Current Optics and Photonics

Optical Society of Korea (한국광학회)
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Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

  • Lee, Hyunsu (Department of Cogno-Mechatronics Engineering, Pusan National University) ;
  • Ahn, Heesang (Department of Cogno-Mechatronics Engineering, Pusan National University) ;
  • Kim, Kyujung (Department of Cogno-Mechatronics Engineering, Pusan National University) ;
  • Kim, Seungchul (Department of Cogno-Mechatronics Engineering, Pusan National University)
  • Received : 2018.06.26
  • Accepted : 2018.07.25
  • Published : 2018.08.25
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Abstract

Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules

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References

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