Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Mechanochemistry on Self-Assembled Monolayer(SAM) /Electrodes after Contacting with Polymeric Stamp

고분자물질과 접촉한 자기조립단분자막 전극 물질의 기계화학 현상 분광학적 연구

  • Yun, Changsuk (Department of Advanced Materials Chemistry, Korea University)
  • 윤창석 (신소재화학과, 고려대학교 세종캠퍼스)
  • Received : 2020.10.24
  • Accepted : 2020.10.29
  • Published : 2020.10.31
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Abstract

We investigated mechanochemical radical, which is concomitant with chemical lift-off lithography(CLL), on the self-assembled monolayer(SAM)/electrodes and a polydimethylsiloxane(PDMS) using a colorimetric and a spectroscopic method. The 11-mercaptoundecanol(MUO)/Au or the 11-hydroxyundecylphosphonic acid (HUPA)/ITO were contacted with bare or activated PDMS. After contact, the each of SAM/substrates and the PDMS were immersed in a 2,2 Diphenyl-1-picrylhydrazyl(DPPH) radical scavenger. The color of the DPPH exposed to the PDMS was changed from purple to yellow and the absorbance decreased definitely at 515 nm wavelength. The SAM/substrates, however, have caused small changes in spectroscopic property, indicating no existence of radical species. We concluded that mechanochemical radicals were formed by homolytic cleavage of PDMS molecules upon external force and hardly transferred on the SAM/substrates.

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References

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