Acknowledgement
Grant : Numerical simulation to overcome process limitations below 10 nm semiconductor, Plasma enhanced atomic-layer-deposition process and alternatives for gate spacer and multi-patterning technology
Supported by : Korea Research Institute of Standards and Science (KRISS), Ministry of Trade, Industry and Energy of Korea, National Fusion Research Institute of Korea, Korea Research Institute of Standards and Science
Cited by
- Metastables as a probe for low-temperature plasma characteristics in argon vol.52, pp.21, 2019, https://doi.org/10.1088/1361-6463/ab0531