Acknowledgement
This study was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT, and Future Planning (2017R1A2B2012514), and the KIST Institutional Program (2 V08170).
References
- M. Altissimo, E-beam lithography for micro-nanofabrication. Biomicrofluidics 4(2), 026503 (2010)
- W. Ehrfeld, H. Lehr, Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics. Radiat. Phys. Chem. 45(3), 349-365 (1995)
- S. Jesse, Q. He, A.R. Lupini, D.N. Leonard, M.P. Oxley, O. Ovchinnikov, et al., Atomic-level sculpting of crystalline oxides: toward bulk nanofabrication with single atomic plane precision. Small 11(44), 5895-5900 (2015)
- G. Lee, S.Y. Moon, J. Kim, S.-H. Baek, D.H. Kim, H.W. Jang, et al., Electron beam induced epitaxial crystallization in a conducting and insulating a-LaAlO3/SrTiO3 system. RSC Adv. 7(64), 40279-40285 (2017)
- M.D. Levenson, N. Viswanathan, R.A. Simpson, Improving resolution in photolithography with a phase-shifting mask. IEEE Trans. Electron Devices 29(12), 1828-1836 (1982)
- S.Y. Moon, C.W. Moon, H.J. Chang, T. Kim, C.-Y. Kang, H.-J. Choi, et al., Comprehensive study on critical role of surface oxygen vacancies for 2DEG formation and annihilation in LaAlO3/SrTiO3 heterointerfaces. Electron. Mater. Lett. 12(2), 243-250 (2016)
- B. Song, G.F. Schneider, Q. Xu, G. Pandraud, C. Dekker, H. Zandbergen, Atomic-scale electron-beam sculpting of near-defect-free graphene nanostructures. Nano Lett. 11(6), 2247-2250 (2011)
- A.A. Tseng, K. Chen, C.D. Chen, K.J. Ma, Electron beam lithography in nanoscale fabrication: recent development. IEEE Trans. Electron. Packaging Manuf 26(2), 141-149 (2003)
- F. Watt, A. Bettiol, J. Van Kan, E. Teo, M. Breese, Ion beam lithography and nanofabrication: a review. Int. J. Nanosci. 4(03), 269-286 (2005)