그림 1. 열처리 온도에 따른 HfO2 박막의 XRD 패턴 Fig. 1 XRD patterns of the HfO2 thin films with various RTA temperatures
그림 2. 열처리 온도에 따른 HfO2 박막의 반가폭과 결정 크기 Fig. 2 FWHM and Crystallite size of HfO2 thin films with various RTA temperatures
그림 3. 열처리 온도에 따른 AFM 표면 형상과 표면 거칠기 Fig. 3 AFM images and surface roughness of HfO2 thin films with various RTA temperatures
그림 4. 열처리 온도에 따른 HfO2 박막의 투과도와 반사도 Fig. 4 Optical transmittance and reflectance of the HfO2 thin films with various RTA temperatures
그림 5. 셀마이어 분산식에 의해 피팅된 600℃에서 열처리 한 HfO2 박막의 굴절률 Fig. 5 Refractive index of HfO2 thin film annealed at 600℃, fitted by Sellmeier dispersion equation
그림 6. 열처리 온도에 따른 파장 632nm 에서의 HfO2 박막의 굴절률 Fig. 6 Refractive index of HfO2 thin films at 632 nm of wavelength with various RTA temperatures
그림 7. 열처리 온도에 따른 HfO2 박막의 충진율 Fig. 7 Packing density of HfO2 thin films with various RTA temperatures
표 1. HfO2 박막의 증착조건 Table 1. Deposition conditions for the HfO2 thin films
표 2. 셀마이어 분산 관계식으로부터 계산된 변수 A와 B 값 Table 2. Calculated coefficients A and B of Sellmeier dispersion formula
참고문헌
-
C. Y. Ma, W. J. Wang, C. Y. Miao, S. L. Li, and Q. Y. Zhang, "Structural, morphological, optical and photoluminescence properties of
$HfO_2$ thin films," Thin Solid Films, vol. 545, no. 31, Aug. 2013, pp. 279-284. https://doi.org/10.1016/j.tsf.2013.08.068 -
Y. Joung and S. Kang, "Effects of working pressure on structural and optical properties of
$HfO_2$ thin films," J. of the Korea Institute of Electronic Communication Science, vol. 12, no. 6, Dec. 2017, pp. 1019-1026. https://doi.org/10.13067/JKIECS.2017.12.6.1019 -
F. L. Martinez, M. Toledano-Luque, J. J. Gandia, J. Carabe, W. Bohne, J. Rohrich, E. Strub, and I. Martil, "Optical properties and structure of
$HfO_2$ thin films grown by high pressure reactive sputtering," J. Phys. D : Appl. Phys., vol. 40, no. 17, Aug. 2007, pp. 5256-5265. https://doi.org/10.1088/0022-3727/40/17/037 - J. M. Khoshman, A. Khan, and M. E. Kordesch, "Amorphous hafnium oxide thin films for antireflection optical coatings," Surf. Coat. Technol., vol. 202, no. 11, Feb. 2008, pp. 2500-2502. https://doi.org/10.1016/j.surfcoat.2007.07.095
-
G. Dai, Y. Chen, J. Lu, Z. Shen, and X. Ni, "Analysis of laser induced thermal mechanical relationship of
$HfO_2/SiO_2$ high reflective optical thin film at 1064nm," Chin. Opt. Lett., vol. 77, no. 7, Sept. 2009, pp. 601-604. -
W. Liu, Z. Liu, F. Yan, T. Tan, and H. Tian, "Influence of
$O_2$ /Ar flow ratio on the structure and optical properties of sputtered hafnium dioxide thin films," Suf. Coat. Technol., vol. 205, no. 7, Sept. 2010, pp. 2120-2125. https://doi.org/10.1016/j.surfcoat.2010.08.116 - M. F. Al-Kuhaili, "Optical properties of hafnium oxide thin films and their application in energy-efficient windows," Opt. Mater., vol. 27, no. 3, Oct. 2004, pp. 383-387. https://doi.org/10.1016/j.optmat.2004.04.014
- Y. K. Kuo and C. C. Lin, "Micro light emitting device prepared from sputter deposited thin hafnium oxide film," Solid-State Electronics, vol. 89, Aug. 2013, pp. 120-123. https://doi.org/10.1016/j.sse.2013.07.013
- K. K. Bharathi, N. R. Kalidindi, and C. V. Ramana, "Grain size and strain effects on the optical and electrical properties of hafnium oxide nanocrystalline thin films," J. Appl. Phys., vol. 108, no. 8, Oct. 2010, pp. 083529-1-5. https://doi.org/10.1063/1.3499325
- S. Kang and Y. Joung, "Influence of substrate temperature on the optical and piezoelectric properties of ZnO thin films deposited by rf magnetron sputtering," Appl. Surf. Sci., vol. 253, issue 17, Mar. 2007, pp. 7330-7335. https://doi.org/10.1016/j.apsusc.2007.03.020
-
J. Ni, Q. Zhou, Z. Li, and Z. Zhang, "Oxygen defect induced photoluminescence of
$HfO_2$ thin films," Appl. Phys. Lett., vol. 93, no. 2, July 2008, pp. 011905-1-3. https://doi.org/10.1063/1.2952288 - A. Monshi, M. R. Foroughi, and M. R. Monshi, "Modified Scherrer equation to estimate more accurately nano-crystallite size using XRD," World J. of Nano Science and Engineering, vol. 2, issue 3, Sept. 2012, pp. 154-160. https://doi.org/10.4236/wjnse.2012.23020
-
R. Puthenkovilakam, Y. S. Lin, J. Choi, J. Lu, H. O. Blom, P. Pianetta, D. Devine, M. Sendler, and J. P. Chang, "Effects of post-deposition annealing on the material characteristics of ultrathin
$HfO_2$ films on silicon," J. Appl. Phys., vol. 97, no. 2, Dec. 2005, pp. 023704-1-7. https://doi.org/10.1063/1.1831543 - W. L. Bragg and A. B. Pippard, "The form birefringence of macromolecules," Acta. Cryst., vol. 6, no. 11-12, July 1953, pp. 865-867. https://doi.org/10.1107/S0365110X53002519
- S. Ben Amor, B. Rogier, G. Baud, M. Jacquet, and M. Nardin, "Characterization of zirconia films deposited by r.f. magnetron Sputtering," Mater. Sci. Eng. B, vol. 57, no. 1, Dec. 1998, pp. 28-39. https://doi.org/10.1016/S0921-5107(98)00205-0