Fig. 1. (a) Schematic of ALD coating process: mainly ZnO deposition and only one layer of Al2O3 deposition. TEM image of ZnO:Al2O3 ALD coating layer on glass. (b) ZnO:Al2O3 = 5:1 (AZO6), (c) ZnO:Al2O3 = 9:1 (AZO10), (d) ZnO:Al2O3 = 19:1 (AZO20), and (e) ZnO:Al2O3 = (19:1)×2 (AZO40)
Fig. 2. EDS mapping of ALD coated NCM523 at AZO20: (a) SEM image of analysis site, and mapping image of elements of (b) Al (aluminum), and (c) Zn (zinc). (d) Element intensity of Zn.
Fig. 3. EDS elemental line concentration profile of ALD coated NCM523 at AZO20: (a), (b) SEM image of analysis area point, (c) intensity, and (d) atomic %.
Fig. 4. Cyclic voltammetry on ALD coated cathode half cell: (a) AZO6, (b) AZO10, (c) AZO20, and (d) AZO40.
Fig. 5. Electrochemical result of cells using ALD coated and non-coated cathode: cycle performance of the cell operated at the cut off voltage of 4.5 V. (a) cycle rate of 0.2 C, (b) cycle rate of 0.5 C, (c) coulombic efficiency, (d) capacity retention plot using the result of (a), and (e) rate capability.
Fig. 6. Nyquist plots of coated cathode and anode full cell systems: (a) non-coated, (b) AZO6, (c) AZO10, (d) AZO20, (e) AZO40, and (f) equivalent circuit used to model the impedance spectra of cells.
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