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A Study of Failure Mechanism through abnormal AlXOY Layer after pressure Cooker Test for DRAM device

DRAM 소자의 PCT 신뢰성 측정 후 비정상 AlXOY 층 형성에 의해 발생된 불량 연구

  • Choi, Deuk-Sung (Division. of Electronics & Information Engineering, Yeungnam University College) ;
  • Jeong, Seung-Hyun (Division. of Electronics & Information Engineering, Yeungnam University College) ;
  • Choi, Chae-Hyoung (Division. of Electronics & Information Engineering, Yeungnam University College)
  • Received : 2018.07.20
  • Accepted : 2018.09.21
  • Published : 2018.09.30

Abstract

This research scrutinizes the reason of failure after pressure cooker test (PCT) for DRAM device. We use the physical inspecting tools, such as microscope, SEM and TEM, and finally find the discolor phenomenon, corrosion of Al and delamination of inter-metal dielectric (IMD) in the failed devices after PCT. Furthermore, we discover the abnormal $Al_XO_Y$ layer on Al through the careful additional measurements. To find the reason, we evaluate the effect of package ball size and pinhole in passivation layer. Unfortunately, those aren't related to the problems. We also estimate halide effect of Al. The halogens such like Cl are contained within EMC material. Those result in the slight improving of PCT characteristics but do not perfectly solve the problems. We make a hypothesis of Galvanic corrosion. We can find the residue of Ti at the edge of pad open area. We can see the improving the PCT characteristics by the time split of repair etch. The possible mechanism of the PCT failure can be deduced as such following sequence of reactions. The remained Ti reacts on the pad Al by Galvanic corrosion. The ionized Al is easily react with the $H_2O$ supplied under PCT environment, and finally transfers to the abnormal $Al_XO_Y$ layer.

본 연구에서는 DRAM 소자의 Pressure Cooker Test (PCT) 신뢰성 평가 후 발생한 불량 원인에 대한 연구를 진행하였다. 불량 시료의 물리적 관측 결과 변색, Al의 부식 및 손실, 그리고 금속 간 중간 절연막 박리 등이 관측되었다. 추가 물리적 화학적 분석 결과 비정상적인 물질인 $Al_XO_Y$ 층을 발견하였다. 불량 원인을 파악 하기 위해 package ball 크기 실험 및 보호막 pin hole 등의 연관성 실험을 진행하였으나 원인으로 판명되지 않았다. 또한 EMC 물질에 포함되어 있는 Cl에 의한 Al 할로겐화 평가를 진행하였다. 진행 결과 약간의 개선 효과를 보였지만 완벽한 문제 해결을 이루어 내지 못했다. Galvanic corrosion 가능성 가설을 세웠고, 면밀한 분석 결과 pad open 지역에서 Ti 잔존물을 발견할 수 있었다. 검증 실험으로 repair 식각 분리 실험을 진행하여 개선 효과를 보았다. 개선 된 조건에서 PCT 신뢰성 기준치를 만족 하는 결과를 얻었다. 금번 PCT 불량 메카니즘은 다음과 같이 설명할 수 있다. 공정 repair etch시 Ti 잔류물이 남아 Galvanic 메커니즘에 의해 Al이 이온화 된다. 이온화 된 Al이 후속 PCT 신뢰성 측정 시 $H_2O$와 반응하여 비 정상 물질인 $Al_XO_Y$를 생성하였다.

Keywords

References

  1. C. G. Peattie, J. D. Adams and S. L. Carrell, T. D. George, and M. H. Valek, "Elements of semiconductor-device reliability", Proc. IEEE, 62(2), 149 (1974). https://doi.org/10.1109/PROC.1974.9406
  2. M. G. Pecht, and F. R. Nash, "Predicting the reliability of electronic equipment", Proc. IEEE, 82(7), 992 (1994). https://doi.org/10.1109/5.293157
  3. C. L. Gan, and U. Hashim, "Reliability assessment and mechanical characterization of Cu and Au ball bonds in BGA package", Journal of materials Science:Materials in Electronics, 24(8), 2803 (2013). https://doi.org/10.1007/s10854-013-1174-6
  4. K. Ogawa, J. Suzuki, and K. Sano, "Automatically controlled 2-vesel pressure-cooker test-equipment", IEEE Transactions on reliability, 32(2), 164 (1983).
  5. J. E. Gunn, S. K. Malik, P. M. Mazumdar, and P. Elmer, "Highly accelerated temperature and humidity stress test technique (HAST)", Proc. 19th International Reliability Physics Symposium, Las Vegas, 48 (1981).
  6. P. Nemeth, "Accelerated life time test methods for new package technologies", Proc. 24th International Spring Seminar on Electronics Technology, Calimanesti-Caciulata, Romania, 215 (2001).
  7. C. F. Yu, C. M. Chan, L. C. Chan, and K. C. Hsieh, "Cu wire bond microstructure analysis and failure mechanism", Microelectronics Reliability, 51(1), 119 (2011). https://doi.org/10.1016/j.microrel.2010.04.022
  8. C. W. Tan, A. R. Daud, and M. A. Yarmo, "Corrosion study at Cu-Al interface in microelectronics packaging", Applied Surface Science, 191(4), 67 (2002).
  9. W. S. Lee, M. G. Park, and I. W. Cho, "Reliability issues on the high speed DRAM flip-chip package using gold stud bump, lead free solder, and underfill", Electronic Components and Technology Conference, IEEE, 1776 (2008).
  10. H. Abe, D. C. Kang, T. Yamamoto, T. Yagihashi, and Y. Endo, H. Saito, T. Horie, H. Tamate, Y. Ejiri, N. Watanabe, and T. Iwasaki, "Cu Wire and Pd-Cu Wire Package Reliability and Molding Compounds", Proc. Electronic Components and Technology Conference, IEEE, San Diego, CA, USA, 1117 (2012).
  11. I. Singh, J. Y. On, and L. Levine, "Enhancing fine pitch, high I/O devices with copper ball bonding", Proc. Electronic Components and Technology Conference, IEEE, 843 (2005).
  12. T. Uno, and T. Yamada, "Improving humidity bond reliability of copper bonding wires", Proc. Electronic Components and Technology Conference, IEEE, 1725 (2010).
  13. B. Grosgogreat, L. Reclaru, M. Lissac, and F. Dalard, "Measurement and evaluation of galvanic corrosion between titanium/Ti6Al4V implants and dental alloys by electrochemical techniques and auger spectrometry", Biomaterials, 20(10), 933 (1999). https://doi.org/10.1016/S0142-9612(98)00248-8
  14. T. Rodopoulos, L. Smith, M. D. Horne, and T. Ruther, "Speciation of Aluminium in mixtures of the ionic liquids [$C_3mpip$][$NTf_2$] and [$C_4mpyr$][$NTf_2$] with $AlCl_3$: an electrochemical and NMR spectroscopy study", Chemistry a European Journal, 16(12), 3815 (2010). https://doi.org/10.1002/chem.200902753