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대기압 플라즈마의 진화: 웨어러블 전극과 표면 처리로의 활용

  • Published : 2019.12.31
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References

  1. I Adamovich et al., J. Phys. D: Appl. Phys. 50, 323001 (2017). https://doi.org/10.1088/1361-6463/aa76f5
  2. A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn and R.F. Hicks., IEEE Trans Plasma Sci. 26, 1685 (1998). https://doi.org/10.1109/27.747887
  3. V. I. Gibalov and G. J. Pietsch, J. Phys. D: Appl. Phys. 33, 2618 (2000). https://doi.org/10.1088/0022-3727/33/20/315
  4. B. Eliasson and U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 309 (1991). https://doi.org/10.1109/27.106829
  5. D. Braun, U. Kuchler and G. J., J. Phys. D: Appl. Phys. 24, 564 (1991). https://doi.org/10.1088/0022-3727/24/4/007
  6. S. Muller and R. J. Zahn, Plasma Phys. 36, 697 (1996).
  7. L. B. Loeb, University of California Press, Berkeley, CA (1965).
  8. Y. Akishev, O. Goossens, T. Callebaut, C. Leys, A. Napartovich and N. Trushkin, J. Phys. D: Appl. Phys. 34, 2875 (2001). https://doi.org/10.1088/0022-3727/34/18/322
  9. M. Cernak, T. hosokawa, S. kobayashi and T. Kaneda, J. Appl. Phys. 83, 2678 (1998).
  10. R. Morrow, J. Phys. D: Appl. Phys. 30, 3099 (1997). https://doi.org/10.1088/0022-3727/30/22/008
  11. Mounir Laroussi and Tamer Akan, Plasma Process. Polym. 4, 777 (2007). https://doi.org/10.1002/ppap.200700066
  12. J. Park, I. Henins, H. W. Hermann, G. S. Selwyn, J. Appl. Phy. 89, 15 (2001). https://doi.org/10.1063/1.1323754
  13. G. S. Selwyn, H. W. Herrmann, J. Park and I. Henins, Contrib Plasma Phys. 6, 610 (2001).
  14. V. Kapicka and M. Sicha, Plasma Sources Sci. Technol. 8, 15 (1999). https://doi.org/10.1088/0963-0252/8/1/002
  15. J. P. Trelles, J. V. R. Heberlein and E. Pfender, J. Phys. D: Appl. Phys. 40, 5937 (2007). https://doi.org/10.1088/0022-3727/40/19/024
  16. H. Barankova and L. Bardos, Applied Physics Letters 76, 285 (2000). https://doi.org/10.1063/1.125723
  17. R. H. Stark and K. H. Schoenbach, Applied physics letters 74, 3770 (1999). https://doi.org/10.1063/1.124174
  18. K. H. Becker, K. H. Schoenbach and J. G. Eden, J. Phys. D: Appl. Phys. 39 R55 (2006). https://doi.org/10.1088/0022-3727/39/3/R01
  19. C. Tendero, C. Tixier, P. Tristant, J. Desmaison and P. Leprince, Spectrochimica Acta Part B 61, 2 (2006). https://doi.org/10.1016/j.sab.2005.10.003
  20. W. Siemens, Poggendorff's, Ann. Phys. Chem. 102, 66 (1857).
  21. G. S. Selwyn, H. W. Herrmann, J. Park and I. Henins, Physics Division Progress Report 1999-2000, 189.
  22. V. Nehra, A. Kumar and H. K. Dwivedi, International Journal of Engineering 2, 53 (2008).
  23. A Fridman, A Chirokov and A Gutsol, J. Phys. D: Appl. Phys. 38, R1 (2005). https://doi.org/10.1088/0022-3727/38/2/R01
  24. A. P. Napartovich, Plasmas and Polymers 6, 1 (2001). https://doi.org/10.1023/A:1011313322430
  25. C. Tendero, C. Tixier, P. Tristant, J. Desmaison and P. Leprince, Spectrochimica Acta Part B 61, 2 (2006). https://doi.org/10.1016/j.sab.2005.10.003
  26. J. R. Roth, Bristol and Philadelphia (2001).
  27. H. Jung, D. B. Kim, B. Gweon, S.Y. Moon and W. Choe, Appl. Catal. B: Environ. 93, 212 (2010). https://doi.org/10.1016/j.apcatb.2009.09.031
  28. H. Jung, B. Gweon, D. B. Kim and W. Choe, Plasma Process. Polym 8, 535 (2011). https://doi.org/10.1002/ppap.201000130
  29. H. Jung, J.A. Seo and S. Choi, Scientific Reports 7, 40746 (2017). https://doi.org/10.1038/srep40746