Figure 1. Main variables panel of VacCAD
Figure 2. Vacuum chamber panel
Figure 3. Pumping time of stainless steel and aluminum
Figure 4. Rough pumping comparison
Figure 5. Effective high vacuum pumping speed of vane roughing pump
Figure 6. Pumping time of three different high vacuum pump
Figure 7. Simulation results of roughing line conductance
Table 1. Proposed simulation modelling
Table 2. Pumping times of stainless steel and aluminum chamber
Table 3. Simulation results of roughing line conductance plotted as curves in Fig.5.
References
- VacCAD Operation Manual
- VECOR, http://www.vecorus.com
- Hyungtaek Kim, " Analysis of high vacuum system based on vacuum materials", Transactions on electrical & electronic materials Vol. 14, No. 6, pp. 334-338, December 25, 2013 https://doi.org/10.4313/TEEM.2013.14.6.334
- Technology Sources Ltd., User's Guide of VacSim[Multi] Simulator (manual), 2001.
- Joo, Jang Hun, "Vacuum Technology for EUV Lithography", Vacuum Magazine Volume 1, Issue3, pp.14-20, 2014 https://doi.org/10.5757/VACMAG.1.3.14
- B. Andrew Guthrie. Vacuum technology. John Wiley and Sons; 2008
- B. Hyunwhe Kim, Introduction to basic vacuum engineering for semiconductor and display processing, neaha, 2007
- B. Janghun Jo, practical vacuum technology, Hongneung Science, 2004
- B. Jousten Karl, Nakhosteen C. Benjamin. Handbook of vacuum technology, Wiley-VCH Verlag GmbH; 2008.
- B. J. M. Lafferty. Foundations of vacuum science and technology. John Wiley and Sons; 1998.