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Direct Energy Deposition of Mo Powder Prepared by Electrode Induction Melting Gas Atomization

  • Goo-Won Roh (Hanyang University, Department of Materials Science and Engineering) ;
  • Eun-Soo Park (Research and Development Center, Eloi Materials Lab (EML) Co. Ltd.) ;
  • Jaeyun Moon (University of Nevada, Department of Mechanical Engineering) ;
  • Hojun Lee (Seoul National University of Science and Technology, Department of Materials Science and Engineering) ;
  • Jongmin Byun (Seoul National University of Science and Technology, Department of Materials Science and Engineering)
  • Published : 20210000

Abstract

Molybdenum (Mo) is used to form a barrier layer for metal wiring in displays or semiconductor devices. Recently, researches have been continuously attempted to fabricate Mo sputtering targets through additive manufacturing. In this study, spherical Mo powders with an average particle size of about 37 um were manufactured by electrode induction melting gas atomization. Subsequently, Mo layer with a thickness of 0.25 mm was formed by direct energy deposition in which the scan speed was set as a variable. According to the change of the scan speed, pores or cracks were found in the Mo deposition layer. Mo layer deposited with scan speed of 600 mm/min has the hardness value of 324 Hv with a porosity of approximately 2%. We demonstrated that Mo layers with higher relative density and hardness can be formed with less effort through direct energy deposition compared to the conventional powder metallurgy.

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Acknowledgement

This study was supported by the Research Program funded by the SeoulTech (Seoul National University of Science and Technology).