반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

공정 조건에 따른 비정질 탄소막 표면 물성분석

Surface Properties of ACL Thin Films Depending on Process Conditions

  • 김광표 (명지대학교 공과대학 전자공학과) ;
  • 최정은 (명지대학교 공과대학 전자공학과) ;
  • 홍상진 (명지대학교 공과대학 전자공학과)
  • Kim, Kwang Pyo (Department of Electronics Engineering, Myongji University) ;
  • Choi, Jeong Eun (Department of Electronics Engineering, Myongji University) ;
  • Hong, Sang Jeen (Department of Electronics Engineering, Myongji University)
  • 투고 : 2019.06.08
  • 심사 : 2019.06.24
  • 발행 : 2019.06.30
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초록

Amorphous carbon layer (ACL) is actively used as an etch mask. Recent advances in patterning ACL requires the next level of durability of hard mask in high aspect ratio etch in near future semiconductor manufacturing, and it is worthwhile to know the surface property of ACL thin film to enhance the property of etch hard mask. In this research, ACL are deposited by 6 inch plasma enhanced chemical vapor deposition system with $C_3H_6$ and $N_2$ gas mixture. Surface properties of deposited ACL are investigated depending on gas flow, pressure, RF power. Fourier transform infrared is used for the analysis of surface chemistry, and X-ray photoemission spectra is used for the structural analysis with the consideration of the contents of $sp^2$ and $sp^3$ through fitting of C1s. Also mechanical properties of deposited ACL are measured in order to evaluate hardness.

키워드

참고문헌

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