Fig. 1. FESEM cross-sectioal images of TiN thin films fabricated at the conditions of (a) 10 sccm and (b) 50 sccm N2 gas flow rates.
Fig. 2. Ti and N atomic ratio in TiN thin films fabricated with the increase of N2 gas flow rate.
Fig. 3. Transmittance in TiN thin films fabricated with the increase of N2 gas flow rate.
Fig. 4. Hardness and elastic modulus values in TiN thin films fabricated with the increase of N2 gas flow rate.
Fig. 5. Contact angle images of (a) Ti and (b) TiN thin films fabricated at 50 sccm, and (c) contact angle values in TiN thin films fabricated with the increase of N2 gas flow r1ate.
Fig. 6. Rms surface roughness of (a) Ti and (b) TiN thin films fabricated at 50 sccm, and (c) Rms surface roughness values in TiN thin films fabricated with the increase of N2 gas flow rate.
Fig. 7. Critical load values in TiN thin films fabricated with the increase of N2 gas flow rate.
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