2016) 376-381. https://doi.org/10.5695/JKISE.2016.49.4.376
- C. M Natarajan, M. G Tanner, R. H Hadfield, Superconducting nanowire single-photon detectors: physics and applications, Supercond. Sci. Technol., 25 (2012) 063001. https://doi.org/10.1088/0953-2048/25/6/063001
- D. K. Nandi, U. K. Sen, D. Choudhury, S. Mitra, S. K. Sarkar, Atomic layer deposited molybdenum nitride thin film: A Promising anode material for Li ion batteries, ACS Appl. Mater. Interfaces, 6 (2014) 6606-6615. https://doi.org/10.1021/am500285d
- M. Kozejova, V, Latyshev, V. Kavecansky, H. You, S. Vorobiov, A. Kovalcikova, V. Komanicky, Valuation of hydrogen evolution reaction activity of molybdenumnitride thinfilms on their nitrogen content, Electrochim. Acta, 315 (2019) 9-16. https://doi.org/10.1016/j.electacta.2019.05.097
- N. Haberkorn, S. Bengio, S. Suarez, P.D. Perez, M. Sirena, J. Guimpel, Effect of the nitrogen-argon gas mixtures on the superconductivity properties of reactively sputtered molybdenum nitride thin films, Mater. Lett., 215 (2018) 15-18, https://doi.org/10.1016/j.matlet.2017.12.045
- T. Wang, Y. Jin, L. Bai, G. Zhan, Structure and properties of NbN/MoN nano-multilayer coatings deposited by magnetron sputtering, J. Alloys Compd., 729 (2017) 942-948. https://doi.org/10.1016/j.jallcom.2017.09.218
- M. Kommera, T. Subeb, A. Richtera, M. Fenkera, W. Schulzb, B. Haderb, J.Albrecht, Enhanced wear resistance of molybdenum nitride coatings deposited by high power impulse magnetron sputtering by using micropatterned surfaces, Surf. Coat. Tech., 333 (2018) 1-12. https://doi.org/10.1016/j.surfcoat.2017.10.071
- F. Ge, P. Zhu, F. Meng, Q. Xue, F. Huang, Achieving very low wear rates in binary transition-metal nitrides: The case of magnetron sputtered dense and highly oriented MoN coatings, Surf. Coat. Technol., 248 (2014) 81-90. https://doi.org/10.1016/j.surfcoat.2014.03.035
- S. Y. Chun, Effect of inductively coupled plasma on the microstructure, structure and mechanical properties of NbN coatings, J. Kor. Inst. Surf. Eng., 48 (2015) 205-210. https://doi.org/10.5695/JKISE.2015.48.5.205
- S. Y. Chun, A comparative study of superhard TiN coatings deposited by DC and inductively coupled plasma magnetron sputtering, J. Kor. Inst. Surf. Eng., 46 (2013) 55-60. https://doi.org/10.5695/JKISE.2013.46.2.055
- T. H. Kima, G. Y. Yeom, A review of inductively coupled plasma-assisted magnetron sputter system, Appl. Sci. Converg. Technol., 28 (2019) 131-138. https://doi.org/10.5757/asct.2019.28.5.131
- I. Jauberteau, A. Bessaudou, R. Mayet, J. Cornette, J. L. Jauberteau, P. Carles, T. M. Mejean, Molybdenum nitride films: Crystal structures, synthesis, mechanical, electrical and some other properties, Coatings, 5 (2015) 656-687. https://doi.org/10.3390/coatings5040656
- D. J. Kestera, R, Messier, Macro-effects of resputtering due to negative ion bombardment of growing thin films, J. Mater. Res., 8 (1993) 1928-1937. https://doi.org/10.1557/JMR.1993.1928
- H. Jang, S. Y. Chun, Microstrcture and mechanical properties of HfN films deposited by dc and inductively coupled plasma assisted magnetron sputtering, J. Kor. Inst. Surf. Eng., 53 (2020) 67-71. https://doi.org/10.5695/JKISE.2020.53.2.67