References
- D. C. Paine, B. Yaglioglu, Z. Beiley, and S. Lee, "Amorphous IZO-based transparent thin film transistors", Thin Solid Films, Vol. 516, pp.5894-5898, 2008. https://doi.org/10.1016/j.tsf.2007.10.081
- T. Oh, Tunneling Phenomenon of amorphous Indium-Gallium-Zinc-Oxide Thin Film Transistors for Flexible Display, EML, Vol. 11. pp.853-861, 2015.
- N. Ito, Y. Sato, P.K. Song, A. Kaijio, K. Inoue, and Y. Shigesato, "Electrical and optical properties of amorphous indium zinc oxide films", Thin Solid Films, Vol. 496(1), pp.99-103, 2006. https://doi.org/10.1016/j.tsf.2005.08.257
- K. K. Banger, Y. Yamashita, K. Mori, R. L. Peterson, T. Leedham, J. Rickard, and H. Sirringhaus, Lowtemperature, high-performance solution-processed metal oxide thin-film transistors formed by a 'sol-gel on chip' process, Nature Materials, Vol. 10, pp. 45-50, 2011. https://doi.org/10.1038/nmat2914
- Y. S. Jung, J. Y. Seo, D. W. Lee, and D. Y. Jeon, Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film, Thin Solid Films, Vol. 445, pp.63-71, 2003. https://doi.org/10.1016/j.tsf.2003.09.014
- Li. et al., Magnetization switching using topological surface states, Sci. Adv. 5, eaaw3415, (2019) https://doi.org/10.1126/sciadv.aaw3415
- L. Raniero, I. Ferreira, A. Pimentel, A. Goncalves, P. Canhola, E. Fortunato, and R. Martins, "Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings", Thin Solid Films, Vol. 511-512, pp. 295-298, 2006. https://doi.org/10.1016/j.tsf.2005.12.057
- Cui-Zu Chang, Jinsong Zhang, Xiao Feng, Jie Shen, Zuocheng Zhang, Minghua Guo, Kang Li, Yunbo Ou, Pang Wei, Li-Li Wang, Zhong-Qing Ji, Yang Feng, Shuaihua Ji, Xi Chen, Jinfeng Jia, Xi Dai, Zhong Fang, Shou-Cheng Zhang, Ke He, Yayu Wang, Li Lu, Xu-Cun Ma, Qi-Kun Xue, Experimental observation of the quantum anomalous Hall effect in a magnetic topological insulator, Science, Vol. 340(6129), pp.167-237, 2013. https://doi.org/10.1126/science.1234414
- T. Oh and C. K. Choi, Comparison between SiOC thin film fabricated by using plasma enhance chemical vapor deposition and SiO2 thin film by using fourier transform infrared spectroscopy, Journal of the Korean Physical Society, Vol. 56, pp. 1150-1155, 2010. https://doi.org/10.3938/jkps.56.1150